Major interests of the Electrodeposition Division include fundamental aspects of electrochemical deposition of metals and alloys, structure and properties of deposits, and technological applications of electrochemically produced metals and alloys. Electrochemical deposition involves reduction of metallic ions from aqueous, inorganic, and fused salt electrolytes. The reduction process M^z+(solution) + zc -> M(lattice) can be accomplished by the electrodeposition process in which z electrons are supplied by an external power supply or by electroless (autocatalytic) deposition process in which a reducing agent in the solution is the electron source (there is no external power supply). There are two types of fundamental problems involved with the above equation: (i) kinetics and mechanism of the process, and (ii) nucleation and growth of the lattice (M(lattice)). In the research on fundamental aspects of the kinetics and mechanism of special interest are basic kinetic steps: charge transfer or ion discharge to form a neutral adatom or partly charges adion at the substrate surface and surface diffusion of adatom and adion. Interfacial electrochemistry (charge distribution across interface and the structure of the doublelayer) and various aspects of materials science are of great importance for understanding the above fundamental problems.
In the area of structure and properties of deposits of special interest are grain size, texture (preferred orientation), and correlation between structure and physical and chemical properties of deposits. A few examples of applications of electrochemical deposition include: printed circuit boards, magnetic alloys for computer memories, coatings for hard disk drives, wear resistant coatings, corrosion resistant alloys, metal matrix composites, electroreformed laser mirrors, electrochromic materials, decorative coatings, oxides, and organic polymers.
Electrodeposition Division Research Award —The Research Award of the Electrodeposition Division recognizes recent outstanding achievement or contribution in the field of electrodeposition. The award, consisting of a scroll and $2,000 is given annually at the fall Society meeting. Submit nominations in a letter detailing the accomplishments of the nominee accompanied by a list of supporting publications with titles to: Takayuki Homma: t.homma@waseda.jp. The nomination deadline for next year’s Award is April 1, 2012.
The recipient of the 2011 Electrodeposition Division Research Award is Philippe Allongue from the Laboratoire de Physique de la Matière Condensée of the Ecole Polytechnique, Palaiseau, France. Join us to honor Dr. Allongue at the Electrodeposition Division Luncheon on Wednesday October 12 (admission with ticket), which will be followed by his award address “Ultra Thin Magnetic Films: Why Choosing the Electrochemical Route” in the F1 symposium “Current Trends in Electrodeposition”.
Student Travel Grants — $750 student travel grants are available. The grant shall be presented to a graduate student of demonstrated ability in electrodeposition research to assist his or her travel to an ECS meeting at which he or she is presenting a paper or a student poster in a sponsored or cosponsored Electrodeposition Division symposium. These are competitive grants. The travel grants committee consists of: Stanko Brankovic, Chair, and Philippe Vereecken. Please send your grant applications to Philippe Vereecken, e-mail: vereeck@imec.be. More information on the student travel grants is available here.
Future Electrodeposition Division Symposia
2011 Fall — Boston, MA, USA
Current Trends in Electrodeposition – An Invited Symposium
Organizer: G. Stafford
Electrodeposition of Nanoengineered Materials and Devices 4
Organizers: N. Myung, S. Brankovic, H. Deligianni, J. N. Harb, P. Hesketh, E. Podlaha, J. Rohan, J. Talbot, and G. Zangari
Fundamentals of Electrochemical Growth: from UPD to Microstructure 2
Organizers: S. Brankovic, P. Allongue, M. Innocenti, L. Peter, N. Vasiljevic, and G. Zangari
Semiconductor, Metal Oxides, and Composites: Metallization and Electrodeposition of Thin Films and Nanostructures 2
Organizers: P. Vereecken, J. Fransaer, G. Oskam, and I. Shao
2012 Spring — Seattle, WA, USA
Stress Related Phenomena in Electrochemical Systems 2
Organizers: G. Stafford, K. Hebert, and Y. T. Cheng
Surface Treatment for Biomedical Applications 2
Organizers: S. Djokic, D. Hansen, L. Magagnini, and L. Nakahara
Electrochemical Engineering for the 21st Century 2
Organizers: R. C. Alkire, J. Fenton, J. Harb, and L. Deligianni
Special Summer 2011 Issue of Interface: Focus on Electrodeposition — The summer 2011 issue of Interface will focus on electrodeposition and will include a series of articles on the topic “Electrodeposition for energy conversion”. The focus issue has been edited by G. Zangari and will contain a Chalkboard column on electrochemical atomic layer epitaxy by John Stickney, an article on electrodeposited electrocatalysts for fuel cells by Vukmirovic et al., an overview on the use of electrodeposition for the fabrication of microbatteries by Edstrom et al., and a final contribution by Deligianni, et al. on the use of electrodeposition in photovoltaic devices.
Fall 2011 Short Course on Electrodeposition at the ECS Meeting in Boston — A short course on “Electrodeposition: Fundamentals and Applications to Energy Conversion Systems” will be offered on Sunday October 9, before the start of the 220th ECS Meeting in Boston. The course will offer the opportunity to students, researchers, and practitioners with a variety of technical backgrounds to be introduced for the first time or to refresh their understanding of the fundamentals of the technique. Most importantly, the attendees will learn about the latest trends in and the potential applications of electrodeposition to energy conversion technologies. Learn more at:
http://www.electrochem.org/education/short_courses/220/220_sc6_eldep.htm.
