197th Meeting - Toronto, Ontario, Canada

May 14-18, 2000

SYMPOSIA

Click on the symposium titles below to retrieve the complete technical program for that symposium. The icons include links to descriptions of the particular division or group it represents. The sponsorship of each symposium is linked to the appropriate location in the Call for Papers.

ALL DIVISIONS AND GROUPS: A1 - General Society Student Poster Session (P.S. Fedkiw and J.M. Fenton)
BATTERY DIVISION/ ENERGY TECHNOLOGY DIVISION: B1 - Micro-Power Sources (K. Zaghib and S. Surampudi); B2 - Battery/Energy Technology Joint General Session (R. Swaroop and J.S. Symanski)
CORROSION: C1 - Corrosion Inhibitors (R.G. Buchheit and D.C. Hansen); C2 - Oxide Films (K.R. Hebert, R.S. Lillard and B.R. MacDougall); C3 - Corrosion General Session (C.R. Clayton)
DIELECTRIC SCIENCE AND TECHNOLOGY DIVISION: D1 - Fifth International Symposium on Low and High Dielectric Constant Materials: Materials Science, Processing, and Reliability Issues (R. Singh, H.S. Rathore, M.J. Loboda, S.S. Ang, R.P.S. Thakur, C.C. Schuckert and S.C. Sun); D2 - Plasma Processing XIII (G.S. Mathad, D.W. Hess, M. Meyyappan, M. Yang and G.K. Celler); D3 - Third International Symposium on Environmental Issues with Materials and Processes for the Electronics Semiconductor Industries (L. Mendicino and L. Simpson)
ELECTRODEPOSITION DIVISION: E1 - Tribology of Electrodeposited and Composite Layers (D.D. Snyder, J.L.D. Fransaer and E.J. Podlaha)
ELECTRODEPOSITION DIVISION/ DIELECTRIC SCIENCE AND TECHNOLOGY DIVISION/ ELECTRONICS DIVISION: F1 - Electrochemical Processing in ULSI Fabrication III (P.C. Andricacos, P.C. Searson, C. Reidsema-Simpson, P. Allongue, J.L. Stickney, and G.M. Oleszek)
ELECTRONICS DIVISION: G1 - Compound Semiconductor Power Transistors II (A.G. Baca, F. Ren, C. Bozada, and S.N.G. Chu); G2 - Electronic and Photonic Materials for the 21st Century (G.K. Celler, G.W. Cullen, T. Abe, and C.L. Claeys); G4 - State-of-the-Art Program on Compound Semiconductors XXXII (R.F. Kopf, R.E. Sah, D.N. Buckley, H.K. Chen, Y. Mochizuki and J.P. Vilcot)
ELECTRONICS DIVISION/ DIELECTRIC SCIENCE AND TECHNOLOGY DIVISION: H1 - Fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface (H.Z. Massoud, I. Baumvol, H. Hirose and E.H. Poindexter); H2 - Electronics/Dielectric Science and Technology Joint General Session (W.D. Brown, R.K. Ulrich, R.B. Fair, K.B. Sundaram and M.J. Deen)
ELECTRONICS DIVISION/ DIELECTRIC SCIENCE AND TECHNOLOGY DIVISION/ HIGH TEMPERATURE MATERIALS DIVISION: I1 - Rapid Thermal and Other Short-Time Processing Technologies I (F. Roozeboom, J.C. Gelpey, M.C. Ozturk, K. Reid, D.-L. Kwong and S.E. Mohney)
ENERGY TECHNOLOGY DIVISION/ FULLERENES GROUP: K1 - Nanostructured Materials in Electrochemistry and Photoelectrochemistry (P.V. Kamat and K. Uosaki)
ENERGY TECHNOLOGY DIVISION/ PHYSICAL ELECTROCHEMISTRY DIVISION: M1 - Applications of Surface Science to Energy Technologies (S. Mukerjee and A. Wieckowski)
FULLERENES GROUP: N1 - Fullerenes, Nanotubes, and Carbon Nanoclusters: Session I (K.M. Kadish, P.V. Kamat, R.B. Weisman, F. D'Souza, S. Fukuzumi, D.M. Guldi, K.P. Dinse, M. Maggini and N. Martin); N2 - Fullerenes, Nanotubes, and Carbon Nanoclusters: Session II (S.R. Wilson, E. Osawa, Z. Slanina, O.V. Boltalina, K. Tanigaki, V. Buntar, K. Prassides and O. Gunnarsson); N3 - Fullerenes, Nanotubes, and Carbon Nanoclusters: Session III (S. Subramoney, Z.F. Ren, H. Shinohara and T. Akasaka)
HIGH TEMPERATURE MATERIALS DIVISION/ DIELECTRIC SCIENCE AND TECHNOLOGY DIVISION/ ELECTRONICS DIVISION/ AMERICAN CERAMIC SOCIETY: O1 - Fifteenth International Conference on Chemical Vapor Deposition: CVD XV (M.D. Allendorf, T.M. Bessman, M.L. Hitchman, McD. Robinson, Y. Shimogaki, F. Tessandier and R.K. Ulrich)
INDUSTRIAL ELECTROLYSIS AND ELECTROCHEMICAL ENGINEERING DIVISION: P1 - Industrial Electrolysis and Electrochemical Engineering General Session (E. Kalu)
INDUSTRIAL ELECTROLYSIS AND ELECTROCHEMICAL ENGINEERING DIVISION/ ENERGY TECHNOLOGY DIVISION: Q1 - Fifth International Symposium on Electrochemistry in Mineral and Metal Processing (R. Woods, F.M. Doyle, and S. Licht)
INDUSTRIAL ELECTROLYSIS AND ELECTROCHEMICAL ENGINEERING DIVISION/ ORGANIC AND BIOLOGICAL ELECTROCHEMISTRY DIVISION: R1 - Electrochemistry in the Preparation of Fluorine and Its Compounds (C.L. Gross and T. Fuchigami)
LUMINESCENCE AND DISPLAY MATERIALS DIVISION: S1 - Luminescence and Display Materials General Session (W.M. Yen, D.J. Lockwood and C. Ronda)
ORGANIC AND BIOLOGICAL ELECTROCHEMISTRY DIVISION: T1 - Fourth International Manuel M. Baizer Symposium in Honor of J. Simonet and J.H.P. Utley (A.J. Fry, Y. Matsumura and E. Steckhan)
ORGANIC AND BIOLOGICAL ELECTROCHEMISTRY DIVISION/ INDUSTRIAL ELECTROLYSIS AND ELECTROCHEMICAL ENGINEERING DIVISION: U1 - Scale-Up in Organic and Pharmaceutical Electrosynthesis (D.J. Mazur, I. Nishiguchi, P.N. Pintauro and P. Tatapudi)
PHYSICAL ELECTROCHEMISTRY DIVISION: V2 - Hydrogen at Surfaces and Interfaces (G. Jerkiewicz, J.M. Feliu and B.N. Popov); V3 - Organic Monolayers at Electrodes (V. Birss, D. Bizzotto, J. Lipkowski and S. Roscoe); V4 - Physical Electrochemistry General Session (J. Leddy)
PHYSICAL ELECTROCHEMISTRY DIVISION/ ENERGY TECHNOLOGY DIVISION: W1 - Electrochemistry of Novel Electrode Materials (A. Lasia, D. Guay and S. Srinivasan)
SENSOR DIVISION: X1 - Advances in Sensors for Diabetes Monitoring (T.P. Henning, D. Cunningham and G. Jobst); X2 - Polymer Manufacturing Process Sensors II (E.B. Stokes, D.E. Kranbuehl and A.J. Bur)
SENSOR DIVISION/ PHYSICAL ELECTROCHEMISTRY: Z1 - Electrochemical Impedance for Analysis of Chemical and Electrochemical Processes and Mechanisms (R.P. Buck, P.J. Hesketh and P. Vanysek)