197th Meeting - Toronto, Ontario, Canada

May 14-18, 2000

PROGRAM INFORMATION

G2 - Electronic and Photonic Materials for the 21st Century

Electronics Division

Monday, May 15, 2000

Civic Ballroom North, 2nd Floor

Silicon and SiGe Materials

Co-Chairs: G.K. Celler and A.J. Steckl

TimeAbs#TitleView
2:00405 Silicon Wafers for The Mesoscopic Era - H.R. Huff (SEMATECH, Inc.) PDF
2:30406 Silicon Crystal Growth at the Beginning of the 21st Century - W. v.Ammon (Wacker Siltronic AG) PDF
3:00 Thirty-Minute Intermission
3:30407 Silicon:Germanium, a Material of the Future Goes Mainstream - B. Meyerson (IBM T.J. Watson Research Center) PDF
4:00408 GeSi Single Crystals as Thermo-Electric Materials - I. Yonenaga (Tohoku University) GIF
4:30409 A Realistic Way of Future Silicon Solar Cells - T. Abe (Shin-Etsu Handotai) GIF

Tuesday, May 16, 2000

Compound Semiconductors and Photonics

Co-Chairs: H.R. Huff and T. Abe

TimeAbs#TitleView
8:30410 Future Prospects For Heterostructure Device Wafer Manufacturing - J. Fan (Kopin Corporation) PDF
9:00411 Prospects for SiC Technology in the 21st Century - C.H. Carter, V.F. Tsvetkov, D. Hobgood, R.C. Glass, D. Henshall, S.G. Muller, M. Brady, J.A. Edmond, A. Agarwal, R. Singh, S. Allen, and J.W. Palmour (Cree, Inc.) GIF
9:30 Thirty-Minute Intermission
10:00412 Photonic Materials for the 21st Century - A. Glass (Bell Labs, Lucent Technologies) PDF
10:30413 GaN-Based Light Emitting Devices - M. Koike (Toyoda Gosei Co. Ltd.) PDF
11:00414 Rare Earth Doped Gallium Nitride - A New Approach to the Pursuit of Light - A. Steckl (University of Cincinnati) PDF
11:30415 Silicon Microphotonics for Future ULSI Applications - K. Wada, A. Agarwal, D. Lim, K. Chen, K. Lee, H. Luan, T. Chen, N. Toyoda, J. Foresi, and L. Kimerling (Massachusetts Institute of Technology) PDF

Silicon Technology

Co-Chairs: C.L. Claeys and S.P. Murarka

TimeAbs#TitleView
2:00416 On Chip Interconnection Materials Needs - Present and Future - S.P. Murarka (Rensselaer Polytechnic Institute) PDF
2:30417 Alternative Gate Oxides for Sub-100nm Silicon Devices: Progress and Paradigm Shifts - A. Kingon and J.-P. Maria (North Carolina State University,) PDF
3:00 Thirty-Minute Intermission
3:30418 Silicon-on-Insulator - Materials, Devices, and Future Prospects - G. Celler (Bell Laboratories, Lucent Technologies) PDF
4:00419 Ultradeep Trench Arrays in Silicon as a Base for High-Value MOS Capacitors - F. Roozeboom, R. Elfrink, J. Verhoeven, and J. van den Meerakker (Philips Research) PDF