All proceedings for this year are Out of Print.
Please contact Proqest Information and Learning
Degradation of Electronic Devices Due to Device Operation as well as Crystalline and Process-Induced Defects, H. J. Queisser, J. E. Chung, K. E. Bean, T. J. Shaffner, and H. Tsuya, editors, PV 94-1, New Orleans, Louisiana - October 1993, ISBN 1-56677-037-8, 328 pages. The purpose of the volume is to provide a better understanding of high density failures due to operational conditions, as well as degradation phenomena caused by crystalline and process-induced defects. The volume is divided into five sections: dielectrics, crystallographic defects, heterostructures, interconnects, and electrical properties. Out of Print.
Electrochromic Materials (2nd International Symposium), K.-C. Ho and D. A. MacArthur, ediotrs, PV 94-2, New Orleans, Louisiana - October 1993, ISBN 1- 56677-039-4, 384 pages. This volume focuses on advances in electrochromic materials, processes, and devices. Topics include optical properties, reaction mechanisms, synthesis and characterization of materials, conducting polymers, transparent electronic and ionic conductors, stability ofmaterials, and device fabrication. Out of Print.
Contamination Control and Defect Reduction in Semiconductor Manufacturing II, R. Novak, R. Reedy, T. Ito, and D. N. Schmidt, editors, PV 94-3, Honolulu, Hawaii - May 1993, ISBN 1-56677-065-3. This volume focuses on contamination control and defectivity issues in semiconductor manufacturing. Papers in the volume cover the following topics: detection and elimination of process induced defects, equipment induced contamination in semiconductor processes, UHP gas and chemical distribution systems and component verification, production and use of ultra-high-purity water. Out of Print.
Lithium Batteries V, N. Doddapaneni and A. R. Landgrebe, editors, PV 94-4, New Orleans, Louisiana - October 1993, ISBN 1-56677-033-5. This volume addresses both primary and rechargeable lithium-ion battery technologies. It provides a forum for the presentation and discussion of all aspects of both basic and applied research, such as performance, safety, waste management, etc., related to these technologies. Out of Print.
Long Wavelength Infrared Detectors and Arrays: Physics and Applications/State-of-the-Art Program on Compound Semiconductors XIX, F. Radpour and V.R. McCrary, editors, PV 94-5, New Orleans, Louisiana - October 1993, ISBN 1-56677-034-3. The first part of this volume discusses the recent developments in the areas of long wavelength infrared detection, focal plane arrays and their applications. Advances in the areas of novel multiquantum well and superlattice detectors using semiconductors of Group III-V, II-*VI, etc., and their related processing and fabrication issues are presented. The 2nd part of the volume deals with the most recent developments in compound semiconductors encompassing materials growth and processing, device fabrication, and process control. Out of Print.
Magnetic Materials, Processes, and Devices (3rd International Symposium), L. T. Romankiw and D. A. Herman, Jr., editors, PV 94-6, New Orleans, Louisiana - October 1993, ISBN 1-56677-036-X. This volume presents papers of electrochemists, physicist, engineers, and device designers who are working in the area of magnetic thin-film technology that review the present state of the field and point out new areas foresearch. Out of Print.
Cleaning Technology in Semiconductor Device Manufacturing (3rd International Symposium), J. Ruzyllo and R. E. Novak, editors, PV 94-7, New Orleans, Louisiana - October 1993, ISBN 1-56677-038-6. This volume covers a wide range of topics related to the removal of contaminants from the surfaces of semiconductors, implementation of cleaning processes, condition of semiconductor surfaces during and after cleaning, evaluationof the effectiveness of cleaning techniques, and the role of cleaning in various process technologies. Out of Print.
High Permittivity Materials, B. Gnade, P. Fazan, and J. Chapple-Sokol, editors, PV 94-8, New Orleans, Louisiana - October 1993, ISBN 1-56677-035-1, Publication of this books was canceled.
Contamination Control and Defect Reduction in Semiconductor Manufacturing (Third International Symposium), D. N. Schmidt, editor, PV 94-9 - Hardbound, San Francisco, California - May 1994, ISBN 1-56677-041-6. Papers in this volume cover the following topics: detection and elimination of Process induced defects, equipment induced contamination in semiconductor processes, UHP gas and chemical distribution systems and component verification, production and use of ultra-high-purity water. Out of Print.
Silicon Materials Science and Technology, (7th International Symposium), H. R. Huff, W. Bergholz, and K. Sumino, editors, PV 94-10 - Hardbound, San Francisco, California - May 1994, ISBN 1-56677-042-4. This is the 25th anniversary of the Silicon Symposiumeries, and this volume has a greater emphasis on silicon materials. There are papers on the preparation, characterization, and properties of bulk silicon crystals, wafers, and epitaxial silicon films as well as the impact of chemical impurities and structural imperfections introduced during device/circuit processing. There is particular emphasis placed on the interactive effects of starting silicon material properties and the multiple IC processing steps on advanced devices/circuits in the ultra large scale integration area. Out of Print.
Silicon-on-Insulator Technology and Devices (Sixth International Symposium), S. Cristoloveanu, editor, PV 94-11 - Hardbound, San Francisco, California - May 1994, ISBN 1-56677-043-2. This volume provides a broad overview of the current status of SOI technologies (SIMOX, wafer bonding, FIPOS, ZMR, SPE, ELO, SOZ, advanced SOS, and other novel materials and brings together papers from materials, device physics, and applications oriented scientists and engineers. Particular emphasis is put on the preparation and evaluation of high quality SOI substrates, modeling and electrical characterization of specific test dev ices, and design and fabrication of integrated circuits. Out of Print.
Ionic and Mixed Conducting Ceramics (Second International Symposium), T. A. Ramanarayanan, W. L. Worrell, and H. L. Tuller, editors, PV 94-12 - Hardbound, San Francisco, California - May 1994, ISBN 1-56677-044-0. This volume focuses on the synthesis, characterization, properties, and application of inorganic ionic and mixed ion-electron conducting materials. These materials have become increasingly important in electrochemical energy conversion devices and sensors, electrocatalytic processes, and other applications. Out of Print.
Molten Salts (Ninth International Symposium), C. L. Hussey, Y. Ito, G. Mamantov, D. A. Shores, and D. S. Newman, editors, PV 94-13 - Hardbound, San Francisco, California - May 1994, ISBN 1-56677-045-9. This volume contains papers on all facets of the chemistry,hysics, physical chemistry, and electrochemistry of molten salts and covalent melts. Some of the topics covered include theory, modeling, and dynamics; structure; thermodynamics; homogeneous reactions; industrial processes; batteries and fuel cells; and thermal energy storage. Out of Print.
Microstructures and Microfabricated Systems, P. J. Hesketh, J. N. Zemel, and H. G. Hughes, editors, PV 94-14, San Francisco, California - May 1994, ISBN 1- 56677-046-7. This volume focuses on all aspects of microstructures and microfabricated systems including micromachining and process related technology. Some of the topics covered include fabrication and processing of two- and three-dimensional microstructures; new methods for materials processing at microscale dimensions; sensors and detectors based on micromachining methods; use of microstructures in biological studies; multilevel thin-film structures and microstructural characterization; and chemical and physical reliability of micromechanical structures. Out of Print.
Compatibility of Biomedical Implants, P. Kovacs and N. S. Istephanous, editors, PV 94-15, San Francisco, California - May 1994, ISBN 1-56677-047-5. This volume is an international forum for the presentation and discussion of the electrochemical aspects of recent developments in the science, technology and applications of metals as biomedical implant materials. Papers cover all relevant aspects of fundamental and applied research, as well as clinical experience in orthopedic, dental, and cardiovascular applications. Out of Print.
Silicon Nitride and Silicon Dioxide Thin Insulating Films (Third International Symposium), V. J. Kapoor and W. D. Brown, editors, PV 94-16 - Hardbound, San Francisco, California - May 1994, ISBN 1-56677-048-3. This volume contains papers which present and discuss topics concerning all aspects of silicon nitride and silicon dioxide thin film technology. The papers link material studies and technological applications allowing for clearer design and design considerations for the fabrication of devices and integrated circuits (VLSI/ULSI) which incorporate these thin insulating films. Out of Print.
Quantum Confinement: Physics and Applications, M. M. Cahay, S. Bandyopadhyay, J. P. Leburton, A. W. Kleinsasser, M. A. Osman, and R. Barghava, editors, PV 94-17 - Hardbound, San Francisco, California - May 1994, ISBN 1- 56677-049-1. This volume covers mesoscopic semiconductor and semiconductor devices and physics. Topics included are electron transport in isolated and coupled quantum wires and dots; novel nonlinear optical phenomena of semiconductor heterostructures; hot electron and quantum effects; cooperative phenomena in multiple wire and dot systems; quantum transport in semiconductor-superconductor microjunctions; and mesoscopic superconductors. Out of Print.
Large Area Wafer Growth and Processing for Electronic and Photonic Devices/State-of-the-Art Program on Compound Semiconductors XX, S. A. Ringel, D. N. Buckley, J. P. Vilcot, C. Kusano, and G. J. Valco, editors, PV 94-18, San Francisco, California - May 1994, ISBN 1-56677-075-0. The first part of this volume contains papers concerning the epitaxial crystal growth, characterization, and processing of large area wafers for electronic and photonic devices. The primary focus is on compound semiconductor based technologies, but issues concerning elemental semiconductors are included where they impact photonics. The 2nd part of the volume addresses the most recent developments in compound semiconductors encompassing materials growth and processing, characterization, device fabrication for electronic and phototonic applications, and process control. Out of Print.
Water Purification by Photocatalytic, Photoelectrochemical, and Electrochemical Processes, T. L. Rose, B. E. Conway, O. J. Murphy, and E. J. Rudd, editors, PV 94-19, San Francisco, California - May 1994, ISBN 1-56677-076-9. This volume contains papers on both the fundamental aspects of water purification and applications of existing or emerging technologies in the following areas: fundamental studies on mechanisms and kinetics of water purification; new materials; electrochemical methods for analysis of water pollutants; advanced oxidation and reduction processes for water treatment in the condensed vapor phase; cell design and modeling studies; removal and recycling of inorganic, organ ic, and biological contaminants; applications to contaminated ground and surface water, industrial discharges, sewage, dialysis, water recovery in space and submarines. Out of Print.
Plasma Processing (Tenth International Symposium), G. S. Mathad, D. W. Hess, and M. Engelhardt, editors, PV 94-20, San Francisco, California - May 1994, ISBN 1-56677-077-7. This volume contains papers on process modeling and mechanisms, high plasma density reactor technologies and processes, surface conditioning/cleaning techniques, measurement and diagnostic procedures with emphasis on process control, contamination control, and manufacturing processes and issues. Out of Print.
Electrochemistry and Materials Science of Cathodic Hydrogen Absorption and Adsorption, B. E. Conway and G. Jerkiewicz, editors, PV 94-21 - Hardbound, San Francisco, California - May 1994, ISBN 1-56677-078-5. Papers in this volume cover the relation between electrochemical adsorption of the H intermediate in the cathodic H2 evolution reaction and three-dimensional sorption of H into various cathodic materials. The role of catalyst poisons in facilitating H sorption into transition metals and the origin of such effects are also covered. Out of Print.
Douglas N. Bennion Memorial Symposium, R. E. White, editor, PV 94-22, San Francisco, California - May 1994, ISBN 1-56677-079-3. The late Douglas N. Bennion, a Past President and Honorary Member of The Electrochemical Society, published many papers in several different areas of interest to Society member. These areas include mathematical modeling of batteries, ion-exchange membranes, and electrochemical reactors. This volume contains papers on these topics and other areas which appropriately honor Dr. Bennion. Out of Print.
Electrode Materials and Processes for Energy Conversion and Storage (Third International Symposium), S. Srinivasan, D. D. Macdonald, and A. C. Khandkar, editors, PV 94-23 - Hardbound, San Francisco, California - May 1994, ISBN 1-56677-080-7. Papers in this volume focus on fundamental electrochemistry, material and surface science, and electrochemical engineering, as well as technology development and economics of electrochemical energy conversion and storage systems for terrestrial and space applications. The emphasis is on environmentally acceptable energy systems and a renaissance of alternate energy systems. Out of Print.
Fullerenes: Recent Advances in the Chemistry and Physics of Fullerenes and Related Materials, K. M. Kadish and R. S. Ruoff, editors, PV 94-24 - Hardbound, San Francisco, California - May, 1994, ISBN 1-56677-082-3. This volume contains papers on the latest developments on the new allotropes of carbon, including nanotubes and nanopolyhedra. Topics covered are the fundamental understanding of physical properties and structures, synthesis and separation, chemical reactions and new derivatives, charge transfer reactions and electrochemistry, conductivity and superconductivity, possible applications, and new directions. There is a special section devoted to contributions from C.I.S. scientists. Out of Print.
Oxide Films on Metals and Alloys, K. R. Hebert and G. E. Thompson, editors, PV 94-25, Miami Beach, Florida - October, 1994, ISBN 1-56677-084-X. This volume covers oxide films on metals and alloys from diverse points of view, including their roles in providing corrosion resistance, as dielectric layers, and other technologically important applications. These films include passive films, films produced by high temperature oxidation, air-formed films, and electrochemical grown anodic films. There are papers on the following aspects of film behavior: growth mechanisms and kinetics; characterization of film structure, composition and electronic properties; defects and spatially heterogenous prope rties; mechanical properties such as stress and environmental interactions, including those with aggressive species, which may lead to loss of adhesion with the substrate, or pitting corrosion. Out of Print.
H. H. Uhlig Memorial Symposium - Corrosion Science: From Theory to Practice, F. B. Mansfeld, R. M. Latanision, A. I. Asphanani and H. Bohni, editors, PV 94-26 - Hardbound, Miami Beach, Florida - October, 1994, ISBN 1-56677-085-5. This volume records the proceedings of a three-day symposium honoring the life and scientific achievement of Professor Herbert H. Uhlig, one of the founders of modern corrosion science, Palladium Medalist, Acheson Medalist, Honorary Member, and Past President of The Electrochemical Society. Many authors of the papers, including former graduate students, post-*doctoral fellows and colleagues of Professor Uhlig, included personal remarks, anecdotes and photographs illustrating their interaction with Prof. Uhlig. The papers presented included many of the topics of special interest to Prof. Uhlig such as the theory of passivity and its breakdown, corrosion inhibition, critical potentials for pitting and stress corrosion cracking, corrosion fatigue and the application of theoretical concepts to practical applications. Out of Print.
Hydrogen and Metal Hydride Batteries, P. D. Bennett and T. Sakai, editors, PV 94-27 - Hardbound, Miami Beach, Florida - October, 1994, ISBN 1-56677-086-6. This volume covers a wide range of topics related to new developments in hydrogen and metal hydride batteries including alloy microstructure and morphologies, new alloy compositions, cell designs and assemblies, component development, aerospace and EV applications, new methods for evaluating battery related electrochemical processes, and new electrochemical couples. The symposium brought together specialists involved in hydrogen or metal hydride battery research and manufacturing and provided a forum for an exchange of views and information. Out of Print.
Rechargeable Lithium and Lithium Ion (RCT) Batteries, S. A. Megahed, editor, PV 94-28 - Hardbound, Miami Beach, Florida - October, 1994, ISBN 1-56677-087-4. This symposium will address rechargeable lithium batteries using metallic and nonmetallic anodes. Batteries with metallic lithium anodes could be with liquid or polymer electrolytes. Batteries with metallic lithium anodes could be with carbon or noncarbon anodes, utilizing liquid or polymer electrolytes. The purpose of this symposium is to provide a forum for the presentation and discussion of all aspects of rechargeable lithium batteries. This includes fundamental and applied research on the rechargeable lithium batteries (metallic and nonmetallic) for consumer, military, electronic, aerospace, electric vehicle, load-leveling, and other applications. Out of Print.
Corrosion and Reliability of Electronic Materials and Devices III, J. D. Sinclair, R. P. Frankenthal and R. B. Comizzoli, editors, PV 94-29 - Hardbound, Miami Beach, Florida - October, 1994, ISBN 1-56677-088-2. Papers dealing with the fundamental and applied aspects of corrosion, reliability, and materials degradation in the design, manufacture, and use of electronic and optoelectronic devices and equipment are contained in th is volume. The scope includes: 1. fundamental corrosion and materials degradation studies of bulk and thin film metals, semiconductors, superconductors, ceramics, polymers, and composites, 2. design and materials selection for components and ICs, includi ng bipolar, MOS and high voltage devices; 3. packaging and interconnect technologies, connector designs, and contact materials. Out of Print.
Long Wavelength Infrared Detectors and Arrays: Physics and Applications II, V. S. Swaminathan, F. Radpour, T. S. Faska, S. S. Li and H. C. Liu, editors, PV 94-30, Miami Beach, Florida - October, 1994, ISBN 1-56677-089-0. The objective of the volume is to facilitate the presentation and discussion of the recent developments in the areas of long wavelength infrared detection, focal plane arrays and their applications. In particular the advances in the areas of novel multiquantum well and superlattice detectors using semiconductors of group III-V, II-VI, etc, and their related processing fabrication issues are addressed. It is a forum where the theoretical analysis, modeling, structural and optical properties, fabrication, and device properties are br ought into focus with the potential applications and the cost factors. Out of Print.
Electrochemically Deposited Thin Films II, M. Paunovic, editor, PV 94-31 - Hardbound, Miami Beach, Florida - October, 1994, ISBN 1-56677-090-4. This volume treats all aspects of deposition processes, structure, and properties of electrochemically deposited thin films. Films up to 5 um thick are considered as thin films. It contains original papers on the electrodeposition and electroless deposition in the following areas: 1. nucleation; 2. growth; 3. structure; 4. properties; 5. interfaces; 6. interdiffusion; 7. reactions; 8. applications, and 9. future trends. Out of Print.
Electrochemical Microfabrication II, M. Datta, K. G. Sheppard and J. O. Dukovic, editors, PV 94-32 - Hardbound, Miami Beach, Florida - October, 1994, ISBN 1-56677-091-2. This volume focuses on electrochemical processes for microfabrication applied to microelectronics, electroforming, micromechanics, sensors, etc. Papers discuss new understanding of both the science and technology of electrochemical microfabrication. Examples of specific topics include: through-mask etching and plating (including electroless), maskless jet and laser-jet etching and electrodeposition localized photoelectrochemical etching and deposition, porous silicon, applications of scanning tunneling probes to the fabrication of nanostructures by localized deposition and etching. Out of Print.
Diagnostic Techniques for Semiconductor Materials and Devices III, D. K. Shroder, P. Rai-Choudhury and J. L. Benton, editors, PV 94-33 - Hardbound, Miami Beach, Florida - October, 1994, ISBN 1-56677-092-0. Diagnostic characterization techniques for semiconductor materials, devices, and device processing are addressed in this volume covering new techniques as well as advances in methods routinely applied to semiconductor process development and problem solving emerging technologies such as atomic force microscopy, resonance ionization spectroscopy (laser-assisted SIMS), accelerator-based mass spectroscopy, charged particle activation analysis, scanning photoluminescence, electroreflectance, and surface photovoltage measurements are discussed. Also discussed are theapplication of standard methods of monitoring such as lifetime measurements spreading resistance, scanning, auger micros copy, EBIC, DLTS, Rutherford backscattering spectroscopy, and cross-section TEM to specific problems in materials growth, processing, or device failure. Out of Print.
State-of-the-Art Program on Compound Semiconductors XXI, S. N. G. Chu, V. Malhotra, P. Van Daele and C. Kusano, editors, PV 94-34, Miami Beach, Florida - October, 1994, ISBN 1-56677-093-9. The volume addresses the most recent developments in compound semiconductors encompassing the areas of materials growth and processing, thin film and device fabrication, process control, and in situ and ex situ characterization techniques. Emphasis is on such topics as advances in epitaxial growth techniques, ion-beam processing, dry/wet etching, metal and dielectric thin films on III-Vs, in situ optical probes, surfaces and interfaces, doping profile control, materials and device characterization, and processing and packaging effects of device performance and reliability. Novel device concepts and properties are also discussed. Out of Print.
Thin Film Transistor Technologies II, Y. Kuo, D. G. Ast, M. Hack, M. Matsumura, M. Le Contellec and E. Lueder, editors, PV 94-35, Miami Beach, Florida - October, 1994, ISBN 1-56677-094-7. The following is a partial list of topics that are addressed in the volume: 1. new TFT structures; 2. novel processing techniques; 3. thin film materials; 4. device characterization; 5. TFT applications; 6. integration of TFT to large areas. Out of Print.
Back to Date Table