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Electrodeposition Division


established December 16, 1921

Major interests of the Electrodeposition Division include fundamental aspects of electrochemical deposition of metals and alloys, structure and properties of deposits, and technological applications of electrochemically produced metals and alloys. Electrochemical deposition involves reduction of metallic ions from aqueous, inorganic, and fused salt electrolytes. The reduction process M^z+(solution) + zc -> M(lattice) can be accomplished by the electrodeposition process in which z electrons are supplied by an external power supply or by electroless (autocatalytic) deposition process in which a reducing agent in the solution is the electron source (there is no external power supply). There are two types of fundamental problems involved with the above equation: (i) kinetics and mechanism of the process, and (ii) nucleation and growth of the lattice (M(lattice)). In the research on fundamental aspects of the kinetics and mechanism of special interest are basic kinetic steps: charge transfer or ion discharge to form a neutral adatom or partly charges adion at the substrate surface and surface diffusion of adatom and adion. Interfacial electrochemistry (charge distribution across interface and the structure of the doublelayer) and various aspects of materials science are of great importance for understanding the above fundamental problems.

In the area of structure and properties of deposits of special interest are grain size, texture (preferred orientation), and correlation between structure and physical and chemical properties of deposits. A few examples of applications of electrochemical deposition include: printed circuit boards, magnetic alloys for computer memories, coatings for hard disk drives, wear resistant coatings, corrosion resistant alloys, metal matrix composites, electroreformed laser mirrors, electrochromic materials, decorative coatings, oxides, and organic polymers.

 

News — September 2014

Electrodeposition Division Research Award — The Research Award of the Electrodeposition Division recognizes recent outstanding achievement or contribution in the field of electrodeposition. The award, consisting of a scroll and $2,000 is given annually at the fall Society meeting. Submit nominations in a letter detailing the accomplishments of the nominee accompanied by a list of supporting publications with titles to:
Attn: Electrodeposition Research Award
c/o The Electrochemical Society
65 S. Main Street, Building D
Pennington, NJ 08534

Phone: 609-737-1902 | Fax: 609-737-2743 | e-mail: awards@electrochem.org

Electronic submission of nomination packets is preferred.

The nomination deadline for next year’s Award is April 1, 2015.

The recipient of the 2014 Electrodeposition Division Research is Alan C. West - from Columbia University, USA. Join us to honor Dr. West at the Electrodeposition Division Luncheon on Wednesday, October 8 (admission with ticket), which will be followed by his award address in the D2 symposium “Mathematical Modeling in Electrodeposition Studies”.

Student Travel Grants — In the 2014 Spring and Fall meetings seven $750 student travel grants were awarded. The recipients are:

Spring 225th ECS meeting:

  1. Bharat Gattu, University of Pittsburgh, Pittsburgh USA
  2. Stephen Ambrozik, SUNY at Binghamton, USA
  3. Yoonsung Chung , Auburn University, Auburn, USA
Fall 226th ECS meeting:
  1. Ms Claudia Berger, Institute of Electrochemistry, Ulm University, Germany
  2. David Richardson, University Limerick, Ireland
  3. Lu Yu, Case Western Reserve, Cleveland, USA
  4. Michael Clark, Univ. of Alberta, Canada

The recipients of the student travel grants for the Spring and Fall 2014 meetings will be acknowledged at the division luncheon on Wednesday, October 8 (admission with ticket).

For future ECS meetings travel grants ($750) are also available. The grant shall be presented to a graduate student of demonstrated ability in electrodeposition research to assist his or her travel to an ECS meeting at which he or she is presenting a paper or a student poster in a sponsored or cosponsored Electrodeposition Division symposium. These are competitive grants. For more information or to submit an application for a student travel grant, please visit the travel grant site by clicking here. Please note that while you may download, complete and send the travel grant application by traditional means, utilizing the online system is preferred.

 

Future Electrodeposition Division Symposia

Spring 2015 — Chicago, Illinois, USA

E01- Electrodeposition for Micro- and Nano-Battery MaterialsE01 - Metallization of Flexible Electronics /Electrodeposition / Electronics and Photonics / Solvay Specialty Polymers/
     Lead organizers: Luca Magagnin, Yosi Shacham-Diamand, Takayuki Homma, Paula Cojocaru,
     Andrew Hoff, Vincenzo Arcella, and Giovanni Zangari

E02 - Surfactant and Additive Effects on Thin Film Deposition, Dissolution and Particle Growth /Electrodeposition / Battery / Physical and Analytical Electrochemistry/
     Lead organizers: Thomas P. Moffat, Rohan Akolkar, Qiang Huang, and Ji-Guang Zhang

co-sponsoring

F04 - High Rate Metal Dissolution Processes 2 /Industrial Electrochemistry and Electrochemical Engineering / Corrosion / Electrodeposition/
     Lead organizers: EJ Taylor, Stojan Djokic, John Harb, and Maria Inman

G02 - Processes at the Semiconductor Solution Interface 6 /Electronics and Photonics / Dielectric Science and Technology / Electrodeposition / Energy Technology / Physical and Analytical Electrochemistry/
     Lead organizers: Colm O'Dwyer, D. Noel Buckley, Arnaud Etcheberry, Andrew C. Hillier,
     Robert P. Lynch, Philippe Vereecken, Heli Wang, and Oana Leonte

Fall 2015 — Phoenix, Arizona, USA

E01 - Current Trends in Electrodeposition - An Invited Symposium /Electrodeposition/
     Lead organizer: C. Bonhote

E02 - Fundamentals of Electrochemical Growth and Surface Limited Deposition /Electrodeposition / Physical and Analytical Electrochemistry/
     Lead organizers: R. Brankovic, J. Stickney, Natasa Vasiljevic, and Nikolay Dimitrov

E03 - Novel Design and Electrodeposition Modalities 2 /Electrodeposition/
     Lead organizers: Elizabeth Podlaha and Qiang Huang

E04 - Semiconductors, Metal Oxides, and Composites: Metallization and Electrodeposition of Thin Films and Nanostructures III /Electrodeposition/
     Lead organizers: J. Fransaer, P.M. Vereecken, and G. Oskam

co-sponsoring

D03 - Photovoltaics for the 21st Century 11 Dielectric Science and Technology / Electrodeposition / Electronics and Photonics / Energy Technology / Industrial Electrochemistry and Electrochemical Engineering / Physical and Analytical Electrochemistry/
     Lead organizers: : Meng Tao, Hiroki Hamada, C. Claeys, L. Deligianni, Jim Fenton, H. Hamada,
     J.-G. Park, K. Rajeshwar, and Theodore Druffel

F02 - Industrial Opportunities and Challenges in Electrochemical Engineering /Industrial Electrochemistry/ Electrochemical Engineering / Electrodeposition/
     Lead organizers: Mark Orazem, Gerardine Botte, EJ Taylor, and Giovanni Zangari


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