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Electrodeposition Division

established December 16, 1921

Major interests of the Electrodeposition Division include fundamental aspects of electrochemical deposition of metals and alloys, structure and properties of deposits, and technological applications of electrochemically produced metals and alloys. Electrochemical deposition involves reduction of metallic ions from aqueous, inorganic, and fused salt electrolytes. The reduction process M^z+(solution) + zc -> M(lattice) can be accomplished by the electrodeposition process in which z electrons are supplied by an external power supply or by electroless (autocatalytic) deposition process in which a reducing agent in the solution is the electron source (there is no external power supply). There are two types of fundamental problems involved with the above equation: (i) kinetics and mechanism of the process, and (ii) nucleation and growth of the lattice (M(lattice)). In the research on fundamental aspects of the kinetics and mechanism of special interest are basic kinetic steps: charge transfer or ion discharge to form a neutral adatom or partly charges adion at the substrate surface and surface diffusion of adatom and adion. Interfacial electrochemistry (charge distribution across interface and the structure of the doublelayer) and various aspects of materials science are of great importance for understanding the above fundamental problems.

In the area of structure and properties of deposits of special interest are grain size, texture (preferred orientation), and correlation between structure and physical and chemical properties of deposits. A few examples of applications of electrochemical deposition include: printed circuit boards, magnetic alloys for computer memories, coatings for hard disk drives, wear resistant coatings, corrosion resistant alloys, metal matrix composites, electroreformed laser mirrors, electrochromic materials, decorative coatings, oxides, and organic polymers.


News — September 2013

Electrodeposition Division Research Award — The Research Award of the Electrodeposition Division recognizes recent outstanding achievement or contribution in the field of electrodeposition. The award, consisting of a scroll and $2,000 is given annually at the fall Society meeting. Submit nominations in a letter detailing the accomplishments of the nominee accompanied by a list of supporting publications with titles to: Attn: Electrodeposition Research Award
c/o The Electrochemical Society
65 S. Main Street, Building D
Pennington, NJ 08534

Phone: 609-737-1902 | Fax: 609-737-2743 | e-mail:

Electronic submission of nomination packets is preferred.

The nomination deadline for next year’s Award is April 1, 2014.

The recipient of the 2013 Electrodeposition Division Research is Daniel Lincot - from EDF-CNRS-Chimie Paris Tech, France. Join us to honor Dr. Lincot at the Electrodeposition Division Luncheon on Wednesday, October 30 (admission with ticket), which will be followed by his award address in the F1 symposium “30 Years of Electrodeposition of Semi-conductors for Industrial Applications : Dreams, Realities and Dreams Again”.

Student Travel Grants — In the 2013 Spring and Fall meetings seven $750 student travel grants were awarded. The recipients are:

Spring 223rd ECS meeting:

  1. Hannah Bondarenko- Belarusian State University, Minsk, Belarus
  2. Shaopen Sun - Northeastern University, Boston
Fall 224th ECS meeting:
  1. Qiuyi Yuan, University of Houston, Houston, TX
  2. Lok-kun Tsui, University of Virginia, Charlottesville, VA
  3. Erdal Uzunlar, Georgia Institute of Technology, Atlanta, GA
  4. Burcu Arslan, Department of Metallurgical and Materials Engineering, METU Ankara, Turkey
  5. Marco Alberto Spreafico, Politecnico di Milano Dip. Chimica, Milano, Italy

The recipients of the student travel grants for the Spring and Fall 2013 meetings will be acknowledged at the division luncheon on Wednesday, October 30 (admission with ticket).

For future ECS meetings travel grants ($750) are also available. The grant shall be presented to a graduate student of demonstrated ability in electrodeposition research to assist his or her travel to an ECS meeting at which he or she is presenting a paper or a student poster in a sponsored or cosponsored Electrodeposition Division symposium. These are competitive grants. For more information or to submit an application for a student travel grant, please visit the travel grant site by clicking here. Please note that while you may download, complete and send the travel grant application by traditional means, utilizing the online system is preferred.


Future Electrodeposition Division Symposia

Spring 2014 — Orlando, Florida, USA

Electrodeposition for Micro- and Nano-Battery Materials
     Lead organizers: J. Rohan and S. Mukerjee

Electroless Plating: Principles and Applications 3
     Lead organizers: S. Djokic and J. Stickney

Electrochemical Engineering for the 21st Century 4
     Lead organizers: H. Deligianni and R. Alkire

Fall 2014 — Cancun, Mexico

Magnetic Materials Processes and Devices XIII
     Lead organizer: C. Bonhote

Electrodeposition for Energy Application 3
     Lead organizer: S. R. Brankovic

ELDP as Main Organizer

ELDP as co-organizer

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