207th ECS Meeting - Quebec City, Canada |
May 15 - May 20, 2005 |
PROGRAM INFORMATION |
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J3 - State-of-the-Art Program on Compound Semiconductors XLII |
Electronics and Photonics |
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Tuesday, May 17, 2005 |
Room 302A, Level 3, Quebec City Convention Center |
GaN and Wide Bandgap Materials |
| Co-Chairs: L.J. Chou & Y. Hirose |
| Time | Abs# | Title and Authors |
| 14:00 |
578
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The Use of GaN Based Electronic And Photonic Devices for Bio-Applications
F. Ren (University of Florida) and B. Kang (Univeristy of Florida)
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| 14:30 |
579
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High Performance AlGaN/GaN HFETs for RF Applications
Y. Hirose, T. Murata, M. Hikita, K. Nakazawa, K. Inoue, Y. Uemoto, T. Tanaka and D. Ueda (Matsushita Electric Industrial Co., Ltd.)
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| 15:00 |
580
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Synthesis of GaN Tubular Nanostructures and GaN/CNT/Si/Silicate Nanocables by Metalorganic Chemical Vapor Deposition
L. Chen (National Tsing Hua University)
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| 15:30 |
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Intermission (15 Minutes)
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| 15:45 |
581
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An Overview of Relevant Technology Development for SiC-Based Gas Sensor Systems
G. Hunter (NASA Glenn Research Center), J. Xu, P. Neudeck (NASA Glenn), A. Truneck, L. Chen, D. Spry (OAI), D. Lukco (QSS/NASA Glenn), M. Artale, P. Lampard, D. Androjna (Akima/NASA Glenn), D. Makel (Makel Engineering, Inc), B. Ward (Makel Engineering, Inc.) and C. Liu (Case Western Reserve Univeristy)
|
| 16:15 |
582
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Novel Oxides and Reliability for the Passivation of AlGaN/GaN High Electron Mobility Transistor
B. Gila (Univeristy of Florida), A. Onstine, M. Hlad, A. Gerger, A. Herrero, K. Allums, D. Stodilka, S. Jang, S. Kang, C. Abernathy, F. Ren (University of Florida) and S. Pearton (univ.florida)
|
| 16:45 |
583
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Laser-Synthesis of Optical Structures in Silicon Carbide
Z. Tian (University of Central Florida), N. Quick (AppliCote Associates, LLC) and A. Kar (University of Central Florida)
|
| 17:00 |
584
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Nitrogen Incorporation in GaAsN Grown by Chemical Beam Epitaxy
Y. Ohshita, K. Nishimura, H. Lee, K. Gono, N. Kojima and M. Yamaguchi (Toyota Technological Institute)
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| 17:15 |
585
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Performance and Reliability of InGaN-GaN Light-Emitting Diodes with Mirror Wafer Bonding Technology
W. Peng and Y. Wu (National Chiao Tung University)
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| 17:30 |
586
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Dot Pattern Epitaxial Lateral Overgrowth of GaN by Hydride Vapor Phase Epitaxy
W. Liu, J. Tsay, Y. Guo (industrial Technology Research Institute), H. Liu (National Cheng Kung University) and R. Yeh (industrial Technology Research Institute)
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| 17:45 |
587
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Multi-Energy Oxygen Ion Implantation for AlGaN/GaN HEMT Isolation
J. Shiu, Y. Shoau, J. Huang, Y. Hsieh, C. Chang, C. Lu and E. Chang (Nation Chiao-Tung University)
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Wednesday, May 18, 2005 |
Room 302A, Level 3, Quebec City Convention Center |
High-Speed Device Applications |
| Co-Chairs: L.J. Chen & J.J. Uyeda |
| Time | Abs# | Title and Authors |
| 10:00 |
588
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MMIC Compatible Lateral Deflection RF MEMS Switches
P. Chang-Chien (Northrop Grumman Space Technology)
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| 10:30 |
589
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10 Gb/s and 40 Gb/s Integrated Electroabsorption Modulators On Novel Submounts
Y. Luo, B. Xiong, J. Wang and C. Sun (Tsinghua University)
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| 11:00 |
590
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Multiple Level Plated Gold Interconnect for HEMT Compaction
J. Uyeda, J. Wang, M. Barsky, R. Grundbacher, K. Luo, R. Elmadjian, L. Dang, C. Cheung, D. Li and D. Farkas (Northrop Grumman Space Technology)
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| 11:30 |
591
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In Search Of Higher Density MIM Capacitor for
GaAs RF Applications
J. Yota, R. Ramanathan, K. Kwok, T. Ko (Skyworks Solutions, Inc.), H. Shao (Skyworks Solutions) and J. Arreaga (Skyworks Solutions, Inc.)
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| 11:45 |
592
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Sub-Micron INP Double Heterojunction Bipolar Transistor with Greater than 400GHZ fT and fMAX
P. Chang (Northrop Grumman), D. Sawdai, V. Gambin, X. Zeng, D. Li, J. Yamamoto, K. Loi, G. Leslie, J. Wang, R. Elmadjian, P. Nam, C. Grossman, M. Barsky, A. Gutierrez-Aitken and A. Oki (Northrop Grumman Space Technology)
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Compound Semiconductor Growth and Process Technology |
| Co-Chairs: Y. Luo & N.F. Chen |
| Time | Abs# | Title and Authors |
| 14:00 |
593
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Passivation of III/V-based Compound Semiconductor Devices Using High-Density Plasma Deposited Silicon Nitride Films
R. Sah, M. Mikulla, H. Schneider and G. Weimann (Frauhofer Institut)
|
| 14:30 |
594
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BCB Deep Via Etching Process on ICP Etching System
J. Wang, C. Monier (Northrop Grumman Space Technology), P. Chang (Northrop Grumman), X. Zeng, D. Li, M. Barsky and A. Gutierrez-Aitken (Northrop Grumman Space Technology)
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| 15:00 |
595
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Improvement of III-N Surfaces After Inductively Coupled Plasma Dry Etch Exposure
D. Keogh (University of California, San Diego), R. Dupuis (Georgia Tech), M. Feng (University of Illinois), S. Raychaudhuri and P. Asbeck (University of California, San Diego)
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| 15:15 |
596
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RPCVD Silicon Nitride Passivation of InGaAsP with Temperature Ramping during Deposition
J. Kim (Korea Advanced Institute of Science and Technology)
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| 15:30 |
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Intermission (15 Minutes)
|
| 15:45 |
597
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Space-Growth And Characterization of Semiconductors
N. Chen (Institute of Semiconductors, Chinese Academy of Sciences)
|
| 16:15 |
598
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Growth and Characterization of GaN Nanowires on Silicon(100)
L. Chou, J. Hsieh and S. Chiou (National Tsing Hua University)
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| 16:45 |
599
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In0.3Ga0.7As Plate Crystal Growth for Substrates by the TLZ Method
K. Kinoshita, Y. Ogata, S. Adachi, M. Natsuisaka, T. Ishikawa, T. Masaki and S. Yoda (Japan Aerospace Exploration Agency)
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| 17:00 |
600
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Effects of Interfacial Native Oxide on Electrical Properties of Bonded GaAs Wafers
P. Liu (National Chiao Tung University), C. Lu, W. Peng, Y. Wu (Department of Materials Science and Engineering, National, Chiao Tung University, Hsinchu 300, Taiwan, R.O.C.) and H. Ouyang (National Chung Hsing University)
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| 17:15 |
601
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Selective Area MOVPE for GaAs on (100) Misoriented Substrates
H. Song (The University of Tokyo), X. Song (Research Center for Advanced Science and Technology, The Univ. of Tokyo), M. Sugiyama (Dept. of Electronic Engineering, The Univ. of Tokyo), Y. Nakano (Research Center for Advanced Science and Technology, The Univ. of Tokyo) and Y. Shimogaki (Dept. of Materials Engineering, The Univ. of Tokyo)
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| 17:30 |
602
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Effects of In- , Anti-Phase Bonding and Type of Dopant on The Microstructures of Nano-Scaled Interface and Electrical Properties of GaAs Wafers
H. Ouyang, J. Cheng (National Chung Hsing University) and Y. Wu (National Chiao Tung University)
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| 17:45 |
603
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Inactivation of the Junction Surfaces in SiGe/Si Diodes
F. Hirose and M. Mukaida (Yamagata University)
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Thursday, May 19, 2005 |
Room 302A, Level 3, Quebec City Convention Center |
ZnO Materials and Applications |
| Co-Chairs: V. Gambin & X. Du |
| Time | Abs# | Title and Authors |
| 08:30 |
604
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Electronics Division Award Address- ZnO Spintronics and Nanowire Devices
S. Pearton (univ.florida), D. Norton, Y. Heo, L. Tien, M. Ivill, Y. Li, S. Han (University of Florida), B. Kang (Univeristy of Florida), F. Ren, J. Kelly, A. Hebard (University of Florida), C. Kao and G. Chi (North Carolina State University)
|
| 09:00 |
605
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Polarity-Controlled Growth of High-Quality ZnO Epitaxial Films
X. Du, Q. Xue and J. Jia (Institute of Physics)
|
| 09:30 |
606
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Thermal Stability of Tungsten-Based Schottky Contacts to N-Type ZnO
K. Ip, K. Rohit, D. Norton (University of Florida), S. Pearton (univ.florida), F. Ren, I. Kravchenko (University of Florida), C. Kao and G. Chi (North Carolina State University)
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| 09:45 |
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Intermission (15 Minutes)
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| 10:00 |
607
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Preparation and Properties of ZnO Film on Si(111) Substrate with SiC Buffer Layer Deposited by MOCVD
Z. Fu, J. Zhu and R. Yao (University of Science and Technology of China)
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| 10:30 |
608
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GaN-Based and ZnO Nanorod Sensors for Wireless Hydrogen Leak Detection
J. Lin, A. El Kouche, M. Law, F. Ren, S. Kang (University of Florida), S. Pearton (univ.florida), D. Norton and C. Abernathy (University of Florida)
|
| 11:00 |
609
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Metal Organic Chemical Vapor Deposition of ZnO and MgxZn1-xO Films and Nanostructures
Y. Chen (SuperPower Inc)
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| 11:30 |
610
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Photocatalytic Activity of Visible Light Active Carbon modified (CM)-n-TiO2 Nanoparticles
S. Khan and C. Xu (Duquesne University)
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| 11:45 |
611
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Luminescent and Electric Properties of ZnO:Li Films Derived by Sol-gel
B. Lin, R. Zhou and Z. Fu (university of Science and Technology of China)
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