210th ECS Meeting - Cancun, Mexico

October 29 - November 03, 2006

PROGRAM INFORMATION
 

E11 - Science and Technology of Dielectrics for Active and Passive Devices

Dielectric Science and Technology
 

Tuesday, October 31, 2006

Universal Ballroom, 2nd Floor, Expo Center

Tuesday Evening Poster Session

Co-Chairs: K. Worhoff and P.Mascher
TimeAbs#Title and Authors
o 1334 Dielectric Relaxation in PbF2 - Doped and X-Irradiated CaF2 Crystals I. Nicoara, M. Munteanu, N. Pecingina-Garjoaba, M. Stef and L. Lighezan (West University of Timisoara)
o 1335 Ultra-Fast All-Optical Wavelength Conversion in Silicon Waveguides using Femtosecond Pulses R. Dekker, R. Dekker (University of Twente), J. Niehusmann, M. Foerst (RWTH Aachen) and A. Driessen (University of Twente)
o 1336 Resistive Switching in Pt/Al2O3/TiO2/Ru Stacked Structures K. Kim, B. Choi, B. Koo, S. Choi and C. Hwang (Seoul National University)
o 1337 Structure and Electrical Properties of Reactively rf-Sputtered nc-TiO2-Delta (-0.04 < or Equal to Delta < or Equal to 0.2) Thin Films D. M. Comedi (CONICET), M. Villafuerte, G. Juárez and S. Heluani (Universidad Nacional de Tucumán)
o 1338 Demonstration for Short PLC-Based Network Construction of Low-Loss High-Amount-Port Nonblocking Matrix Switches D. Sun (Changchun Institute of Optics), Y. Zha (Tianjin University), Y. Zhang, X. Li, W. Deng (Changchun Institute of Optics) and X. Fu (Changchun University of Science and Technology)
 

Thursday, November 2, 2006

Universal 16, 1st Floor, Expo Center

Light Emitting Structures

Co-Chairs: K. Worhoff and S. Janz
TimeAbs#Title and Authors
08:15 Introductory Remarks (5 Minutes)
08:20 1339 Formation of and Light Emission from Si Nanocrystals Embedded in Amorphous Silicon Oxides D. M. Comedi (CONICET), O. Zalloum, D. Blakie, J. Wojcik and P. Mascher (McMaster University)
09:00 1340 Influence of Interface Recombination in Light Emission from Lateral Si-Based Light Emitting Devices T. Hoang, P. LeMinh, J. Holleman (University of Twente) and J. Schmitz (MESA+ Institute for Nanotechnology, University of Twente)
09:20 1341 Optimization of Low-Loss Al2O3 Waveguide Fabrication for Application in Active Integrated Optical Devices K. Worhoff, F. Ay and M. Pollnau (University of Twente)
09:40 Intermission (20 Minutes)
 

Dielectric Materials for Photonic Devices

Co-Chairs: M. Charlton and D. Comedi
TimeAbs#Title and Authors
10:00 1342 Dielectric Properties of CaCu3Ti4O12 and Related Phases D. C. Sinclair, M. Ferrarelli, A. West and M. Li (University of Sheffield)
10:40 1343 Application of Positron Annihilation to the Study of Defects in Dielectric Films Y. Kobayashi (National Institute of Advanced Industrial Science and Technology (AIST))
11:20 1344 Azimuth Dependence of Light-Induced Ultrafast Insulator-to-Metal Phase Transition in VO2 Thin Film H. Liu, S. Lysenko (UPRM), V. Vikhnin (Ioffe Institute of Physics, Russia), A. Rua and F. Fernandez (UPRM)
11:40 1345 Porogen Approach for the Fabrication of Carbon-Containing Nanoporous Silicon Oxide Films T. Oka, K. Ito, C. He, T. Ohdaira, R. Suzuki and Y. Kobayashi (National Institute of Advanced Industrial Science and Technology (AIST))
 

Novel Device Technologies

Co-Chairs: Y. Kobayashi and D. Sinclair
TimeAbs#Title and Authors
14:00 1346 Silicon Microphotonic Waveguide Technology for Sensing, Spectroscopy and Communications S. Janz (National Research Council Canada)
14:40 1347 Organising Light on the Nano-Scale: Surface Plasmon Engineering for Repeatable SERS Sensing and Applications for Trace Analyte Detection M. D. Charlton (Mesophotonics Ltd), C. Netti, M. Zoorob (Mesophotonics Ltd 2 Venture Rd, Chilworth Science Park, Southampton UK SO167NP), N. Perney and J. Baumberg (School of Physics and Astronomy, University of Southampton, SO17 1BJ, Southampton, UK)
15:20 Intermission (20 Minutes)
 

Processing and Heterogeneous Integration

Co-Chairs: D. Misra and P.Mascher
TimeAbs#Title and Authors
15:40 1348 Thin Film III-V Devices Integrated on Silicon-on-Insulator Waveguide Circuits G. Roelkens, J. Brouckaert, D. Van Thourhout and R. Baets (Ghent University)
16:00 1349 Novel Low-Dielectric Constant Photodefinable Polyimides for Low-Temperature Polymer Processing C. Henderson, M. Romeo, K. Yamanaka (Georgia Institute of Technology) and K. Maeda (Central Glass Co. Ltd.)
16:20 1350 Reactive Ion Etching of Y2O3 Films Applying F-, Cl-and Cl/Br-Based Inductively Coupled Plasmas K. Worhoff, J. Bradley, F. Ay and M. Pollnau (University of Twente)
16:40 1351 Low Drive-Voltage and High-Bandwidth Electro-Optic Modulators Based on BaTiO3 Thin-Film Waveguides D. Sun (Changchun Institute of Optics) and X. Fu (Changchun University of Science and Technology)
17:20 Concluding Remarks (5 Minutes)