214th ECS Meeting - Honolulu, HI |
October 12 - October 17, 2008 |
PROGRAM INFORMATION |
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E10 - Science and Technology of Dielectrics for Active and Passive Devices |
Dielectric Science and Technology |
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Monday, October 13, 2008 |
Room 308B, Level 3, Hawaii Convention Center |
Nanomaterials for Photonic Applications |
| Co-Chair(s): Kenji Shiraishi |
| Time | Abs# | Title and Authors |
| 10:00 |
2146
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Electronic States of P Donors in Si Nanocrystals embedded in SiO2 studied by Electron Spin Resonance and Photoluminescence - Hydrogen Passivation Effects -
K. Murakami (Institrute of Applied Physics)
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| 10:40 |
2147
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Optical Spectroscopy of Individual Semiconductor Nanomaterials for Photonics Applications
Y. Kanemitsu (Kyoto University)
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| 11:20 |
2148
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Photonic, Electronic, and Acoustic Devices Based on Nanocrystalline Silicon
N. Koshida and B. Gelloz (Tokyo Univ. Agr.&Tech.)
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Tuesday, October 14, 2008 |
Room 308B, Level 3, Hawaii Convention Center |
Thin film dielectrics |
| Co-Chair(s): Durga Misra |
| Time | Abs# | Title and Authors |
| 08:40 |
2149
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Doped HfO2 and ZrO2 - Phase Stabilization and Electrical Characterization
J. Heitmann (Qimonda Dresden), U. Schröder (Qimonda), M. Kerber (Infineon) and E. Erben (Qimonda)
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| 09:20 |
2150
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Compositional Phase Transition of Amorphous AlON
S. Yoshida (Panasonic Corporation), K. Orita (Smiconductor Device Research Center), Y. Hasegawa, A. Mochida (Discrete Business Unit) and S. Takigawa (Smiconductor Device Research Center)
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| 09:40 |
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Intermission (20 Minutes)
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| 10:00 |
2151
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Interfacial Dipole Measurement of Dielectric/Silicon Interface by X-ray Photoelectron Spectroscopy
K. Kakushima, K. Okamoto, K. Tachi, S. Sato, J. Song, T. Kawanago, P. Ahmet, N. Sugii, K. Tsutsui, T. Hattori and H. Iwai (Tokyo Institute of Technology)
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| 10:40 |
2152
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Hysteresis in Cyclically Bended Organic Thin Film Transistors by Using Al2O3 Nano-laminated Gate Dielectrics
Y. Seol, H. Noh, N. Lee (Sungkyunkwan University), C. Lee (Pohang University of Science and Technology) and H. Kim (POSTECH (Pohang University of Science and Technology))
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| 11:00 |
2153
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Metal-Insulator-Metal Capacitors Using Atomic Layer Deposited Al2O3 and HfO2 Dielectrics
I. Park, S. Yoon, J. Ahn (Hanyang Univeristy), K. Kim and J. Choi (Quros)
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Coral Exhibit Hall, Mid-Pacific Conference Center, Hilton Hawaiian Village |
Poster Session |
| Time | Abs# | Title and Authors |
| o |
2154
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Instability of Chemical Composition in PECVD BPSG film
Y. V. Sokolov and Q. Wang (Fairchild Semiconductor Corp)
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| o |
2155
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Study of Oxygen Vacancies Role in Damage of Crystal Structure and Optic Properties of SrTiO3
G. Gorbenko (Classical Private University)
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Wednesday, October 15, 2008 |
Room 308B, Level 3, Hawaii Convention Center |
Silicon nanocrystals for active photonics I |
| Co-Chair(s): Peter Mascher |
| Time | Abs# | Title and Authors |
| 08:00 |
2156
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Efficient Light Emission from Erbium Doped Si Nanoclusters and Erbium Silicates
M. Miritello (MATIS-CNR INFM and University of Catania), R. Lo Savio, A. Irrera (MATIS CNR-INFM and Dipartimento di Fisica e Astronomia dell'Università di Catania), F. Iacona (CNR-IMM), G. Franzò (MATIS CNR-INFM and Dipartimento di Fisica e Astronomia dell'Università di Catania), M. Galli, M. Belotti, L. Andreani (Dipartimento di Fisica) and F. Priolo (MATIS CNR-INFM and Dipartimento di Fisica e Astronomia dell'Università di Catania,)
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| 08:40 |
2157
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Optical Spectroscopy of Er-doped Si Nanostructures
T. Gregorkiewicz (University of Amsterdam)
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| 09:20 |
2158
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Silicon Nanocrystals Light-Emitters for Optical Interconnects
H. Cheong, Y. Nakamine, D. Hippo, K. Uchida and S. Oda (Tokyo Institute of Technology)
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| 09:40 |
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Intermission (20 Minutes)
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| 10:00 |
2159
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Nano Silicon for Photonics
L. Pavesi (Nanoscience Laboratory)
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| 10:40 |
2160
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A Study of Silicon Nanocluster Formation in Silicon Oxynitrides through X-ray Absorption Spectroscopy
T. Roschuk, P. R. Wilson, J. Wojcik and P. Mascher (McMaster University)
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| 11:00 |
2161
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Nonlinear Optical Devices by using Nano-domain Engineering
M. Minakata and H. Awano (Shizuoka University)
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Silicon nanocrystals for active photonics II |
| Time | Abs# | Title and Authors |
| 14:00 |
2162
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Sensitization of Er Ions by Si Nanocrystals in Er and Si Nanocrystals Co-doped Silicon Dioxide
M. Fujii (Kobe University)
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| 14:40 |
2163
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Erbium-coupled Silicon Nanocrystals in Silicon Nitride: Light Emission Enhancement in Aperiodic Photonic Structures
L. Dal Negro, R. Lu, J. Warga, A. Gopinath and S. Boriskina (Boston University)
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| 15:20 |
2164
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The Effects of Deposition and Processing Parameters on the Electronic Structure and Photoluminescence from Nitride-Passivated Silicon Nanoclusters
P. R. Wilson, T. Roschuk, O. Zalloum, J. Wojcik and P. Mascher (McMaster University)
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| 15:40 |
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Concluding Remarks (10 Minutes)
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