214th ECS Meeting - Honolulu, HI |
October 12 - October 17, 2008 |
PROGRAM INFORMATION |
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E13 - Thin Film Transistors 9 (TFT 9) |
Electronics and Photonics |
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Monday, October 13, 2008 |
Room 302A, Level 3, Hawaii Convention Center |
Introduction and TFT-Based Systems |
| Co-Chair(s): Y. Kuo |
| Time | Abs# | Title and Authors |
| 10:00 |
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Introductory Remarks (5 Minutes)
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| 10:05 |
2263
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A Fully Monolithic Wireless Display System
E. Zyambo, L. Lukama (Sharp Laboratories of Europe Limited), C. Brown, K. Miyata (Sharp Corporation, Japan) and M. Brownlow (Sharp Laboratories of Europe Limited)
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| 10:35 |
2264
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Large Area AMOLEDs based on Sequential Lateral Solidification Process
C. Kim (Samsung Electronics Co.), J. Choi (Samsung Electronics Co., LTD.), Y. Chang, X. Huang and J. Lee (Samsung Electronics Co., LTD)
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TFT Devices |
| Co-Chair(s): M. Shur and C.-W. Kim |
| Time | Abs# | Title and Authors |
| 11:05 |
2265
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Issues in Microcrystalline Silicon TFTs Processed at T<200oC
T. Mohammed-Brahim, K. Kandoussi (Rennes 1 University), N. Coulon (Université de Rennes 1) and C. Simon (Rennes 1 University)
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| 11:35 |
2266
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The Characteristics of Hot-Carrier Stressed Bottom-Gate Polycrystalline Silicon Thin-Film Transistors Employing Alternating Magnetic-Field-Enhanced Rapid Thermal Annealing
W. Lee, H. Shin (Seoul National University), K. Cho, J. Choi, C. Kim (Samsung Electronics Co.) and M. Han (Seoul National University)
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TFT Devices (continued) |
| Time | Abs# | Title and Authors |
| 14:00 |
2267
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Extraction of the Density of Interface Trap States in Thin-Film Transistors
H. Tsuji, Y. Kamakura and K. Taniguchi (Osaka University)
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| 14:20 |
2268
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A DLTS Study of Band Gap States in SLS poly-Si TFTs
L. Michalas, G. Papaioannou (University of Athens) and A. Voutsas (Sharplabs of America)
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| 14:40 |
2269
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Visible Light Source Disturbing the Source/Drain Current of CLC Poly-Si n-TFT Device
M. Wang, Z. Hsieh (Ming-Hsin University of Science and Technology), C. Chen (National Chiao Tung University), J. Shieh (National Nano Device Laboratories), Y. Lin (National Chiao Tung University) and H. Huang (National Taipei University of Technology)
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| 15:00 |
2270
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Enhanced Drain Current Ripple Variation with Vertical and Horizontal Electrical Fields under Optical Illumination
M. Wang, Z. Hsieh, Y. Chu (Ming-Hsin University of Science and Technology), C. Chen (National Chiao Tung University), J. Shieh (National Nano Device Laboratories) and Y. Lin (National Chiao Tung University)
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| 15:20 |
2271
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A Mobility Model for Non Isotropic OTFT
R. Picos (UIB), B. Iñiguez (Universitat Rovira i Virgili), E. Garcia-Moreno (UIB), M. Deen (McMaster University) and M. Estrada (Cinvestav)
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| 15:40 |
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Intermission (20 Minutes)
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TFT Reliability |
| Co-Chair(s): S. Uchikoga |
| Time | Abs# | Title and Authors |
| 16:00 |
2272
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Analysis of the Hysteresis Behavior in Poly-Si TFTs Using On-the-Fly Measurement
T. Kawamura (Hitachi, Ltd., Central Research Laboratory), H. Uchida (MEITEC Corporation), M. Matsumura, H. Kageyama and M. Hatano (Hitachi, Ltd., Central Research Laboratory)
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| 16:20 |
2273
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Reliability Analysis of Single Grain Si TFT using 2D Simulation
A. Baiano, J. Tan, R. Ishihara and K. Beenakker (TUDelft)
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| 16:40 |
2274
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Instability Behavior of Oxide-Based Top-Gate TFTs under Electrical and Optical Stress Test
J. Cho, J. Jeong and Y. Hong (Seoul National University)
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Tuesday, October 14, 2008 |
Room 302A, Level 3, Hawaii Convention Center |
Advanced Processes |
| Co-Chair(s): M. Hatano, O. Bonnaud, and Z. Bao |
| Time | Abs# | Title and Authors |
| 08:00 |
2275
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Recent Progresses in Ultrahigh-Performance TFT Technologies --- Advanced PMELA Method and its TFT Application ---
T. Endo (ALTEDEC)
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| 08:30 |
2276
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Crystallinity and Internal Strain of One-Dimensionally Long Si Grains by CW Laser Lateral Crystallization
S. Fujii, S. Kuroki, X. Zhu, M. Numata, K. Kotani and T. Ito (Tohoku University)
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| 08:50 |
2277
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Formation of Location-Controlled Germanium Grains by Excimer Laser
A. Baiano, R. Ishihara, J. Van der Cingel and K. Beenakker (TUDelft)
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| 09:10 |
2278
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The AMOSFET - A Simple, High Performance FET for Thin Films, Nanowires, and Nanoribbons
P. Garg, Y. Hong (The Penn State University), M. Iqbal (Cambridge University) and S. J. Fonash (Pennsylvania State University)
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| 09:40 |
2279
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Highly-Textured Polycrystalline Silicon TFTs Using Single-Crystalline Si Nanowire Seed Templates
H. Lee, D. Lee, C. Kim, Y. Woo (POSTECH) and M. Jo (Pohang University of Science and Technology (POSTECH))
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| 10:00 |
2280
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High Performance Short Channel a-Si:H TFT Device with Cu Electrodes
J. Yang, Y. Ahn, J. Bang, W. Ryu, J. Kim, Y. Kang, J. Yang, Y. Kang and I. Cung (LG Display)
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| 10:20 |
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Intermission (20 Minutes)
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| 10:40 |
2281
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A Vertical Thin Film Transistor Comb Based only on Technology Low Temperature (T<600o)
H. D. Toure (IETR), T. Gaillard, N. Coulon (Université de Rennes 1) and O. Bonnaud (University Rennes 1)
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| 11:00 |
2282
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Highly Stable Bottom-Gate Nanocrystalline Silicon Thin Film Transistor Fabricated Employing ICP-CVD
S. Kim, S. Han (Seoul National University), J. Kwon (Samsung Electronics CO. LTD.), J. Jung (Samsung Advanced Institute of Technology) and M. Han (Seoul National University)
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| 11:20 |
2283
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Formation of Si Nanocrystals in SiOx Films Induced by Thermal Plasma Jet Millisecond Annealing and Its Application to Floating Gate Memory
T. Okada, S. Higashi, H. Kaku, H. Furukawa and S. Miyazaki (Hiroshima University)
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| 11:40 |
2284
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Micro Crystalline Si1-xGex Deposited by Magnetron Sputtering
A. Hiroe, T. Goto (Tohoku University), A. Teramoto and T. Ohmi (New Industry Creation Hatchery Center, Tohoku University)
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Advanced Processes (continued) |
| Co-Chair(s): S. Fonash and T. Someya |
| Time | Abs# | Title and Authors |
| 14:00 |
2285
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Stress Induced Orientation Control by Metal Induced Lateral Crystallization
T. Chen (Delft University of Technology), R. Ishihara and K. Beenakker (TUDelft)
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| 14:20 |
2286
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Using Chemical Oxide Layer to Getter Nickel inside Nickel-Metal-Induced Lateral Crystallization Polycrystalline Silicon
B. Wang, T. Yang, C. Tseng and Y. Wu (National Chiao Tung University)
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| 14:40 |
2287
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Etching Treatment of MILC Poly-Si TFTs Using CF4 Plasma to Improve Electrical Performance
C. Chang, Y. Wu, C. Chen and M. Lai (National Chiao Tung University)
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| 15:00 |
2288
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Improvement of Electrical Characteristics in SPC-Si TFT Employing H2 Plasma Treatment
S. Park, S. Kim, J. Lee, C. Kim and M. Han (Seoul National University)
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| 15:20 |
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Intermission (20 Minutes)
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Organic TFTs |
| Co-Chair(s): C. Williams and S. Tokito |
| Time | Abs# | Title and Authors |
| 15:40 |
2289
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Top-Contact Organic Thin-Film Transistors Fabricated by Picoliter and Sub-Femtoliter Inkjets
T. Sekitani, Y. Noguchi (University of Tokyo), H. Klauk, U. Zschieschang (Max Planck Institute for Solid State Research) and T. Someya (University of Tokyo)
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| 16:10 |
2290
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All-solution-processed Organic Thin-Film Transistor using Inkjet-printed Silver Electrodes
J. Kim (Seoul National University), S. Kwon (Gyeong Sang University), J. Kim (Soeul National University) and Y. Hong (Seoul National University)
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| 16:30 |
2291
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Materials and Processes for Thin Film Flexible Electronics
Z. Bao (Stanford University)
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| 17:00 |
2292
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High Performance Organic Thin Film Transistors made Simple Through Molecular Design and Processing
O. D. Jurchescu, B. Hamadani (National Institute of Standards and Technology), D. Mourey (Penn State University), S. Subramanian, J. Anthony (University of Kentucky), T. Jackson (Penn State University) and D. Gundlach (National Institute of Standards and Technology)
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| 17:20 |
2293
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Solution-Processable Selective Organization of Organic Thin-Film Transistors
T. Minari (RIKEN), M. Kano (Dai Nippon Printing Co. Ltd.), T. Miyadera, S. Wang and K. Tsukagoshi (AIST)
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Coral Exhibit Hall, Mid-Pacific Conference Center, Hilton Hawaiian Village |
Poster Session |
| Co-Chair(s): P.-T. Liu and O. Bonnaud |
| Time | Abs# | Title and Authors |
| o |
2294
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Oxygenated Chalcogenide Thin Film Transistor
K. Song, S. Lee, H. Hong (ETRI) and J. Kim (Department of Physics, University of Incheon)
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| o |
2295
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Low Temperature Post-Annealing of ZnO Thin-Film Transistors with HfO2 Gate Dielectrics
H. Chen (Department of Electrical Engineering National Chi Nan University), B. B. Yeh and W. Chou (National Cheng Kung University)
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| o |
2296
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IGZO Based Thin Film Transistors using MgO-BST Composite Gate Dielectric on PET Substrate for Low Voltage Operating
D. Kim, N. Cho (KAIST), J. Yoo (Korea Advanced Institute of Science and Technology), H. Kim (KAIST) and I. Kim (KIST)
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| o |
2297
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Improving the Electrical Properties of NILC poly-Si Films using Gettering a-SiFfilm Through Contact Holes
C. Hu (National Chiao Tung University)
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| o |
2298
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All-Organic Thin Film Transistor Circuits with Ink-Jet Printed Electrodes
J. Kim, J. Kim, H. Lee, T. Yoon and Y. Kim (Myongji University)
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| o |
2299
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Ink-Jet Printed 6,13-bis (triisopropylsilylethynyl) Pentacene Organic Thin-Film Transistors for Particle Based Electronic Papers
Y. Kim, S. Park (Korea Electronics Technology Institute), S. Park, M. Han (Seoul National University) and J. Han (Korea Electronics Technology Institute)
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| o |
2300
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Organic Field-effect Transistors Based on 2,9-Disustituted Pentacenes
Y. Kunugi, Y. Busujima, M. Ikari (Tokai University), K. Okamoto (Ushio Chemix Co.) and K. Ogino (Tokyo University of Agriculture and Technology)
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| o |
2301
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Nanotube Random Networks for High-performance Flexible Thin-film Type Electronic Systems
Q. Cao and J. Rogers (University of Illinois at Urbana-Champaign)
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| o |
2302
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Ba0.6Sr0.4TiO3 Amorphous Thin Films used as Gate Dielectric in Organic Transistors
G. Dong (Tsinghua University), Y. Lu and Y. Qiu (Department of Chemistry, Tsinghua University)
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| o |
2303
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The Enhancement of SiO2/Si Interface by using Two Step Ammonia Plasma Treatment
D. V. Nguyen, S. Hwang, S. Jung and J. Yi (Sungkuynkwan University)
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| o |
2304
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Effect of Heat-treatment on Reliability of a-Si:H TFTs for integrated Gate Driver Circuits
D. Nam and S. Jeong (LG Display)
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| o |
2305
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Stability of Microcrystalline Silicon TFTs
K. Belarbi, K. Kandoussi (Rennes 1 University), N. Coulon (Université de Rennes 1), C. Simon and T. Mohammed-Brahim (Rennes 1 University)
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| o |
2306
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Mechanisms of Polycrystalline Growth of SiGe in Thermal CVD Processes using Si2H6 and GeF4
A. Kagatsume (Hitachi, Ltd.), I. Suzumura (Hitachi, Ltd., Central Research Laboratory), M. Wakagi (Hitachi, Ltd., Hitachi Research Laboratory) and J. Hanna (Tokyo Institute of Technology)
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| o |
2307
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Properties of Grown Silicon Films by LPCVD and Their Characterization Study for TFT Applications
K. Jang, J. Lee (Sungkyunkwan University), S. Jung (Sungkuynkwan University), B. Choi (Sungkyunkwan University) and J. Yi (Sungkuynkwan University)
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Wednesday, October 15, 2008 |
Room 302A, Level 3, Hawaii Convention Center |
Organic TFTs |
| Co-Chair(s): M. K. Han and E. Zyambo |
| Time | Abs# | Title and Authors |
| 08:00 |
2308
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High-Performance Organic Thin-Film Transistors for Flexible AMOLED Display
S. Tokito (NHK)
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| 08:30 |
2309
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Status and Issues of Organic TFT for Display Applications
C. Kim, I. Kang and I. Chung (LG Display)
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| 09:00 |
2310
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Low-Voltage Organic Thin-Film Transistor With High-κ LaYOx Gate Insulator
C. Deng (Institute of Electronics) and B. Chiou (Institute of Electronics, National Chiao-Tung University)
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| 09:20 |
2311
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Flexible Low-voltage Pentacene Thin-film Transistor with High-k/Low-k Double Polymer Dielectric Layer
K. Lee, K. Lee, M. Oh, J. Choi (Yonsei University), S. Jang, E. Kim (Hongik university) and S. Im (YONSEI University)
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| 09:40 |
2312
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Drain Bias Influence on Light-Induced Threshold Voltage Shift of OTFTs
H. Zan and S. Kao (National Chiao Tung University)
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| 10:00 |
2313
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Improved Air-stability of n-Channel Organic Thin Film Transistors via Surface Modification on Gate Dielectrics
F. Chen, C. Liao (National Chiao Tung University), W. Huang and T. Huang (AU Optronics Corp.)
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| 10:20 |
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Intermission (20 Minutes)
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Metal Oxide TFTs |
| Co-Chair(s): A. Mimura and F. Yan |
| Time | Abs# | Title and Authors |
| 10:40 |
2314
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Highly Stable ZnO TFT
S. K. Park, C. Hwang (ETRI), M. Ryu (Electronics and Telecommunications Research lnstitute), J. Shin, S. Yang, S. Yoon and H. Chu (ETRI)
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| 11:10 |
2315
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Improvement of Current Stability of Amorphous Oxide Thin-Film Transistors using SOG Passivation
C. Kim, S. Kim and S. Kim (SAIT)
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| 11:30 |
2316
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High Performacne InGaZnO4-based Thin film Transistors Fabricated at Low Temperature
W. Lim, Y. Wang, J. Lee, D. P. Norton, F. Ren and S. J. Pearton (University of Florida)
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| 11:50 |
2317
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High-Performance Oxide Thin Film Transistors Passivated by Various Gas Plasmas
S. Kim (SAIT), J. Park (Samsung Advanced Institute of Technology), C. Kim, S. Kim, I. Song, H. Yin, J. Lee, E. Lee and Y. Park (SAIT)
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| 12:10 |
2318
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Stability Improvement of Gallium Indium Zinc Oxide Thin Film Transistors by Post-Thermal Annealing
J. Jung, K. Son, T. Kim, M. Ryu, K. Park, B. Yoo, S. Lee (Samsung Advanced Institute of Technology) and J. Kwon (Samsung Electronics CO. LTD.)
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TFTs on Flexible Substrates |
| Co-Chair(s): G. R. Chaji and S.-H. K. Park |
| Time | Abs# | Title and Authors |
| 14:00 |
2319
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Flexible TFT on a Heat Resistant Transparent Polymer with the Standard a-Si TFT Process over 300ºC
T. Hattori, M. Kato (Hitachi, Ltd., Central Research Laboratory), M. Wakagi (Hitachi, Ltd., Hitachi Research Laboratory), T. Yoshida (Hitachi, Ltd., Materials Research Laboratory) and M. Hatano (Hitachi, Ltd., Central Research Laboratory)
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| 14:30 |
2320
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Fabrication of Poly-Si TFTs on Flexible Quartz Fibers
A. Mimura (National Institute of Advanced Industrial Science and Technology (AIST)), T. Nakamura (Furukawa Electric Co. Ltd.), Y. Sugawara (Nara Institute of Science and Technology (NAIST)), Y. Uraoka (NAIST), I. Shuu (Furukawa Electric Co. Ltd.), T. Ikehara, T. Itoh, R. Maeda, K. Suzuki (National Institute of Advanced Industrial Science and Technology (AIST)), A. Nakajima and H. Koaizawa (Furukawa Electric Co. Ltd.)
|
| 15:00 |
2321
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Flexible High Gain Complementary Inverter using n-ZnO and p-pentacene Channels on Plastic Substrate
S. Im, M. Oh and K. Lee (YONSEI University)
|
| 15:20 |
2322
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Direct Fabrication of a-Si:H Thin Film Transistor Arrays on Flexible Plastic Film and Metal Foil Substrates: Critical Challenges and Enabling Solutions
S. O'Rourke, D. Loy, C. Moyer, E. Bawolek, S. Ageno, B. O'Brien, M. Marrs, D. Bottesch, J. Dailey, R. Naujokaitas, J. Kaminski, D. Allee, S. Venugopal, J. Trujillo, R. Cordova, M. Richards, N. Colaneri and G. B. Raupp (Arizona State University)
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| 15:40 |
2323
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The Strain Effects on Flexible a-Si:H TFTs
L. Teng (National Chiao-Tung University), P. Liu, S. Tsai (National Chiao Tung University), I. Peng (National Tsing-Hua University) and Y. Chou (National Chiao Tung University)
|
| 16:00 |
2324
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Effect of Passivation Layer on the Reliability of Flexible a-Si:H TFTs
Y. Chou, P. Liu, S. Tsai, C. Su (National Chiao Tung University) and I. Peng (National Tsing-Hua University)
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| 16:20 |
2325
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Copper Reliability of TFT Array for Flexible Displays
Y. Kuo and G. Liu (Texas A&M University)
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Thursday, October 16, 2008 |
Room 302A, Level 3, Hawaii Convention Center |
New TFT Applications and Circuits |
| Co-Chair(s): T. Hattori and T. Mohammed-Brahim |
| Time | Abs# | Title and Authors |
| 08:00 |
2326
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Sensors Based on Organic Thin Film Transistors
F. Yan (Hong Kong Polytechnic University), S. Mok, P. Lin and H. Chan (Department of Applied Physics, The Hong Kong Polytechnic University)
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| 08:30 |
2327
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An Image Sensor using Photo-leakage Current and Feed-through Voltage of amorphous Si Thin-Film Transistors
Y. Hara, A. Kinno and S. Uchikoga (Toshiba Corporation)
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| 08:50 |
2328
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Development of Integrated Electronics on Silicon-on-Glass (SiOG) Substrate
R. Manley, G. Fenger, P. Meller, K. Hirschman (Rochester Institute of Technology), C. A. Kosik Williams, D. Dawson-Elli (Corning Incorporated), J. Couillard (Corning Incorporate) and J. Cites (Corning Incorporated)
|
| 09:10 |
2329
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Stable Pixel Circuit for Small-Area High-Resolution a-Si:H AMOLED Displays
G. Chaji (Ignis Innovation Inc.) and A. Nathan (University College London)
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| 09:40 |
2330
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Compensation Pixel Circuit Using LTPS TFT For AMOLED Displays
P. Liu, L. Chu and Y. Huang (National Chiao Tung University)
|
| 10:00 |
2331
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Analog Circuits Design using Polycrystalline Silicon TFTs
E. Jacques, F. Le Bihan, S. Crand and T. Brahim (Université de Rennes 1)
|
| 10:20 |
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Concluding Remarks (10 Minutes)
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