216th ECS Meeting - Vienna, Austria |
October 4 - October 9, 2009 |
PROGRAM INFORMATION |
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F5 - Semiconductors, Metal Oxides, and Composites: Metallization and Electrodeposition of Thin Films and Nanostructures |
Electrodeposition |
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Tuesday, October 6, 2009 |
Room D357, Level U2 - Blue |
Electrodeposition of materials for energy applications |
| Co-Chair(s): G. Oskam and K. Rajeshwar |
| Time | Abs# | Title and Authors |
| 08:10 |
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Introductory Remarks (10 Minutes)
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| 08:20 |
2717
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Adventures in Electrodeposition of Semiconductors for Solar Applications
K. Rajeshwar and N. De Tacconi (University of Texas)
|
| 09:00 |
2718
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Fabrication and Properties of Three-Dimensionally Structured CdTe Thin Film Photovoltaic Devices with Self-Aligned Back-Contacts
D. Josell, C. Beauchamp, S. Jung, B. Hamadani, L. J. Richter, J. Bonevich, N. Zhitenev, T. P. Moffat and J. Guyer (NIST)
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| 09:20 |
2719
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One-Step Electrodeposited Cu-In-Ga Thin Films and Cu(In,Ga)Se2 Absorber Synthesis for Solar Cells
L. Ribeaucourt, E. Chassaing, G. Savidand and D. Lincot (Institute of R&D on Photovoltaic Energy)
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| 09:40 |
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Intermission (20 Minutes)
|
| 10:00 |
2720
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Electrodeposition of Porous ZnO on Textile Microelectrodes
M. Rudolph, T. Loewenstein (Justus-Liebig-Universität Gießen), Y. Zimmermann, A. Neudeck (Textilforschungsinstitut Thüringen-Vogtland e.V.) and D. Schlettwein (Justus-Liebig-Universität Gießen)
|
| 10:20 |
2721
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(111)-Oriented p-Copper Oxide Electrodeposits with Band-Edge-Emission
M. Izaki, S. Sasaki (Toyohashi University of Technology), S. Watase (Osaka Municipal Technical Research Institute) and J. Sasano (Toyohashi University of Technology)
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| 10:40 |
2722
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Electrodeposition and Impedance Investigation of TiO2-Au Nanocomposites
J. Elhajj and E. J. Podlaha (Northeastern University)
|
| 11:00 |
2723
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Morphology, Structure and Photoelectrocatalytic Activity of TiO2/WO3 Coatings Obtained by Pulsed Electrodeposition onto Metal Substrates
J. Georgieva, E. Valova (Bulgarian Academy of Sciences), S. A. Armyanov (Bulgarian Academy of Sciencies), S. Sotiropoulos (Aristotle University of Thessaloniki), A. Hubin, K. Baert and M. Raes (Vrije Universiteit Brussel)
|
| 11:20 |
2724
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Preparation of α-Fe2O3 on Stainless Steel as Anodes for Li-Ion Thin Film Battery by Electrochemical Method
Z. Dong, W. Shieh, C. Li and S. Yen (National Chung Hsing University)
|
| 11:40 |
2725
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Fine-Line Patterning of Transparent Ga-Doped ZnO Thin Films by Wet-Chemical Etching
N. Yamamoto (Kochi University of Technology), S. Okabe, M. Matsubara (Mitsubishi Gas Chemical Co., Inc.), T. Maruyama (Mitsubishi Gas Chemical Co., Inc.,), H. Makino, T. Yamada, S. Osone and T. Yamamoto (Kochi University of Technology)
|
| 12:00 |
2726
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Electrodeposition of Bi-Te Films from Alkaline Electrolytes: Influence of Parameters on Morphology and Alloy Composition
H. P. Nguyen (Catholic University of Leuven), J. Su (IMEC/Holst Center) and J. Fransaer (KU Leuven)
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Electrodeposition of nanocomposites |
| Co-Chair(s): G. Oskam, P.M. Vereecken, and A. Bund |
| Time | Abs# | Title and Authors |
| 14:00 |
2727
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Electrodeposition of Nanocomposite Coatings
A. Bund, A. Ispas, D. Thiemig (TU Dresden) and J. Nalaskowski (University of Utah)
|
| 14:40 |
2728
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Morphology and Composition of Electrodeposited Cu+PdO/Pd Composites
E. Verlato, S. Cattarin, N. Comisso (IENI CNR), P. Guerriero (ICIS-CNR), M. Musiani (IENI CNR) and L. Vázquez-Gómez (IENI CNR,)
|
| 15:00 |
2729
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Synthesis, Characterization and Application of Conducting Polymer Based Magnetic Electrodes
C. Janáky, B. Endrődi and C. Visy (University of Szeged)
|
| 15:20 |
2730
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Influence of Particle Surface Potential on Electrocodeposition of BaSO4: a ζ-potential Study
D. Soccol, C. Ntumba Ngoy (KU Leuven), S. Claessens (OCAS Zelzate) and J. Fransaer (KU Leuven)
|
| 15:40 |
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Intermission (20 Minutes)
|
| 16:00 |
2731
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Metal-CNT Composite Films Formed by Electroless Plating Technique
S. Arai, T. Sato, T. Kanazawa and M. Endo (Shinshu University)
|
| 16:20 |
2732
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Characterization of the Fe-Ni-W Electrodeposits
L. Sanches (Univerisade Federal do Paraná), C. Marino (Universidade Federal do Paraná) and L. H. Mascaro (Universidade Federal de São Carlos)
|
| 16:40 |
2733
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Corrosion Resistance, Morphological and Electrical Properties of Electroless Ni-Mo-P Thin Films Deposited on Ceramic and Kapton Substrates
M. D. Reyes Tolosa (Universidad Politécnica de Valencia), E. E. Kalu (FAMU-FSU College of Engineering), J. Orozco (Universida Politécnica de Valencia), A. Erb, P. Kalu (FAMU-FSU College of Engineering), M. Hernàndez Fenollosa (Universida Politécnica de Valencia) and H. J. Bolink (Universida de Valencia)
|
| 17:00 |
2734
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Fabrication of Monolayer Arrangement Film of FePt Nanocube Utilizing Selective Chemical Modification
T. Hachisu, W. Sato, S. Ishizuka, A. Sugiyama, J. Mizuno and T. Osaka (Waseda University)
|
| 17:20 |
2735
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Electrodeposition of Conductive Polymers Containing Aminoacids: Electrochemical and Biological Applications
J. Moral Vico (Institut de Ciencia de Materials de Barcelona), F. Garcia Haro (Institut de biotecnologia i biomedicina) and N. Casañ Pastor (Institut de ciencia de materials de Barcelona)
|
| 17:40 |
2736
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Iridium and Titanium Thin Oxide Films: Electrochemical and Biological Applications
A. M. Cruz (Instituto de Ciencia de Materiales de Barcelona), L. Abad (Institut Neel/CRETA, Centre National de la Recherche Scientifique (CNRS)), M. Carballo, V. Padial, J. Collazos Castro (Hospital Nacional de Parapléjicos de Toledo (HNP-SESCAM)) and N. Casañ Pastor (Institut de ciencia de materials de Barcelona)
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Gallery, Level 01 - Green |
Symposium F5 Poster session |
| Co-Chair(s): G. Oskam, J. Fransaer, X. Shao, and P. M. Vereecken |
| Time | Abs# | Title and Authors |
| o |
2737
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Structural and Morphological Characteristics of the Electrodeposited CoWP Thin Films
W. Shin, J. Ji (Ajou University), S. Dulal (University of Rajshahi) and C. Kim (Ajou University)
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| o |
2738
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Electrodeposition of Te and Cu Thin Films on Boron Doped Diamond (BDD) Electrode
V. C. Fernandes, J. T. Matsushima, M. R. Baldan, A. F. Azevedo and N. G. Ferreira (Instituto Nacional de Pesquisas Espaciais)
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| o |
2739
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Properties of Electroplated Co and Co-Cu Alloys
I. Lee, S. Ahn and K. Hong (Chungnam National University)
|
| o |
2740
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Processing of Para-/Ferroelectric Composite Dielectric Film for Voltage Tunable Device.
B. Lee and K. Ko (Ajou University)
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| o |
2741
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High Temperature Phase Transitions Observed in Oxygen Deficient TiO2-x Thin Films
V. Bessergenev (Algarve University)
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| o |
2742
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Adherent Metal Film on Silicon by Electroless Deposition Using Catalytic Anchors
S. Yae, T. Hirano, K. Sakabe, N. Fukumuro and H. Matsuda (University of Hyogo)
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| o |
2743
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Large Scale One Dimensional Nanostructure Synthesis by Template Method Using Anodic Alumina Membrane
F. Xie, M. Ryan and J. Riley (Imperial College London)
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| o |
2744
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Use of Alkali-Metal-Free Chemicals in the Electrodeposition of CoWP Capping Layers for Cu Interconnection
Y. Son, H. Lee and C. Kim (Ajou University)
|
| o |
2745
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Accelerator Effect on the Cu Metallization by Electrochemical Plating
J. Seo, S. Kang, Y. Lee (Hanbat National University), K. Hong (Chungnam National University), B. Kang, S. Lee (K. C. Tech Co., LTD) and S. Rha (Hanbat National University)
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| o |
2746
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Particle Aggregated TiO2 Films Prepared by Liquid Phase Deposition Using Microbubble
M. Maeda and S. Kawaharabayashi (Kanazawa Institute of Technology)
|
| o |
2747
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Electrochemical Performance of Pt/TiO2 Nanostructure Electrode for Ethanol Oxidation
M. Marcu, T. Spătaru (Institute of Physical Chemistry) and A. Banu (Politechnica University from Bucharest)
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| o |
2748
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Growth of C-axis Orientation ZnO Film by Chemical Deposition using Pd-Ag Bimetallic Catalyst
Y. Kobayashi (Osaka Municipal Technical Research Institute), H. Takahashi, H. Kouta (NEC Corporation) and Y. Fujiwara (Osaka Municipal Technical Research Institute)
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| o |
2749
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Charge Measurements on Colloidal CdSe Quantum Dots in Apolar Solvents
M. Cirillo, M. Marescaux, K. Lambert, K. Neyts and Z. Hens (Ghent University)
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| o |
2750
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Semiconductor Hybrid Structure: Nanowires Embedded in a Matrix from the Same Material
M. Sima (National Institute of Materials Physics), E. Vasile (METAV-CD), M. Sima and E. Matei (National Institute of Materials Physics)
|
| o |
2751
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Cobalt Electrodeposition in Porous Anodic Alumina: Theoretical and Experimental Aspects
C. Oliveira (Universidade Federal de São Carlos), M. Lopes (Universidade do Centro Oeste), A. A. De Oliveira and E. C. Pereira (Universidade Federal de São Carlos)
|
| o |
2752
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Influence of Current Density and Zn(NO3)2 Concentration on the Morphology of Electrodeposited ZnO Films
F. I. Lizama Tzec and G. Oskam (CINVESTAV-IPN)
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| o |
2753
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Fabrication and Characterization of NiMoP Thin Films Fabricated Using an Electrochemical Method
S. Cho, W. Shin (Ajou University), S. Dulal (University of Rajshahi) and C. Kim (Ajou University)
|
| o |
2754
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Electrocatalytic Properties of a Novel Platinum-Polytyramine Composite Electrode Material
T. Spătaru, M. Marcu and N. Spătaru (Institute of Physical Chemistry)
|
| o |
2755
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Growth and Characterization of ZnO:Mn Submicron Wires via Electrodeposition from Nitrate-Lactic Acid Solution
M. Sima, M. Grecu, M. Sima and I. Enculescu (National Institute of Materials Physics)
|
| o |
2756
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Lateral Support and Control of ZnO Nanowires Surface Density by Means of Polystyrene Nanospheres Assembly
D. Ramirez, H. Gomez (Pontificia Universidad Catolica de Valparaiso) and D. Lincot (Institute of R&D on Photovoltaic Energy)
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| o |
2757
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Effects of Oxygen Precipitations for Deep Sub-micron ULSI Semiconductor Gate Oxide Integrity (GOI) Process
P. Chen (I-Shou University)
|
| o |
2758
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Damaged Defects Occurs at Oxygen Layer Growth Process during Deep Submicron Semiconductor Process Caused by Electronstatic Charges Accumulation
P. Chen (I-Shou University)
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Wednesday, October 7, 2009 |
Room D357, Level U2 - Blue |
Electrodeposition from ionic liquids |
| Co-Chair(s): J. Fransaer and F. Endres |
| Time | Abs# | Title and Authors |
| 08:00 |
2759
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Electrodeposition of Semiconductor Nanostructures from Ionic Liquids
F. Endres (Institute of Particle Technology)
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| 08:40 |
2760
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The Electrochemical Formation Mechanism of Silicon in Nonaqueous Solvents
Y. Nishimura, T. Nishida, C. Miranda, Y. Fukunaka, T. Nohira and R. Hagiwara (Kyoto University)
|
| 09:00 |
2761
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Electrodeposition of Silicon Thin Films from Ionic Liquids
A. M. Martinez, K. S. Osen, E. Sheridan, O. Kongstein, A. G. Ulyashin (SINTEF) and G. Haarberg (Norwegian University of Science and Technology)
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| 09:20 |
2762
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Direct Cu-on-Ta Electroplating from Ionic Liquids in High Vacuum
S. Schaltin (K.U.Leuven), K. Binnemans (K.U. Leuven) and J. Fransaer (KU Leuven)
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| 09:40 |
|
Intermission (20 Minutes)
|
| 10:00 |
2763
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Electrodeposition of Aluminum-Cerium Alloy from Ionic Liquids
A. D. Lisenkov (University of Aveiro), M. Ferreira and M. Zheludkevich (Universidade de Aveiro)
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Electrophoretic deposition |
| Co-Chair(s): J. Fransaer and J.B. Talbot |
| Time | Abs# | Title and Authors |
| 10:20 |
2764
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Fundamentals and Applications of Electrophoretic Deposition
J. B. Talbot (University of California)
|
| 11:00 |
2765
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Electrophoretic Deposition of ZnO Nanoparticles: From Micropatterns to Substrate Coverage
P. Lommens, D. Van Thourhout, P. Smet, D. Poelman and Z. Hens (Ghent University)
|
| 11:20 |
2766
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Fabrication of Functionally Gradient HAp Nano-composite Coatings by Electrochemical Processing
Z. Wang (Xiamen University) and Y. Ni (Xiamen Nuiversity)
|
| 11:40 |
2767
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Study of the Precipitation/Dissolution of Oxides of Lanthanide by Using the Piezoelectric Microbalance
S. Jakab (CEA), C. Gabrielli, B. Tribollet, H. Perrot (CNRS) and S. Picart (CEA)
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Thursday, October 8, 2009 |
Room D357, Level U2 - Blue |
Template-assisted electrodeposition & patterning |
| Co-Chair(s): X. Shao and J.-N. Chazalviel |
| Time | Abs# | Title and Authors |
| 08:00 |
2768
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Electrochemically Formed Porous Silica as a Template for Metal Electrodeposition
J. Chazalviel and F. Ozanam (CNRS - Ecole Polytechnique)
|
| 08:40 |
2769
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Double-Sided Mesoporous Silicon with Embedded Quasi-regular Arranged Ferromagnetic Nanostructures Fabricated by Electrodeposition
P. Granitzer, K. Rumpf (Karl Franzens University Graz) and P. Pölt (University of Technology Graz)
|
| 09:00 |
2770
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Electrochemical Deposition of Magnetic Nanomaterials into Nanostructured Porous Silicon
F. A. Harraz, A. Salem, R. Mohamed and I. Ahmed (Central Metallurgical R&D Institute)
|
| 09:20 |
2771
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Electrodeposition of Ni/Co and Ni Magnetic Nanowires Using Alumina Template
P. Cojocaru, F. Muscolino, L. Magagnin (Politecnico di Milano), M. Vazquez and G. Badini Confalonieri (CSIC)
|
| 09:40 |
|
Intermission (20 Minutes)
|
| 10:00 |
2772
|
Mechanistic Study of Sn Nanowires Electrodeposition on TiO2 Nanotube Layers: Thermodynamics, Kinetics, Nucleation and Growth Modes
I. Hanzu (Université de Provence), T. Djenizian (University of Aix-Marseille), G. Ortiz (Universidad de Cordoba) and P. Knauth (Université de Provence)
|
| 10:20 |
2773
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Controlled Growth of Metal Oxide Nanostructures by Template Electrosynthesis
R. Inguanta, G. Ferrara, S. Piazza and C. Sunseri (Università di Palermo)
|
| 10:40 |
2774
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Fabrication of Metal Nanowires Sandwiched with Gold for Self-Assembling of NW sensors
N. Yamanaka, K. Aoki, Y. Ishida, Y. Ohya (Kansai University), S. Tanaka (National Institute of Communication Technology), T. Shimizu (Seicho) and S. Shingubara (Kansai University)
|
| 11:00 |
2775
|
Metallic Nanodots Arrays Electrodeposited Through Nanoimprint Templates
C. Pernel, N. Chaix, S. Landis and V. Ivanova (CEA-LETI, MINATEC)
|
| 11:20 |
2776
|
Langmuir-Blodgett Monolayers of Colloidal Iron Oxide Nanocrystals: Deposition, Micropatterning and CNT Catalysis
M. Cirillo (Ghent University), M. Van der Veen (IMEC), K. Lambert (Ghent University), M. Bondarchuk, M. Kovalenko, W. Heiss (Johannes Kepler Universität Linz), P. Vereecke (IMEC) and Z. Hens (Ghent University)
|
| 11:40 |
2777
|
Self Assembly of Periodic Serrated Nanowires
D. Li and J. G. Lu (USC)
|
| 12:00 |
2778
|
Characterization of Novel Silver Nanopaste Inks as Electrochemically Active Materials using Microfluidic Electrochemistry
D. Steingart, J. W. Gallaway and A. Gaikwad (The City College of New York)
|
| |
Electrodeposition for electronic applications |
| Co-Chair(s): P. M. Vereecken and A. Radisic |
| Time | Abs# | Title and Authors |
| 14:00 |
2779
|
Copper Plating on Resistive Substrates, Diffusion Barrier and Alternative Seed Layers
A. Radisic (IMEC vzw), M. Nagar (IMEC vzw and Ghent University), K. Strubbe (Ghent University), S. Armini, Z. El-Mekki, H. Volders, W. Ruythooren and P. M. Vereecken (IMEC vzw)
|
| 14:40 |
2780
|
Impact of "Terminal Effect" on Cu Plating: Theory and Experimental Evidence
S. Armini (IMEC vzw) and P. M. Vereecken (IMEC)
|
| 15:00 |
2781
|
Electrodeposition of Copper in Trenches from a Citrate Plating Bath
F. I. Lizama Tzec and G. Oskam (CINVESTAV-IPN)
|
| 15:20 |
2782
|
Pulse Electroplating of Cu-Ni Thin Films and Narrow Trenches
K. Hong, D. Keum and Y. Ryu (Chungnam National University)
|
| 15:40 |
|
Intermission (20 Minutes)
|
| 16:00 |
2783
|
Directly Patterned Copper by Selective Electroless Plating on a Novel Organocopper Seed Layer
N. Kulyk, D. Rhen, M. Shahid, D. Kang and C. Chung (SungKyunKwan University)
|
| 16:20 |
2784
|
Electrochemical Deposition of Iron Nanoparticles on n-Si: Influence of Additives on the Properties of the Deposit
K. Strubbe and K. De Henau (Ghent University)
|
| 16:40 |
2785
|
Understanding Island Formation from Pd Electrodeposition on 4-Mercaptopyridine Self Assembled Monolayers
J. A. Keith and T. Jacob (Institut für Elektrochemie)
|
| 17:00 |
2786
|
Electrochemical Platinum Deposition on Modified Glassy Carbon Electrodes
A. Foelske-Schmitz, A. Savouchkina, R. Kötz, G. Scherer and A. Wokaun (Paul Scherrer Institut)
|
| 17:20 |
2787
|
Electrografting of Organic Monolayers on Planar and Nanowire Silicon Substrates
J. N. Ngunjiri, S. S. Vegunta, W. Xu and J. C. Flake (Louisiana State University)
|