217th ECS Meeting - Vancouver, Canada |
April 25 - April 30, 2010 |
PROGRAM INFORMATION |
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F2 - Electrochemical Engineering for the 21st Century (dedicated to Richard C. Alkire) |
Electrodeposition/Industrial Electrochemistry and Electrochemical Engineering/Corrosion/Energy Technology |
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Monday, April 26, 2010 |
Georgia B, 2nd Floor, Hyatt |
Multiscale Modeling |
| Co-Chairs: Venkat Subramanian and Linda Petzold |
| Time | Abs# | Title and Authors |
| 08:00 |
1240
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Water Transport in the Ionomer-Phase and Across Its Interfaces in Catalyst Coated Membranes for Proton Exchange Membrane Fuel Cells
V. Gurau and J. Mann (Case Western Reserve University)
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| 08:20 |
1241
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Surface Morphology of Lithium Metal Anodes
M. Karulkar and J. Adams (Ford Motor Company)
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| 08:40 |
1242
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Continuum and Multiscale Modeling of Performance Curves and Capacity Fade in Lithium-Ion Batteries
V. Subramanian, V. Ramadesigan, R. N. Methekar (Washington University), K. Chen and R. Braatz (University of Illinois at Urbana-Champaign)
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| 09:00 |
1243
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Formation of Localized Corrosion-Relevant Surface Defects on Aluminum: Experimental Studies and Kinetic Monte Carlo Simulation
K. Hebert, G. Zhang, J. Ai (Iowa State University) and G. Stafford (National Institute of Standards and Technology)
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| 09:20 |
1244
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Simulation of Three-Dimensional Solid-by-Solid Model and Application to Electrochemical Engineering
Y. Kaneko (Kyoto University), Y. Hiwatari (Toyota Physical and Chemical Research Institute), K. Ohara and F. Asa (C. Uyemura & Co., Ltd.)
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| 09:40 |
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Intermission (20 Minutes)
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| 10:00 |
1245
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(Keynote) Electrochemical Engineering: The Need for Next-Generation Methods
R. Alkire (University of Illinois)
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| 10:40 |
1246
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(Keynote) An Algorithm for Simulation of Electrochemical Systems with Surface-Bulk Coupling Strategies
M. Buoni (Los Alamos National Laboratory) and L. Petzold (University of California Santa Barbara)
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| 11:20 |
1247
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Characteristic Timescales in Multiscale Feature Metallization
J. D. Adolf and U. Landau (Case Western Reserve University)
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| 11:40 |
1248
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Adsorptive SPS Dissociation Within the c(2x2)-Cl Matrix on Cu(100) under Reactive Conditions: A Combined In Situ STM and DFT Study
N. T. Hai (University of Bern), W. Reckien (University of Bonn), A. Fluegel, M. Hahn, A. Wagner, D. Mayer (BASF SE), T. Bredow (University of Bonn) and P. Broekmann (University of Bern)
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Electrochemical Systems-Molecular/Nano |
| Co-Chairs: John Harb and Daniel Schwartz |
| Time | Abs# | Title and Authors |
| 14:00 |
1249
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(Keynote) The Metallization of SAMs: Molecular Double Deckers
F. Eberle, M. Manolova, D. M. Kolb (University of Ulm), H. Boyen and M. Saitner (Hasselt University)
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| 14:40 |
1250
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Metallization of DNA Origami Templates for the Fabrication of Nanoelectronic Circuits
J. Harb (Brigham Young University), J. Liu (Brighan Young University), Y. Geng, E. Pound, J. Ashton, S. Gyawali and A. Woolley (Brigham Young University)
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| 15:00 |
1251
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Combined Electrochemical and In Situ STM Studies on the Redox-Activity of Leveler Additives
A. Fluegel (BASF SE), N. T. Hai (University of Bern), M. Hahn, A. Wagner, D. Mayer (BASF SE) and P. Broekmann (University of Bern)
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| 15:20 |
1252
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Nanomanufacturing by Orchestrated Structure Evolution
S. Kitayaporn, S. Abbasi, K. Böhringer and D. Schwartz (University of Washington)
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| 15:40 |
1253
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Nanosheet Formation by Electrodeposition and Its Application to Miniaturized Reference Electrodes
S. Safari-Mohsenabad (McMaster University), P. R. Selvaganapathy (McMaster Unversity), A. Derardja (University of Batna) and M. J. Deen (McMaster University)
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| 16:00 |
1254
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Creating Metallic Conductivity in TiO2 Nanotubes
R. Hahn and P. Schmuki (University of Erlangen)
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| 16:20 |
1255
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Density Functional Theory Study on the Oxidation Reactivity of Hypophosphite Ion as a Reductant for Electroless Deposition Process
M. Kunimoto, H. Nakai and T. Homma (Waseda University)
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Tuesday, April 27, 2010 |
Georgia B, 2nd Floor, Hyatt |
Electrochemical Systems-Fundamental |
| Co-Chairs: Kurt Hebert and Stanko Brankovic |
| Time | Abs# | Title and Authors |
| 08:20 |
1256
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Wet Etching Process on Semiconductors: A Typical Electrochemical Engineering Challenge
A. Causier, M. Bouttemy, I. Gérard and A. Etcheberry (Institut Lavoisier UMR CNRS 8180)
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| 08:40 |
1257
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Simulation of Cu Surface Morphology Evolution during Electropolishing
J. Thomas and S. R. Brankovic (University of Houston)
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| 09:00 |
1258
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Porosity of Electrodeposited Cobalt Hard Gold: Effects of Reversed Pulse Current
Z. Liu (Columbia University), M. Zheng, R. Hilty (Tyco Elecronics) and A. West (Columbia University)
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| 09:20 |
1259
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Direct Copper Plating on a RuTa Substrate
M. Nagar, A. Radisic (IMEC), K. Strubbe (Ghent University) and P. Vereecken (IMEC)
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Electrochemical Devices |
| Co-Chairs: Lili Deligianni and James Fenton |
| Time | Abs# | Title and Authors |
| 10:00 |
1260
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(Keynote) Establishment of Electrochemical Device Engineering
T. Osaka (Waseda University)
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| 10:40 |
1261
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One-Dimensional Molecular-Junction Arrays Fabricated Using Anodic Aluminum Oxide Templates
Y. Song, J. Fang and Z. D. Chen (University of Kentucky)
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| 11:00 |
1262
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Future Challenges in Electrochemical Engineering from Microelectronics to Solar Thin Films
H. Deligianni (BM T.J. Watson Research Center), Q. Huang (IBM T.J. Watson Research Center), L. T. Romankiw (BM T.J. Watson Research Center), R. Vaidyanathan, S. Ahmed (IBM T.J. Watson Research Center), S. Jaime, P. Grand, V. Charrier and O. Kerrec (Nexcis Photovoltaic Technology)
|
| 11:20 |
1263
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Analysis and Control of Plating Baths in the Electrodeposition of Copper Indium Gallium Selenide Films with Ion Chromatography
J. Wang (SoloPower, Inc), S. Aksu (SoloPower Inc) and M. Pinarbasi (SoloPower, Inc.)
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| 11:40 |
1264
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Roughness Control of Electrodeposited CIS Thin Film
H. Huang (Nation Taiwan University) and C. Lin (National Taiwan University)
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Henry B. Linford Award Address |
| Co-Chairs: |
| Time | Abs# | Title and Authors |
| 14:00 |
1265
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Preparing Electrochemical Engineers for the 21st Century - The Henry B. Linford Award Address of The Electrochemical Society
D. Schwartz (University of Washington)
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Electrochemical Engineering |
| Co-Chairs: James Fenton and Vijay Ramani |
| Time | Abs# | Title and Authors |
| 14:40 |
1266
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Microfluidic Platforms for Catalyst and Electrode Optimization
F. Brushett and P. Kenis (University of Illinois at Urbana-Champaign)
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| 15:00 |
1267
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Electro-Oxidation on the Ti/SnO2-Sb2O5 Anode for Wastewater Treatment
Q. Ni, D. Kirk and S. Thorpe (University of Toronto)
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| 15:20 |
1268
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Analysis of Coal-Extracts Using Electrochemical Techniques
A. Valenzuela-Muñiz and G. G. Botte (Ohio University)
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| 15:40 |
1269
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Effect of the Electroactive Area and Liquid Mass Flow on the Resident Time Distribution (RTD) in a FM01 Electrochemical Reactor
M. Cruz-Díaz (Tecnológico de Estudios Superiores de Ecatepec), E. Rivero (Universidad Nacional Autónoma de México), F. Rivera and I. González (Universidad Autónoma Metropolitana Iztapalapa)
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Exhibit and Poster Hall, Conference Floor, Fairmont |
Poster Session |
| Co-Chairs: |
| Time | Abs# | Title and Authors |
| o |
1270
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Fundamental Thermodynamic Limitations in Wagner's Equation in Solid State Electrochemistry
T. Miyashita (Miyashita Clinic)
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| o |
1271
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Surface Energy Effects on the Metallization of Nanoscale Features
J. D. Adolf and U. Landau (Case Western Reserve University)
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| o |
1272
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Investigation on Adsorption Characteristics of Organic Dyes during Via Filling by Copper Electrodeposition
R. Manu and S. Jayakrishnan (Central Electrochemical Research Institute)
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| o |
1273
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Structural and Protecting Properties of Functional Organic Coatings on Copper
Ž. Petrović (University of Zagreb), M. Metikos-Hukovic (University of Zagreb,) and S. Omanovic (McGill University)
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| o |
1274
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Surface Modification of Nitinol by Biocompatibile Passive Films
J. Katić (Faculty of Chemical Engineering and Technology) and M. Metikos-Hukovic (University of Zagreb,)
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| o |
1275
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Electrodeposition and Thermoelectric Properties of BiSbTe Nanowires
R. S. Mannam (Louisiana Tech University), K. Varahramyan (IUPUI), D. Davis (Louisiana Tech University) and M. Agarwal (IUPUI)
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| o |
1276
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Study the Diffusion Behavior of Li+ in the WO3 Electrochromic Device by Electrochemical AC Impedance Spectroscopy
Y. Lu and F. Lien (National University of Tainan)
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Wednesday, April 28, 2010 |
Georgia B, 2nd Floor, Hyatt |
Electrodeposition-Applications |
| Co-Chairs: Lili Deligianni and Lisa Podlaha |
| Time | Abs# | Title and Authors |
| 08:00 |
1277
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Understanding and Predicting Metallic Whisker Growth as a Function of Electrodeposited Morphology
W. Yelton, D. Susan, J. Michael (Sandia National Labs) and D. Shore (Rensselaer Polytechnic Institute)
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| 08:20 |
1278
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Recrystallization of Electrodeposited Copper-Silver Thin Films
N. Alshwawreh (The University of British Columbia), M. Militzer and D. Bizzotto (University of British Columbia)
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| 08:40 |
1279
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Optimization of Fill Rate Uniformity for Dense Features
B. L. Buckalew (Novellus Systems, Inc.), T. Ponnuswamy, J. Reid and Y. Takada (Novellus Systems, Inc)
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| 09:00 |
1280
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Seedless Copper Electrochemical Deposition on Barrier Materials as a Replacement/Enhancement for PVD Cu Seed Layers in HAR TSVs
S. Armini, H. Philipsen, Z. El-Mekki, A. Redolfi, A. Van Ammel, A. Radisic, M. Nagar and W. Ruythooren (IMEC)
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| 09:20 |
1281
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Electrodeposition and Characterization of FePd Magnetic Thin Films
D. Pečko, K. Zužek Rožman (Jozef Stefan Institute), B. Pihlar (Faculty of Chemistry and Chemical Technology ) and S. Kobe (Jozef Stefan Institute)
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| 09:40 |
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Intermission (20 Minutes)
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| 10:00 |
1282
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(Keynote) Electrochemical Technology in Electronics: A Path from Art to Science
L. T. Romankiw (BM T.J. Watson Research Center)
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| 10:40 |
1283
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Electrochemical Processes for TSV/Bump Formation Without CMP and Lithographic Process
J. Lee, S. Kim and J. Lee (Hongik University)
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| 11:00 |
1284
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Effect of pH and Temperature of the Electrolyte on the Electrodeposition of CoWP Films Using Alkali-Metal-Free Precursors
Y. Son, H. Lee and C. Kim (Ajou university)
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| 11:20 |
1285
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Molecular Scale Growth of Electrolytic Copper Foils
K. Kondo (Osaka Prefeecture University)
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| 11:40 |
1286
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Additive Transport and Adsorption in Copper Metallization of Interconnects Focusing on TSV Scales
J. D. Adolf and U. Landau (Case Western Reserve University)
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Energy Storage |
| Co-Chairs: Richard Varijian and Patrik Ng |
| Time | Abs# | Title and Authors |
| 14:00 |
1287
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(Keynote) Diffusion-Induced Stress, Charge-Transfer Resistance, and Materials Selection Criteria for Avoiding Crack Initiation of Insertion Electrode Particles
M. Verbrugge (General Motors) and Y. Cheng (University of Kentucky)
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| 14:40 |
1288
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Two-Port Transmission Line Technique for Dielectric Property Characterization of Polymer Electrolyte Membranes
Z. Lu (RIT), M. Lanagan, E. Manias and D. Macdonald (Penn State University)
|
| 15:00 |
1289
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A Generalized Multidimensional Mathematical Model for Li-Ion Intercalation Batteries
S. Pannala, S. Allu, J. Nanda and W. Shelton (Oak Ridge National Laboratory)
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| 15:20 |
1290
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Low Temperature Studies of EC:DMC Mixture in Lithium-Ion System
A. Drews, J. Adams, R. Kudla, M. Karulkar and C. Paik (Ford Motor Company)
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| 15:40 |
1291
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Carbon Nanotube-Confined MnO2 Nanocomposites for Electrochemical Capacitors
W. Chen, K. Bechtold, M. Beidaghi, V. Penmatsa and C. Wang (Florida International University)
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