Your Thoughts on ORCID iD

In 2014, ECS became a member of the Open Researcher and Contributor ID (ORCID) registry. ORCID is an open, non-profit, community-based effort founded by academic institutions, professional bodies, funding agencies, and publishers to create and maintain a registry of unique researcher identifiers intended to remedy the systemic name ambiguity problem seen in scholarly research. ORCID resolves the confusion brought about by name changes, the cultural differences in name order presentation, and the inconsistent use of first-name and middle-name abbreviations on published research papers.

ECS wants to learn more about your perspective on ORCID iD. Take our survey below!

Create your own user feedback survey

ORCID iDs are free to obtain and use. The registration process is integrated into the ECS journals submission site, ECSxPress (ExP) for convenience.

Don’t have an ORCID iD? Learn more and register today!

Work, Finish, Publish, Promote

share your workMichael Faraday may have suggested that the formula for scientific success is “work, finish, publish,” but Faraday said that back in the 19th century. In 2016, there are plenty of compelling reasons to tack another item onto the end of the list. Millions of scientific articles are published each year, making your work just a drop in the ocean (and we have authors who do a lot of work). In order to ensure that your work is read, cited, and has impact, it’s becoming increasingly necessary to add a little self-promotion to your workflow.

To help you get started we have a few suggestions – here are ECS’s top 5 tips to maximize impact and promote your published research.

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Help ECS Support Young Scientists

2014highlightsImagine a world where anyone—from the student in Atlanta to the researcher in Port au Prince—can freely read the scientific papers they need to make a discovery, where scientific breakthroughs in energy conversion, sensors or nanotechnology are unimpeded by fees to access or publish research.

At ECS, that is our vision of the future. We’re working to provide open access to all ECS publications, while maintaining our high standards of peer-review and fast delivery of content.

Please help us make this vision a reality by
making a tax-deductible donation to ECS today.

Your donation fosters the growth of electrochemistry and solid state science and technology by supporting ECS publications and the participation of scientists from around the world at our biannual meetings.

Through travel grants and reduced fees, ECS enables the participation of young scientists and students who otherwise might not be able to attend an ECS meeting. This is particularly important as the work of these scientists, and all ECS members, increasingly holds the keys to solving global challenges in energy, waste and sustainability.

Please help us continue the important work of ECS by donating today.

Thank you again for your incredible work and continued support.

The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

Atomic Layer Etch (ALEt) and Atomic Layer Clean (ALC) are emerging as enabling technologies for sub 10nm technology nodes. At these scales performance will be extremely sensitive to process variation.

Atomic layer processes are the most promising path to deliver the precision needed. However, many areas of ALEt and ALC are in need of improved fundamental understanding and process development. This focus issue will cover state-of-the-art efforts that address a variety of approaches to ALEt and ALC.

Topics of interest include but are not limited to:

  • Surface reaction chemistry and its impact on selectivity
  • Plasma ion energy distribution and control methods
  • Novel plasma sources and potential application to ALEt & ALC
  • Innovative approaches to atomic layer material removal
  • Novel device applications of ALEt & ALC
  • Process chamber design considerations
  • Advanced delivery of chemicals to processing chambers
  • Metrology and control of ALEt & ALC
  • Device performance impact
  • Synthesis of new chemistries for ALEt & ALC application
  • Damage free surface defect removal
  • Process and discharge modeling

Find out more!

Deadline for submission of manuscripts is December 17, 2014.

Please submit manuscripts here.