2004 Joint International Meeting

October 3-October 8, 2004


L3 - Molecular Structure of the Solid-Liquid Interface and Its Relationship to Electrodeposition IV


Sunday, October 3, 2004

Nautilus 1, Level 6, Mid Pacific Conference Center

Molecular Structure of the Solid-Liquid Interface and its Relationship to electrodeposition - IV

Co-Chairs: T. Homma and D. Kolb

14:001176 In Situ scanning tunneling microscopy of electrochemical deposition of mercury films on well-ordered iridium(111) electrodes - S. Yau (CREST, JST, tohoku university), Y. Yang, and K. Itaya (tohoku university)
14:301177 In-situ Modification and Characterization of Electrochemical Interfaces at Nanometer Scale - W. Schindler (University of Ulm), M. Hugelmann, and P. Hugelmann (University of Karlsruhe)
14:451178 Step Decoration, the Role of Monoatomic Steps for Metal Deposition and Competitive Molecular Adsorption: New Insights - X. Xiao, K. Domke, and H. Baltruschat (Institut für Theoretische und Physikalische Chemie der Universität Bonn)
15:001179 Electrochemical Synthesis of Nanocrystalline Materials - H. Natter and R. Hempelmann (Universität des Saarlandes)
15:151180 In Situ Transmission Electron Microscopy Study of Nucleation and Growth During Electrochemical Deposition of Copper on Gold - A. Radisic, P. Searson (Johns Hopkins University), J. Hannon, and F. Ross (IBM T. J. Watson Research Center)
15:301181 Fundamental Insights into the Kinetics and Growth of Electrodeposited Palladium Nanocrystallites - D. Bera, S. Kuiry, and S. Seal (University of Central Florida)
15:45 Fifteen-Minute Intermission
16:001182 UHV-EC Studies of the Surface Chemistry of InP(100) wafers, as Substrates for the Electrodeposition of Compound Semiconductors - M. Madhivanan, J. Kim, and J. Stickney (Department of Chemistry)
16:301183 Electrodeposition of nanoscale germanium and silicon in room temperature ionic liquids - F. Endres (Technical University of Clausthal)
16:451184 Metal Latticeworks formed by oscillation-coupled electrodeposition - S. Nakanishi, K. Fukami, T. Tada, and Y. Nakato (Graduate School of Engineering Science, Osaka University)
17:001185 Formation of Periodic Spatio-Temporal Structures of Silver-Indium Alloy Coatings Electrodeposited from Cyanide Electrolytes - T. Dobrovolska (Institute of Physical Chemistry, Bulg. Acad. Sci.), L. Veleva (CINVESTAV-IPN, Unidad Merida, Appl. Phys. Dept.), I. Krastev (Institute of Physical Chemistry, Bulg. Acad. Sci.), and A. Zielonka (Forschungsinstitut für Edelmetalle und Metallchemie, 73525 Schwäbisch Gmünd)
17:151186 AFM induced sensitization of semiconductor surface for electrodeposition - Y. Zhang and P. Schmuki (Erlangen-Nürnberg University)
17:301187 Imaging by Electrochemical Scanning Tunneling Microscopy and Deconvolution Resolving More Details of Surfaces Nanomorphology - J. Andersen (Technical University of Denmark)
17:451188 Sum Frequency Generation (SFG) Studies of Molecular Structure on the Organic Film Surface - S. Ye, G. Li, T. Nishida, H. Noda, S. Morita, and M. Osawa (Hokkaido University)

Monday, October 4, 2004

Molecular Structure of the Solid-Liquid Interface and its Relationship to Electrodeposition - IV

Co-Chairs: Y. Ito and R. Alkire

10:001189 Structure, Stability and Reactivity of Bimetallic Overlayer and Supported Cluster Systems Studied from First Principles - A. Roudgar, M. Lischka, and A. Gross (Physics-Department T30, TU Munich)
10:301190 In-situ X-ray Scattering Techniques in Electrochemistry - M. Gallagher, C. Lucas, B. Fowler, P. Thompson (University of Liverpool), and N. Markovic (Lawrence Berkeley National Laboratory)
10:451191 Electrodeposition of cadmium on copper surfaces: Atomic structure and anion influence - K. Wandelt (University of Bonn)
11:001192 In-Situ STM Study of Surface Ordering During Pb UPD on Cu (111) - N. Vasiljevic (Arizona State University), N. Dimitrov (State University of New York at Binghamton), and K. Sieradzki (Arizona State University)
11:151193 Novel Features of Initial Stage Electrodeposition of SN and SB on AU and CU by In-Situ STM - B.-W. Mao, J.-W. Yan, J. Tang, and Z.-X. Xie (Xiamen University)
11:301194 Stress Evolution During Monolayer Deposition of Cu on Au (111) - K. Sieradzki, T. Trimble, M. Van Schilfgaarde, N. Vasiljevic, N. Dimitrov, and L. Tang (Arizona State University)
11:451195 Underpotential codeposition of (Fe,Co,Ni)1-xPtx alloys from aqueous solution - J. Mallett (National Institute of Standards and Technology), E. Svedberg (Seagate Technology), W. Egelhoff, and T. Moffat (National Institute of Standards and Technology)

Nautilis 1, Level 6, Mid Pacific Conference Center

Molecular Structure of the Solid-Liquid Interface and its Relationship to Electrodeposition 4

Co-Chairs: R. Alkire and T. Homma

14:001196 A new approach to metal deposition onto organic monolayers: Pd on a mercaptopyridine-SAM - V. Ivanova, T. Baunach, D.M. Kolb, H.-G. Boyen, and P. Ziemann (University of Ulm)
14:301197 Atomic Level Studies of Adsorption of Additives at the Electrode Surfaces during Electrodeposition of Zinc on Iron Electrodes - J.-Y.L. Lee, J.-W. Kim, and S.-M. Park (Pohang University of Science and Technology)
15:001198 Simulated additive behavior in a copper-deposition bath using molecular dynamics - C. Guymon and D. Wheeler (Brigham Young University)
15:151199 Chemical Mechanism of Suppression of Copper Electrodeposition by Polyethylene Glycol - K. Hebert, S. Adhikari, and J. Houser (Iowa State University)
15:301200 Superconformal Film Growth - T. Moffat, D. Wheeler, and D. Josell (NIST)
15:451201 Effect of Iron Octaethylporphyrin Adlayer on the Electrocatalytic Reduction of O24 on Au(111) Electrode - S. Yoshimoto, A. Tada, and K. Itaya (Tohoku University)
16:00 Fifteen-Minute Intermission
16:151202 Macrostep Growth of Silver Electrodepositing in AgNO3 Aqueous Solution - Y. Fukunaka (Dept. of Energy Science & Technology, Kyoto University) and Y. Konishi (Dept. of Chemical Engineering, University of Illinois)
16:451203 Electrical Conduction Property of Covalently Attached Methyl Monolayer on Si(111) - D. Niwa, H. Fukunaga, T. Homma, and T. Osaka (Department of Applied Chemistry)
17:001204 On the Contrasting Effect Exerted by A Thin Layer of CdS Against the Passivation of Metal Electrodes Coated by Thiols - F. Loglio, E. Salvietti, M. Innocenti, G. Pezzatini, and L. Foresti (University of Florence)
17:151205 Effect Of Additives On Deposition and Corrosion: Vibrational Spectroscopic Measurements - A. Gewirth, Z. Schultz, V. Feng, and X. Li (University of Illinois)
17:301206 Single Batch Process for Area-Selective Formation of Si Micropore Array and Metal Filling - H. Sato, K. Mori, T. Homma, T. Osaka, and S. Shoji (Waseda University)
17:451207 Electrochemical Synthesis and Characterization of Birnessite-Type Layered Manganese Oxides - M. Nakayama, S. Konishi, H. Tagashira, and K. Ogura (Yamaguchi University)

Tuesday, October 5, 2004

Coral Lounge, Level 6, Mid Pacific Conference Center

Tuesday Evening Poster Session and Technical Exhibit

o1208 Preparation of High Performance Titanium Oxide Films by Anodization Process - K. Onoda (Institute of Advanced Energy, Kyoto University), M. Asano (Nara Prefectural Institute of Industrial Technology), and S. Yoshikawa (Institute of Advanced Energy, Kyoto University)
o1209 Oxidation of H2 0n Pt(111)mand the reaction with CO - L. Blum (University of Puerto Rico)
o1210 Copper Deposition on the Au(111) electrode influenced by simultaneously adsorbed thymine - C. Donner (Free University Berlin)
o1211 Preparations of Metal Monolayer Islands Using Self-assembled Monolayer Technique - A. Kongkanand and S. Kuwabata (Osaka University)
o1212 Novel Applications of the Quartz Crystal Microbalance Technique for the Characterization of the Solid-Liquid Interface - A. Bund, S. Wehner (TU Dresden), K. Wondraczek, and D. Johannsmann (TU Clausthal)
o1213 Cathodic Deposition of Mixed Mo/V Oxyhydroxide Films from V-Substituted Polymolybdophosphate - M. Nakayama, H. Komatsu, S. Ozuka, and K. Ogura (Yamaguchi University)
o1214 Influence of the Complexing Agents on the Thickness Uniformity of Electroless Nickel Plating - T. Tsunoda, T. Okabe, and H. Honma (Kanto Gakuin University)
o1215 Growth of RuO_2 by Electrochemical and Gas Phase Oxidation of a Ru(0001) Surface - M. Vukmirovic, R. Sabatini, and R. Adzic (Brookhaven National Laboratory)
o1216 Density Functional Theory Study on the Reaction Mechanism of Reductants for Electroless Silver Deposition Processes - T. Shimada (Department of Applied Chemistry, Waseda University), H. Nakai (Department of Chemistry, Waseda University), T. Homma, and T. Osaka (Department of Applied Chemistry, Waseda University)
o1217 Density Functional Theory Study on the Oxidation Mechanisms of Aldehydes as Reductants for Electroless Deposition Process - K. Sakata, T. Shimada (Department of Applied Chemistry, Waseda University), H. Nakai (Department of Chemistry, Waseda University), T. Homma, and T. Osaka (Department of Applied Chemistry, Waseda University)
o1218 Site Specific lectrolyte Interaction at Terraced Si (111) Surfaces - J. Lewerenz, J. Jakubowicz, M. Lublow, and H. Jungblut (Hahn-Meitner-Institut Berlin GmbH)
o1219 Fabrication of SERS-Active Substrate Using Electrodeposited Silver with Nanoscale Dendrites - M. Saito (Waseda University) and M. Yanagisawa (NEC Corp.)
o1220 Electrodeposition of PbTe Thin Films - F. Xiao, N. Myung, T. Farm, and P. Ayala (University of California-Riverside)
o1221 Characterization of Mossy Zinc Electrodeposits - R. Wang, D. Kirk (University of Toronto), and G. Zhang (Teck Cominco Metals Ltd.)
o1222 New Conceptions on the Structure Formation of the Metals Being Electrodeposited, and their Usage for the Development of Corrosion-Proofing Technologies for Canned Food Steel Sheet - O. Girin (Ukrainian State University of Chemical Engineering)
o1223 Stress Changes of Binary CoNi Alloy Films Electrodeposited from Different Anions - R.-Y. Song, D.-Y. Park, J.M. Ko (Hanbat National University), and N.V. Myung (University of California, Riverside)