236th ECS Meeting Topic Close-up: Atomic Layer Deposition Applications 15

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Topic Close-up #11

Symposium G02: Atomic Layer Deposition Applications 15

Symposium focus: This symposium contains cutting edge research results on applications in Atomic Layer Processing, and will focus on a variety of applications of ALD and other atomic layer-by-layer processing (like etching and cleaning) in semiconductor CMOS (e.g. high-k oxides and metals for memories like Flash and 3D NAND, MIM, MIS capacitors), photovoltaics, energy storage and conversion, catalysis, optics and photonics, smart coatings of nanoporous materials, MLD and hybrid ALD/MLD, fundamentals of ALD processing: reaction mechanisms, in-situ measurement, modeling, theory, new precursors and delivery systems, optical and photonic applications, productivity enhancement, scale-up and commercialization of ALD equipment and processes for rigid and flexible substrates, including roll-to-roll deposition, spatial ALD, area-selective ALD, Atomic Layer Etching (‘reverse ALD’) and related topics aiming at self-limited etching.

Tutorials: This symposium will offer the following tutorials:
• ALD for Li-ion batteries, Christophe Detavernier, Ghent University, Belgium
• Atomic Layer Processing for advanced electronics, Gert Leusink, TEL America, USA

Tentative list of invited speakers:

• Solar energy, Mark Losego, Georgia Tech, USA
• Solar energy, Byungha Shin, KAIST, Korea
• ALD for Advanced Rechargeable Batteries, Philippe Vereecken, imec, Belgium
• Energetic ions during plasma-enhanced atomic layer deposition: From materials control to selective processing in the 3rd dimension, Tahsin Faraz, TU Eindhoven, The Netherlands
• Selective ALD, Christophe Vallée, CEA-LETI, Grenoble, France
• Selective ALD, Bo-Ram Lee, Incheon National University, Korea
• Selective Atomic Layer Processing, Kashish Sharma, Lam Research, USA
• New selective deposition schemes using ALD, Rudy Wojtecki, IBM Almaden, San Jose, USA
• Thermal ALE of III-V structures, Wenjie Lu, MIT, USA
• Sequential Infiltration Synthesis, Anil Mane, Argonnne National Lab, USA
• Metal–organic frameworks, Rob Ameloot, KU Leuven, Belgium
• ALD for III-V devices, Charles Eddy, US Naval Research Lab, USA
• Medical applications, Mikko Matvejeff, Picosun, Finland


For additional information on this topic close-up and more, check out the full call for papers with all the 236th ECS Meeting topics being held in Atlanta, GA on October 13-17, 2019.

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