The Price of Academic Research

There is a wealth of knowledge that exists in the huge array of academic articles that are being produced. Still, the discovery process and dissemination of knowledge is not as fast as it potentially could be.

The issue lies in the paywalls. In order to read the huge majority of these articles, one would need to have university access or else pay the often substantial fee.

Martin Paul Eve, a lecturer at the University of Lincoln’s School of English & Journalism in the United Kingdom, sat down with The Atlantic recently to discuss this issue that he has delved into in his book entitled Open Access and the Humanities: Contexts, Controversies, and the Future.

Here at The Electrochemical Society, we are beginning our bold move toward open access publication in order to speed up and make more efficient the dissemination of scientific research. Still, the issue of paywalls in academic research exists and often time impedes on progress.

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The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

Atomic Layer Etch (ALEt) and Atomic Layer Clean (ALC) are emerging as enabling technologies for sub 10nm technology nodes. At these scales performance will be extremely sensitive to process variation.

Atomic layer processes are the most promising path to deliver the precision needed. However, many areas of ALEt and ALC are in need of improved fundamental understanding and process development. This focus issue will cover state-of-the-art efforts that address a variety of approaches to ALEt and ALC.

Topics of interest include but are not limited to:

  • Surface reaction chemistry and its impact on selectivity
  • Plasma ion energy distribution and control methods
  • Novel plasma sources and potential application to ALEt & ALC
  • Innovative approaches to atomic layer material removal
  • Novel device applications of ALEt & ALC
  • Process chamber design considerations
  • Advanced delivery of chemicals to processing chambers
  • Metrology and control of ALEt & ALC
  • Device performance impact
  • Synthesis of new chemistries for ALEt & ALC application
  • Damage free surface defect removal
  • Process and discharge modeling

Find out more!

Deadline for submission of manuscripts is December 17, 2014.

Please submit manuscripts here.