Co-Chairs: T. Homma and D. Kolb
| Time | Abs# | Title |
|---|
| 14:00 | 1176 |
In Situ scanning tunneling microscopy of electrochemical deposition of mercury films on well-ordered iridium(111) electrodes - S. Yau (CREST, JST, tohoku university), Y. Yang, and K. Itaya (tohoku university) |
| 14:30 | 1177 |
In-situ Modification and Characterization of Electrochemical Interfaces at Nanometer Scale - W. Schindler (University of Ulm), M. Hugelmann, and P. Hugelmann (University of Karlsruhe) |
| 14:45 | 1178 |
Step Decoration, the Role of Monoatomic Steps for Metal Deposition and Competitive Molecular Adsorption: New Insights - X. Xiao, K. Domke, and H. Baltruschat (Institut für Theoretische und Physikalische Chemie der Universität Bonn) |
| 15:00 | 1179 |
Electrochemical Synthesis of Nanocrystalline Materials - H. Natter and R. Hempelmann (Universität des Saarlandes) |
| 15:15 | 1180 |
In Situ Transmission Electron Microscopy Study of Nucleation and Growth During Electrochemical Deposition of Copper on Gold - A. Radisic, P. Searson (Johns Hopkins University), J. Hannon, and F. Ross (IBM T. J. Watson Research Center) |
| 15:30 | 1181 |
Fundamental Insights into the Kinetics and Growth of Electrodeposited Palladium Nanocrystallites - D. Bera, S. Kuiry, and S. Seal (University of Central Florida) |
| 15:45 | |
Fifteen-Minute Intermission |
| 16:00 | 1182 |
UHV-EC Studies of the Surface Chemistry of InP(100) wafers, as Substrates for the Electrodeposition of Compound Semiconductors - M. Madhivanan, J. Kim, and J. Stickney (Department of Chemistry) |
| 16:30 | 1183 |
Electrodeposition of nanoscale germanium and silicon in room temperature ionic liquids - F. Endres (Technical University of Clausthal) |
| 16:45 | 1184 |
Metal Latticeworks formed by oscillation-coupled electrodeposition - S. Nakanishi, K. Fukami, T. Tada, and Y. Nakato (Graduate School of Engineering Science, Osaka University) |
| 17:00 | 1185 |
Formation of Periodic Spatio-Temporal Structures of Silver-Indium Alloy Coatings Electrodeposited from Cyanide Electrolytes - T. Dobrovolska (Institute of Physical Chemistry, Bulg. Acad. Sci.), L. Veleva (CINVESTAV-IPN, Unidad Merida, Appl. Phys. Dept.), I. Krastev (Institute of Physical Chemistry, Bulg. Acad. Sci.), and A. Zielonka (Forschungsinstitut für Edelmetalle und Metallchemie, 73525 Schwäbisch Gmünd) |
| 17:15 | 1186 |
AFM induced sensitization of semiconductor surface for electrodeposition - Y. Zhang and P. Schmuki (Erlangen-Nürnberg University) |
| 17:30 | 1187 |
Imaging by Electrochemical Scanning Tunneling Microscopy and Deconvolution Resolving More Details of Surfaces Nanomorphology - J. Andersen (Technical University of Denmark) |
| 17:45 | 1188 |
Sum Frequency Generation (SFG) Studies of Molecular Structure on the Organic Film Surface - S. Ye, G. Li, T. Nishida, H. Noda, S. Morita, and M. Osawa (Hokkaido University) |
Co-Chairs: Y. Ito and R. Alkire
| Time | Abs# | Title |
|---|
| 10:00 | 1189 |
Structure, Stability and Reactivity of Bimetallic Overlayer and Supported Cluster Systems Studied from First Principles - A. Roudgar, M. Lischka, and A. Gross (Physics-Department T30, TU Munich) |
| 10:30 | 1190 |
In-situ X-ray Scattering Techniques in Electrochemistry - M. Gallagher, C. Lucas, B. Fowler, P. Thompson (University of Liverpool), and N. Markovic (Lawrence Berkeley National Laboratory) |
| 10:45 | 1191 |
Electrodeposition of cadmium on copper surfaces: Atomic structure and anion influence - K. Wandelt (University of Bonn) |
| 11:00 | 1192 |
In-Situ STM Study of Surface Ordering During Pb UPD on Cu (111) - N. Vasiljevic (Arizona State University), N. Dimitrov (State University of New York at Binghamton), and K. Sieradzki (Arizona State University) |
| 11:15 | 1193 |
Novel Features of Initial Stage Electrodeposition of SN and SB on AU and CU by In-Situ STM - B.-W. Mao, J.-W. Yan, J. Tang, and Z.-X. Xie (Xiamen University) |
| 11:30 | 1194 |
Stress Evolution During Monolayer Deposition of Cu on Au (111) - K. Sieradzki, T. Trimble, M. Van Schilfgaarde, N. Vasiljevic, N. Dimitrov, and L. Tang (Arizona State University) |
| 11:45 | 1195 |
Underpotential codeposition of (Fe,Co,Ni)1-xPtx alloys from aqueous solution - J. Mallett (National Institute of Standards and Technology), E. Svedberg (Seagate Technology), W. Egelhoff, and T. Moffat (National Institute of Standards and Technology) |
Co-Chairs: R. Alkire and T. Homma
| Time | Abs# | Title |
|---|
| 14:00 | 1196 |
A new approach to metal deposition onto organic monolayers: Pd on a mercaptopyridine-SAM - V. Ivanova, T. Baunach, D.M. Kolb, H.-G. Boyen, and P. Ziemann (University of Ulm) |
| 14:30 | 1197 |
Atomic Level Studies of Adsorption of Additives at the Electrode Surfaces during Electrodeposition of Zinc on Iron Electrodes - J.-Y.L. Lee, J.-W. Kim, and S.-M. Park (Pohang University of Science and Technology) |
| 15:00 | 1198 |
Simulated additive behavior in a copper-deposition bath using molecular dynamics - C. Guymon and D. Wheeler (Brigham Young University) |
| 15:15 | 1199 |
Chemical Mechanism of Suppression of Copper Electrodeposition by Polyethylene Glycol - K. Hebert, S. Adhikari, and J. Houser (Iowa State University) |
| 15:30 | 1200 |
Superconformal Film Growth - T. Moffat, D. Wheeler, and D. Josell (NIST) |
| 15:45 | 1201 |
Effect of Iron Octaethylporphyrin Adlayer on the Electrocatalytic Reduction of O24 on Au(111) Electrode - S. Yoshimoto, A. Tada, and K. Itaya (Tohoku University) |
| 16:00 | |
Fifteen-Minute Intermission |
| 16:15 | 1202 |
Macrostep Growth of Silver Electrodepositing in AgNO3 Aqueous Solution - Y. Fukunaka (Dept. of Energy Science & Technology, Kyoto University) and Y. Konishi (Dept. of Chemical Engineering, University of Illinois) |
| 16:45 | 1203 |
Electrical Conduction Property of Covalently Attached Methyl Monolayer on Si(111) - D. Niwa, H. Fukunaga, T. Homma, and T. Osaka (Department of Applied Chemistry) |
| 17:00 | 1204 |
On the Contrasting Effect Exerted by A Thin Layer of CdS Against the Passivation of Metal Electrodes Coated by Thiols - F. Loglio, E. Salvietti, M. Innocenti, G. Pezzatini, and L. Foresti (University of Florence) |
| 17:15 | 1205 |
Effect Of Additives On Deposition and Corrosion: Vibrational Spectroscopic Measurements - A. Gewirth, Z. Schultz, V. Feng, and X. Li (University of Illinois) |
| 17:30 | 1206 |
Single Batch Process for Area-Selective Formation of Si Micropore Array and Metal Filling - H. Sato, K. Mori, T. Homma, T. Osaka, and S. Shoji (Waseda University) |
| 17:45 | 1207 |
Electrochemical Synthesis and Characterization of Birnessite-Type Layered Manganese Oxides - M. Nakayama, S. Konishi, H. Tagashira, and K. Ogura (Yamaguchi University) |
| Time | Abs# | Title |
|---|
| o | 1208 |
Preparation of High Performance Titanium Oxide Films by Anodization Process - K. Onoda (Institute of Advanced Energy, Kyoto University), M. Asano (Nara Prefectural Institute of Industrial Technology), and S. Yoshikawa (Institute of Advanced Energy, Kyoto University) |
| o | 1209 |
Oxidation of H2 0n Pt(111)mand the reaction with CO - L. Blum (University of Puerto Rico) |
| o | 1210 |
Copper Deposition on the Au(111) electrode influenced by simultaneously adsorbed thymine - C. Donner (Free University Berlin) |
| o | 1211 |
Preparations of Metal Monolayer Islands Using Self-assembled Monolayer Technique - A. Kongkanand and S. Kuwabata (Osaka University) |
| o | 1212 |
Novel Applications of the Quartz Crystal Microbalance Technique for the Characterization of the Solid-Liquid Interface - A. Bund, S. Wehner (TU Dresden), K. Wondraczek, and D. Johannsmann (TU Clausthal) |
| o | 1213 |
Cathodic Deposition of Mixed Mo/V Oxyhydroxide Films from V-Substituted Polymolybdophosphate - M. Nakayama, H. Komatsu, S. Ozuka, and K. Ogura (Yamaguchi University) |
| o | 1214 |
Influence of the Complexing Agents on the Thickness Uniformity of Electroless Nickel Plating - T. Tsunoda, T. Okabe, and H. Honma (Kanto Gakuin University) |
| o | 1215 |
Growth of RuO_2 by Electrochemical and Gas Phase Oxidation of a Ru(0001) Surface - M. Vukmirovic, R. Sabatini, and R. Adzic (Brookhaven National Laboratory) |
| o | 1216 |
Density Functional Theory Study on the Reaction Mechanism of Reductants for Electroless Silver Deposition Processes - T. Shimada (Department of Applied Chemistry, Waseda University), H. Nakai (Department of Chemistry, Waseda University), T. Homma, and T. Osaka (Department of Applied Chemistry, Waseda University) |
| o | 1217 |
Density Functional Theory Study on the Oxidation Mechanisms of Aldehydes as Reductants for Electroless Deposition Process - K. Sakata, T. Shimada (Department of Applied Chemistry, Waseda University), H. Nakai (Department of Chemistry, Waseda University), T. Homma, and T. Osaka (Department of Applied Chemistry, Waseda University) |
| o | 1218 |
Site Specific lectrolyte Interaction at Terraced Si (111) Surfaces - J. Lewerenz, J. Jakubowicz, M. Lublow, and H. Jungblut (Hahn-Meitner-Institut Berlin GmbH) |
| o | 1219 |
Fabrication of SERS-Active Substrate Using Electrodeposited Silver with Nanoscale Dendrites - M. Saito (Waseda University) and M. Yanagisawa (NEC Corp.) |
| o | 1220 |
Electrodeposition of PbTe Thin Films - F. Xiao, N. Myung, T. Farm, and P. Ayala (University of California-Riverside) |
| o | 1221 |
Characterization of Mossy Zinc Electrodeposits - R. Wang, D. Kirk (University of Toronto), and G. Zhang (Teck Cominco Metals Ltd.) |
| o | 1222 |
New Conceptions on the Structure Formation of the Metals Being Electrodeposited, and their Usage for the Development of Corrosion-Proofing Technologies for Canned Food Steel Sheet - O. Girin (Ukrainian State University of Chemical Engineering) |
| o | 1223 |
Stress Changes of Binary CoNi Alloy Films Electrodeposited from Different Anions - R.-Y. Song, D.-Y. Park, J.M. Ko (Hanbat National University), and N.V. Myung (University of California, Riverside) |