201st Meeting - Philadelphia, PA
May 12-17, 2002
PROGRAM INFORMATION
G1 - Solid-State General Poster Session
Dielectric Science and Technology/Electrodeposition
Tuesday, May 14, 2002
Franklin Hall, Level 4
Co-Chairs: C.L. Claeys and A. Bergendahl
Time | Abs# | Title |
o | 352 |
Impact of Interface Nitridation and Remote-Plasma-Assisted Oxidation (RPAO) Thickness on Breakdown Phenomena and Reliability of Stacked Oxide/Nitride and Oxynitride Dielectrics under Constant Voltage Stress (CVS) - Y. Lee (North Carolina State University), Y. Wu (Advanced Micro Devices Inc.),
J.G. Hong, and G. Lucovsky (North Carolina State University) |
o | 353 |
Characteristics of Complexes of Poly(ethylene oxide) with Lithium Salts - Y.-C. Liu, L.-H. Lin, Y.-S.
Liang, and C.-J. Tsai (Van Nung Institute of Technology) |
o | 354 |
Electrical and Reliability Characteristics of High-K HfO2 Gate Dielectrics - D. Han, J. Kang, X. Liu, and R. Han (Peking University) |
o | 355 |
XPS and TEM Studies of Steam-Grown Oxynitride - W. Cai (ON Semiconductor Co.) |
o | 356 |
Ab-initio Calculations of Infra-Red Absorption in Nitrogen Doped Czochralski Silicon -
F.S. Karoui, A. Karoui, G.A. Rozgonyi (North Carolina State University), N. Inoue, and H. Harada (Osaka Prefecture University) |
o | 357 |
Analysis of Leakage Current of Low-k Materials for Use As ILD - T. Fukuda, H. Nishino, and H. Yanazawa
(ASET) |
o | 358 |
Investigation of Oxygen Precipitation in Photovoltaic Polycrystalline Sheet Silicon - J. Lu, M. Wagener, G. Rozgonyi (North Carolina State University), and J. Rand
(Astropower, Inc.) |
o | 359 |
Self-Grown Hydrophobic Nano Molecule Films on the Low Dielectric Materials as an Organic Diffusion Barrier - J.C.
Hu, C.W. Wu, W.C. Gua (National Tsing Hua University), T.C. Chang (National Sun Yat-Sen University), and
L.J. Chen (National Tsing Hua University) |
o | 360 |
In situ FTIR Analysis of Growth Process and Structure Properties of MOCVD Tantalum Nitride by Terbutylimidotris(diethylamido)tantalum -
C.W. Wu, W.C. Gau, J.C. Hu (National Tsing Hua University), T.C. Chang (National Sun Yat-Sen University),
C.J. Chu (Nanmat Technology Co., LTD.), and L.J. Chen (National Tsing Hua University) |
o | 361 |
Microstructural Study of Cured HSQ Resin Coated on a Patterned Wafer Using Scanning Transmission Electron Microscopy (STEM) with Electron Energy Loss Spectroscopy (EELS) - G. Kim, D. Wyman, M. Spaulding, Z. Li, and E. Moyer (Dow Corning Corporation) |
o | 362 |
Characterization of Ultra-Thin Oxynitride Films by Time-of-Flight Secondary Ion Mass Spectrometry - B.
Schueler, S. Bryan (Physical Electronics), D. Hockett, P. Lindley, and I. Mowat (Charles Evans & Associates) |
o | 363 |
Directional Pore Arrays on Anodic Aluminum Oxide Template - W.-J. Cho (Korea Institute of Science and Technology), S. Lee
(Sogang University), J.G. Park, Y.J. Park, and E.K. Kim (Korea Institute of Science and Technology) |
o | 364 |
TPD Study on the Decomposition Mechanism of 2,2,6,6-tetramethyl-3,5-heptadione - Y. Cho and S. Moon (Seoul National University) |
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