Thank you to the 242nd ECS Meeting symposia sponsors!
Platinum

Applied Materials, Inc.
G03 – SiGe, Ge, and Related Materials: Materials, Processing, and Devices 10

U.S. Army Research Office
L02- Molten Salts and Ionic Liquids 23 (MSIL-23)
Gold

Gelest, Inc.
G02- Atomic Layer Deposition and Etching Applications 18
Office of Naval Research
I01-Polymer Electrolyte Fuel Cells & Electrolyzers 22 (PEFC&E 22)

Case Western Reserve University Alumni Association
I02- Frontiers of Chemical/Molecular Engineering in Electrochemical Energy Technologies 2: In Honor of Robert Savinell’s 70th Birthday

QuantumScape Corporation
I03 – Solid State Ionic Devices 14
Silver

Corning, Inc.
A04–Next Generation Batteries

Tokyo Electron Limited
G02 – Atomic Layer Deposition and Etching Applications 18

Globalfoundries LLC
G03 – SiGe, Ge, and Related Materials: Materials, Processing, and Devices 10
Bronze

Daicel Corporation
A03 – Lithium Ion Batteries

Energy Assurance LLC
A03 – Lithium Ion Batteries
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LG Energy Solutions
A03 – Lithium Ion Batteries
Sila Nanotechnologies, Inc.
A03 – Lithium Ion Batteries

Applied Materials, Inc.
G02 – Atomic Layer Deposition and Etching Applications 18

ASM International N.V.
G02- Atomic Layer Deposition and Etching Applications 18
G03 – SiGe, Ge, and Related Materials: Materials, Processing, and Devices 10

Lam Research Corporation
G02 – Atomic Layer Deposition and Etching Applications 18

U.S. Army Research Office
I01- Polymer Electrolyte Fuel Cells & Electrolyzers 22 (PEFC&E 22)

Mitsui Kinzoku
I03 – Solid State Ionic Devices 14
Contributing
Nissan Group of North America
A01 – New Approaches and Advances in Electrochemical Energy Systems
Arbin Instruments
Covalent Metrology
A03 – Lithium Ion Batteries
Neware Technology Limited
A05 – Extreme Batteries
Lam Research Corporation
D04 – Plasma and Thermal Processes for Materials Modification, Synthesis, and Processing 4
Tecnochimica
E04 – 100 Years Electrodeposition Division: Past, Present and Future
Air Liquide Advanced Materials
G02-Atomic Layer Deposition and Etching Applications 18






