The Electrochemical Society (ECS) proudly celebrates the continued success of “Origin and Innovations of CMP Slurry” by Dr. Hitoshi Morinaga, published in the ECS Journal of Solid State Science and Technology (JSS) as part of the Focus Collection, “Chemical Mechanical Planarization (CMP): Past, Present, and Future in Honor of S. V. Babu” (DOI: 10.1149/2162-8777/ad5fb6).
Since its publication just over a year ago, Dr. Morinaga’s article has remained on JSS’s most-read list, earning over 6,000 downloads and seven Web of Science citations. A dedicated ECS member since 1999, and an active contributor to the ECS Electronics and Photonics Division and ECS Japan Section, Dr. Morinaga’s work reflects both technical excellence and deep engagement with our community.
This achievement underscores the global relevance of CMP research and the value of JSS as a platform for advancing the field. We invite you to read and share this influential work—and explore more groundbreaking research in JSS that shapes the future of electronics and photonics.
Read the article here.
This milestone reminds us that the most powerful research is that which sparks conversation, inspires collaboration, and leads to real-world progress. Keep exploring the ECS Journal of Solid State Science and Technology for more articles like this—because innovation thrives when knowledge is shared.