The Electrochemical Society (ECS) proudly celebrates the continued success of “Origin and Innovations of CMP Slurry” by Dr. Hitoshi Morinaga, published in the ECS Journal of Solid State Science and Technology (JSS) as part of the Focus Collection, “Chemical Mechanical Planarization (CMP): Past, Present, and Future in Honor of S. V. Babu” (DOI: 10.1149/2162-8777/ad5fb6).
Since its publication just over a year ago, Dr. Morinaga’s article has remained on JSS’s most-read list, earning over 6,000 downloads and seven Web of Science citations. A dedicated ECS member since 1999, and an active contributor to the ECS Electronics and Photonics Division and ECS Japan Section, Dr. Morinaga’s work reflects both technical excellence and deep engagement with our community.