We are pleased to spotlight a publication from the ECS Journal of Solid State Science and Technology (JSS):

“Low-Damage Atomic Layer Etching for Contact Resistance Reduction in Millimeter Wave AlGaN/GaN HEMTs on Si” (DOI: 10.1149/2162-8777/ae1ced) by Hsuan-Yao Huang et al. (2025) —available fully open access.

In this work, the authors address one of the key bottlenecks for high-frequency GaN electronics: ohmic contact resistance and accompanying device damage in high-electron-mobility transistors (HEMTs) built on Si substrates. Conventional etching methods for the ohmic-recess process often introduce plasma-induced damage, rough surfaces, and degraded channel performance. (more…)

Interest in silicon carbide (SiC) materials continues to grow—as witnessed by Alain E. Kaloyeros’ and Barry Arkles’ open access article in the ECS Journal of Solid State Science and Technology (JSS). The Electrochemical Society (ECS) proudly celebrates “Silicon Carbide Thin Film Technologies: Recent Advances in Processing, Properties, and Applications – Part I Thermal and Plasma CVD,” which has consistently ranked among the Top Read articles across the ECS journals platform. 

The Electrochemical Society (ECS) proudly celebrates the continued success of “Origin and Innovations of CMP Slurry” by Dr. Hitoshi Morinaga, published in the ECS Journal of Solid State Science and Technology (JSS) as part of the Focus Collection, “Chemical Mechanical Planarization (CMP): Past, Present, and Future in Honor of S. V. Babu” (DOI: 10.1149/2162-8777/ad5fb6).

Since its publication just over a year ago, Dr. Morinaga’s article has remained on JSS’s most-read list, earning over 6,000 downloads and seven Web of Science citations. A dedicated ECS member since 1999, and an active contributor to the ECS Electronics and Photonics Division and ECS Japan Section, Dr. Morinaga’s work reflects both technical excellence and deep engagement with our community.

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ECS announces that the ECS Journal of Solid State Science and Technology (JSS) and Journal of The Electrochemical Society (JES) are now included in publishing agreements with the University of California Digital Library and the French higher education and research institutions’ Couperin consortium. (more…)