Call for Papers: JSS Focus Issue

JSS CoverThis special issue of the ECS Journal of Solid State Science and Technology focuses on defect characterization in semiconductor materials and devices. We especially welcome papers in the following domains:

  • Structural, chemical, electrical and optical characterization of extended defects in semiconductor nano-structures and materials
  • Electrical and optical characterization of point defects in semiconductor nano-structures
  • Semiconductor-device-based defect analysis
  • Impact of (extended) defects on device and circuit operation and yield
  • Defect characterization and control in hetero-epitaxial layers and nano-structures grown on Si, comprising Ge, SiGe, GeSn, III-V and III-nitrides
  • Ab initio calculations and TCAD of the electrical activity of (extended) defects in semiconductor materials and devices
  • Defect control and mitigation strategies during hetero-epitaxial deposition

Find out more!

Submission Deadline | Oct. 21, 2015
Papers accepted into this focus issue are published online within 10 days of acceptance.
The issue is created online an article at a time with the final article published in March 2016.

Call for Nominations

Electronic and Photonic Devices and Systems Technical Editor
for
ECS Journal of Solid State Science and Technology and ECS Solid State Letters

jsssslECS (The Electrochemical Society) is seeking to fill the position of Technical Editor of the Electronic and Photonic Devices and Systems Technical Interest Area for the ECS Journal of Solid State Science and Technology and ECS Solid State Letters.

The Electronic and Photonic Devices and Systems (EPDS) Technical Interest Area (TIA) includes fundamental properties and measurements of device fabrication and characteristics for electronic and photonic applications. Specific topics include thin film transistors; MOSFETs; bipolar devices; quantum devices; silicon, germanium, and related microelectronic and photonic devices; micro- and nano-electro-mechanical systems (MEMS and NEMS); solid state sensors; wide bandgap semiconductor materials and devices; photovoltaic energy conversion devices; phase change memories; graphene-based devices; plasmonics; power devices; silicon-on-insulator devices; and bioelectronics. Learn more.

Call for Papers: JSS Focus Issue

focus_issues_coversThe editors of the ECS Journal of Solid State Science and Technology are calling for papers for the upcoming focus issue: Novel Applications of Luminescent Optical Materials.

Submission Deadline: July 15, 2015

Submit your manuscript today!

The research landscape of luminescent and optical materials is rapidly changing due to a need for such materials outside the lighting and display technologies. Novel materials are needed and are developed with luminescent and optical properties appropriately tuned for applications in solar cells, sensors, bio-imaging, light extraction, and related opto-electronics in addition to solid state lighting and display technologies.

Find out more.

Read previous focus issues in ECS journals.

The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

Atomic Layer Etch (ALEt) and Atomic Layer Clean (ALC) are emerging as enabling technologies for sub 10nm technology nodes. At these scales performance will be extremely sensitive to process variation.

Atomic layer processes are the most promising path to deliver the precision needed. However, many areas of ALEt and ALC are in need of improved fundamental understanding and process development. This focus issue will cover state-of-the-art efforts that address a variety of approaches to ALEt and ALC.

Topics of interest include but are not limited to:

  • Surface reaction chemistry and its impact on selectivity
  • Plasma ion energy distribution and control methods
  • Novel plasma sources and potential application to ALEt & ALC
  • Innovative approaches to atomic layer material removal
  • Novel device applications of ALEt & ALC
  • Process chamber design considerations
  • Advanced delivery of chemicals to processing chambers
  • Metrology and control of ALEt & ALC
  • Device performance impact
  • Synthesis of new chemistries for ALEt & ALC application
  • Damage free surface defect removal
  • Process and discharge modeling

Find out more!

Deadline for submission of manuscripts is December 17, 2014.

Please submit manuscripts here.

The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

Printing technologies in an atmospheric environment offer the potential for low-cost and materials-efficient alternatives for manufacturing electronics and energy devices such as luminescent displays, thin film transistors, sensors, thin film photovoltaics, fuel cells, capacitors, and batteries.

This focus issue will cover state-of-the-art efforts that address a variety of approaches to printable functional materials and devices.

Topics of interest include but are not limited to:

  • Printable functional materials: metals; organic conductors; organic and inorganic semiconductors; and more
  • Functional printed devices: RFID tags and antenna; thin film transistors; solar cells; and more
  • Advances in printing and conversion processes: ink chemistry; ink rheology; printing and drying process; and more
  • Advances in conventional and emerging printing techniques: inkjet printing; aerosol printing; flexographic printing; and more

Find out more!

Deadline for submission of manuscripts is November 30, 2014.

Please submit manuscripts here.

The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

Atomic Layer Etch (ALEt) and Atomic Layer Clean (ALC) are emerging as enabling technologies for sub 10nm technology nodes. At these scales performance will be extremely sensitive to process variation.

Atomic layer processes are the most promising path to deliver the precision needed. However, many areas of ALEt and ALC are in need of improved fundamental understanding and process development. This focus issue will cover state-of-the-art efforts that address a variety of approaches to ALE and ALC.

Topics of interest include but are not limited to:

  • Surface reaction chemistry and its impact on selectivity
  • Plasma ion energy distribution and control methods
  • Novel plasma sources and potential application to ALEt & ALC
  • Innovative approaches to atomic layer material removal
  • Novel device applications of ALEt & ALC
  • Process chamber design considerations
  • Advanced delivery of chemicals to processing chambers
  • Metrology and control of ALEt & ALC
  • Device performance impact
  • Synthesis of new chemistries for ALEt & ALC application
  • Damage free surface defect removal
  • Process and discharge modeling

Find out more.

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