Topic Close-up #7
Symposium G01: 16th International Symposium on Semiconductor Cleaning Science and Technology (SCST 16)
Symposium focus: With the very first meeting held in Hollywood, FL, in 1989 the SCST Symposium is among the longest running meetings organized under the auspices of ECS. The focus of this symposium is on the science and technology of surface cleaning and conditioning in semiconductor device manufacturing. The symposium covers a wide range of topics related to the surface processing of elemental semiconductors Si(SOI) and Ge and compound semiconductors such as SiC, SiGe, III-V, and II-VI materials as well as non-semiconductor surfaces including sapphire, glass, ITO, and flexible plastic substrates. Topics of interest include contaminants removal, broadly understood surface conditioning processes, cleaning media, including non-aqueous cleaning methods, and cleaning tools. More detailed description of the topics remining within the scope of the Semiconductor Cleaning Science and Technology Symposium can be found in the symposium’s Call for Papers. (more…)








