General Student Poster Session award winners from left to right: Jae Young Yoo, Hao Wang, Tammy Pham, Mario Cedano, David Reber

Established in 1993, the General Student Poster Session Awards acknowledge the eminence of a students’ work. The winners display an understanding of their research topic and its relation fields of interests to ECS.

Eligibility for the General Student Poster Session Awards requires students to submit their abstracts to the Z01 General Student Poster Session symposium and present their posters at the biannual meeting.

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The 2018 ECS Annual Business Meeting and Luncheon* will be held on Tuesday, May 15 at the 233rd ECS Meeting in Seattle, WA from 1200 – 1400h.

Featured Speaker

We are pleased to have David Danielson with a talk titled, “Electrochemistry & the Electrification of Everything in the Era of Low Cost Renewable Energy.” Danielson is the managing director of Breakthrough Energy Ventures, a new $1B+ climate-tech investment fund backed by Bill Gates and 20 other highly successful business leaders from around the world. Learn more about David Danielson and how our sciences are at the forefront of the energy revolution.

Learn and Lunch: 2017 Successes

Join past and present ECS leadership for a look at our organization and the strides made over the last year. The 2017 year was successful in many ways and the annual business meeting will give you a glimpse in program areas such as publications, meetings and, of course, membership.

Sign up when you register for the meeting. If you are already registered, you can add it by logging in to My Account > My Events > select 233rd ECS Meeting > click Add Tracks/Sessions.

For the 233rd ECS Meeting that is. Additional rooms have been secured at the Crowne Plaza with rates beginning at $199/night.

Book now for free WiFi, a 24-hour fitness center, and a short walk to the meeting venues, all in the heart of downtown Seattle.

Do not delay, this special room rate is only available until April 20, 2018.

Register now for the meeting!

Over 2,600 abstracts across 46 symposia from the upcoming 233rd ECS Meeting in Seattle, WA are now available for download in the ECS Digital Library!

ECS Meeting Abstracts contain extended abstracts of the technical papers presented at the ECS biannual meetings and ECS-sponsored meetings. This publication offers a first look into the current research in the field. ECS Meeting Abstracts are freely available to all visitors of the ECS Digital Library.

With over 60,000 total abstracts available electronically, be sure to check out content from past meetings!

Did you know? All ECS Transactions, Journal of The Electrochemical Society, and ECS Journal of Solid State Science and Technology articles that develop out of ECS Meeting Abstracts are linked back to their original abstracts in the digital library.

Don’t forget to join us in Seattle! The early bird deadline has passed, but there is still time to register!

Register today!

Professional development workshops are a growing feature of the ECS biannual meetings. Several new and recurring workshops being held at the 233rd ECS Meeting in Seattle, WA. The workshops are led by industry and career professionals in order to best serve the interests for mid- and early-career researchers and students.

New workshop additions

An Introduction to Intellectual Property
Instructor: Matthew Rappaport, IP Checkups, Inc.

In recent years intellectual property has become contentious with notable high-tech companies influencing patent rights. Nevertheless, IP continues to play a key role in the development and innovation ecosystem, particularly for start-ups and early-stage commercialization. In this short course, we will get down to basics in exploring the role of IP in protecting your early-stage development and commercialization. Along the way, we will review IP basics and explore portfolio development to help protect your inventions. Decisions such as internal R&D, strategic partnerships or licensing are informed by your portfolio. And finally, what to do when you have to enforce your rights. This workshop is 2.5 hours.

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Deadline for Submitting Abstracts
March 30, 2018
Submit today!

Topic Close-up #11

Symposium E04: Electrodeposition of Reactive Metals and Alloys for Energy Storage

Symposium purpose is to bring together experts from the fields of electrodeposition and energy storage to discuss and learn about the science and technological issues in this fascinating topic which we share. Electrodeposition or plating of reactive compounds is common place in energy storage applications such as metal-air, lithium metal and next generation sodium, magnesium or calcium battery concepts. On the other hand, high quality coatings of reactive metals and alloys such as aluminum, magnesium, vanadium and zinc find applications in anti-corrosion coatings, microelectronics, fuel cells, electrolyzers, supercapacitors and sensors. We welcome all abstracts about novel deposition processes, electrolytes and additives, insights in kinetics, nucleation and growth phenomena, as well as on advanced applications in this field.

Confirmed Invited Speakers include Dr. Fanny Barde of Toyota Motor Europe, Dr. Debra R. Rolison of NRL, Prof. Craig B. Arnold from Princeton University, Prof. Takayuki Homma from Waseda University and Snehashis Choudhury, young investigator at Cornell University (group of prof. Lynden Archer).

Deadline for Submitting Abstracts
March 30, 2018
Submit today!

Topic Close-up #10

Symposium G02: Atomic Layer Deposition Applications 14

Symposium Focus: This symposium focuses on a variety of applications of ALD and other atomic layer-by-layer processing in semiconductor CMOS (e.g. high-k oxides and metals for memories like Flash and 3D NAND, MIM, MIS capacitors), photovoltaics, energy storage and conversion, catalysis, optics and photonics, smart coatings of nanoporous materials, MLD and hybrid ALD/MLD, fundamentals of ALD processing: reaction mechanisms, in-situ measurement, modeling, theory, new precursors and delivery systems, optical and photonic applications, productivity enhancement, scale-up and commercialization of ALD equipment and processes for rigid and flexible substrates, including roll-to-roll deposition, spatial ALD, area-selective ALD, Atomic Layer Etching (‘reverse ALD’) and related topics aiming at self-limited etching.

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