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State-of-the-Art Program on Compound Semiconductors XXVI, D.N. Buckley, S.N.G. Chu, H.Q. Hou, R.E. Sah, J.P. Vilcot, and M.J. Deen, Editors, PV 97-1, Montreal, Canada - May 1997, ISBN 1-56677-128-5. Recent advances in compound semiconductor technologies are covered, including such issues as: materials growth technologies; wide bandgap materials, devices and processing; uniformity of epitaxy and interfaces; characterization of materials and devices; quantum effect devices; passivation, encapsulation and packaging; and theoretical simulations. Out of Print.
Low Temperature Electronics and High Temperature Superconductivity IV, C. Claeys, S.I. Raider, M.J. Deen, W.D. Brown, and R.K. Kirschman, Editors, PV 97-2, Montreal, Canada - May 1997, ISBN 1-56677-129-3. The following areas are represented: theoretical limitations and restrictions and superconducting materials; semiconductor components, superconducting devices, SQUIDS, optoelectronic devices, etc.; integrated circuits, low temperature systems, and superconducting circuits; packaging, assembly and interconnections, heat transfer and refrigeration systems, and device and system testing; and computer and telecommunications, space applications, infrared astronomy, instrumentation, etc. Out of Print.
ULSI Science and Technology VI, H.Z. Massoud, H. Iwai, C. Claeys, and R.B. Fair, Editors, PV 97-3, Montreal, Canada - May 1997, ISBN 1-56677-130-7. This volume focusses on processing, structure, properties, and manufacturing of ULSI integrated circuits with sub 0.25 micron features, including the following topics: ULSI device structure and technology, submicron device and process modeling and evaluation, submicron feature patterning, shallow junctions and ohmic contacts, ultrathin gates, removal of process-induced damage and contamination, rapid thermal processing, planarization techniques, ULSI interconnect and packaging, and ULSI manufacturing. Out of Print
Carbonate Fuel Cell Technology IV, J.R. Selman, I. Uchida, H. Wendt, D.A. Shores, and T.F. Fuller, Editors, PV 97-4, Montreal, Canada - May 1997, ISBN 1-56677-131-5. The status of molten carbonate fuel cell (MCFC) technology and its commercialization are reviewed. Some topics include: new or improved materials for cell components;odeling and prediction of electrode and cell performance at high powerensity; theoretical and experimental analysis of material corrosion; interaction of wetting and electrochemical or chemical phenomena; electrode design; novel cell and stack designs; systems analysis; manufacturing and fabrication processes; and demonstration of power plants. Out of Print
Microstructures and Microfabricated Systems III, P.J. Hesketh, G. Barna, and H.G. Hughes, Editors, PV 97-5, Montreal, Canada - May 1997, ISBN 1-56677-132-3. Topics include: fabrication and processing of two- and three-dimensional microstructures; new methods for materials processing at microscale dimension, sensors and detectors; use of microstructures in biological studies; multilevel thin-film structures; and chemical, electrical, and physical testing and reliability of micromechanical structures. Out of Print
Fundamentals and Potential Applications of Electrochemical Synthesis, R.D. Weaver, F. Fisher, F.R. Kalhammer, and D. Mazur, Editors, PV 97-6, Montreal, Canada - May 1997, ISBN 1-56677-133-1. Specific areas covered by this volume are: synthesis of high value-added products by electrochemical methods; electrochemical reactions for production of commodity chemicals offering potential advantages in cost or availability of raw materials, energy efficiency, or pollutant reduction; and use of electrochemical techniques to convert unwanted byproducts or other waste materials into useful products. Out of Print
Pits and Pores: Formation, Properties and Significance for Advanced Luminescent Materials, P. Schmuki, D.J. Lockwood, H.S. Isaacs, and A. Bsiesy, Editors, PV 97-7, Montreal, Canada - May 1997, ISBN 1-56677-134-X. This volume covers a wide range of theoretical and experimental work dealing with porous semiconductors and localized corrosion of metals. Discussed in detail are topics such as causes for the localized nature of the attack; kinetics, stability and morphology of pit and pore growth and the related chemistry; critical conditions for maintaining pit and pore growth; factors controlling pore geometry and distribution; etch tunnels; transport processes; passivation of pore surfaces; porous cages; and self-assembled structures. Also covered are light emission from porous semiconductors and its application in electronic devices. Out of Print
Low and High Dielectric Constant Materials: Materials Science, Processing and Reliability Issues II, H.S. Rathore, R. Singh, R.P.S. Thakur, and S.C. Sun, Editors, PV 97-8, Montreal, Canada - May 1997, ISBN 1-56677-135-8. Areas covered include: polyimides, spin-on-glass, fluorinated oxides, new polymeric technologies, foams/gels materials, and high dielectric constant oxides. Also covered is the area of reliability evaluations for: electromigration of multilevelmetal interconnection in submicron technology, stress-induced voids and mechanical/thermal stresses in submicron metal interconnections, barrier metallurgy, mechanistic studies of corrosion of metals, and gate dielectric integrity and hot carriers. Out of Print
Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing,M. Meyyappan, D.J. Economou, and S.W. Butler, Editors, PV 97-9, Montreal, Canada - May 1997, ISBN 1-56677-136-6. Topics include control methodologies, in situ measurement techniques, andodeling approaches. Processes covered include CVD, PVD, PECVD, etching, RTP, cleaning, and lithography. Other themes include: the relationship between modeling and control, calibration techniques, and automation issues. Out of Print
Silicon Nitride and Silicon Dioxide Thin Insulating Films IV, M.J. Deen, W.D. Brown, K.B. Sundaram, and S.I. Raider, Editors, PV 97-10, Montreal, Canada - May 1997, ISBN 1-56677-137-4. The following areas are covered: film preparation; film and film/substrate interface analysis by new and novel techniques; passivation, charge transport and trapping, tunneling phenomena, and dielectric breakdown; defects and impurities; electrical, chemical, physical, and optical properties; multi-layer dielectric stacks and interfaces; silicon dioxide and/or silicon nitride films; plasma science and plasma processing technology; quality verification; novel isolation techniques; and radiation effects. Out of Print
Quantum Confinement IV: Nanoscale Materials, Devices and Systems, M. Cahay, J.P. LeBurton, D.J. Lockwood, and S. Bandyopadhyay, Editors, PV 97-11, Montreal, Canada - May 1997, ISBN 1-56677-138-2. Recent developments in the area of nanoscale semiconducting, metallic, and superconducting structures are covered; of particular interest are: clusters and other nanostructures; novel fabrication techniques; electron transport in isolated and coupled quantum wires and dots; cooperative phenomena in nanoclusters; optical properties of quantum wires and dots; mesoscopic superconductors; and quantum architecture and circuits. Out of Print
Diagnostic Techniques for Semiconductor Materials and Devices, P. Rai-Choudhury, J. Benton, D. Schroder, and T.J. Shaffner, Editors, PV 97-12, Montreal, Canada - May 1997, ISBN 1-56677-139-0. Topics in this volume include: emerging techniques such as rocking-beam atomic force microscopy; the application of standard methods of monitoring to specific problems in materials growth, processing, or device failure; variations and improvements in routine diagnostic methods; and issues related to state-of-the-art IC production, such as time and cost measurements, technique modification needed for sub-micron characterization, and measurements needs for next generation manufacturing. Out of Print
Electrode Materials and Processes for Energy Conversion and Storage IV, J. McBreen, S. Mukerjee, and S. Srinivasan, Editors, PV 97-13,Montreal, Canada - May 1997, ISBN 1-56677-140-4. The focus of these topics is on progressmade in this area in the 20th century leading to technology development, manufacturing, and commercialization in the 21st century. Of interest are fuel cells, batteries, capacitors, photovoltaic and photo thermal cells, thermoelectrics, and thermionics. Also included: applications of these systems for power generation, cogeneration, transportation, space power, stand-by power, remote power and consumer-type power sources. Out of Print.
Fullerenes Volume 4: Recent Advances in the Chemistry and Physics of Fullerenes and Related Materials, K.M. Kadish and R.S. Ruoff, Editors, PV 97-14, Montreal, Canada - May 1997, ISBN 1-56677-141-2. This volume covers all aspects of fullerenes science and technology, with subsections on: electrochemistry, metallofullerenes, ESR, photoexcited states, gas phase/mass spectrometry, extraction/purification, theory, organic functionalization, technology/polymers, organometallics, biochemical/pharmaceutical, surface/film studies, thermodynamics, diffraction studies and structural and solid state physics, nanotubes/nanocarbons, and fullerene-based superconductors. Out of Print
Electrochemistry in the Preparation of Fluorine and Its Compounds, W.Ves Childs and Toshio Fuchigami, Editors, PV 97-15, Montreal, Canada - May 1997, ISBN 1-56677-142-0. The direct and indirect electrochemical preparation of the element and its compounds is the subject of this volume. Topics include: the fundamentalnature of the electrode processes, practical aspects of the process in the electrochemical cell; handling, preparation, and use; the formation of carbon-fluorine bonds and bonds with other elements; and the electrochemical molecular conversion of organic fluorine compounds. Out of Print
Electrochemical Surface Science of Hydrogen Adsorption and Absorption, G. Jerkiewicz and P. Marcus, Editors, PV 97-16, Montreal, Canada - May 1997, ISBN 1-56677-143-9. The most recent developments in this area are the subject of this volume, including: thermodynamics and kinetics of H adsorption on single-crystal and polycrystalline electrodes; co-adsorption of H, small neutral molecules and anions; role of site blocking elements; mechanistic and kinetic aspects of hydrogen absorption into the host and of cathodic hydrogen evolution reaction; metal hydrides as rechargeable anodes and materials for hydrogen storage; and selective electrohydrogenation of organic compounds. Out of Print.
The Electrochemical Double Layer - Commemorating Fifty Years of D.C. Grahame's Ground-Breaking Paper, B.E. Conway and C. Korzeniewski, Editors, PV 97-17, Montreal, Canada - May 1997, ISBN 1-56677-144-7. This major symposium, on the structure and properties of the double-layer at charged interfaces, recognizes the 50th anniversary of the publication of D.C. Grahame's seminal paper on the thermodynamics and other aspects of the double-layer. Topics include: modeling of the double-layer; diffuse-layer modeling; profiles of electron-density at charged metal surfaces; properties of the double-layer at solid metals; role of adsorption on ions and uncharged molecules; double layers at solid/solid interfaces; synchrotron, x-ray absorption-based studies of electrode interfaces; effects of stress on adsorption and interfacial friction; specificity of double-layer effects in electrode-kinetics; and fundamental aspects of electrochemical capacitors based on double-layer capacitance at high-area carbon materials. Out of Print.
Batteries for Portable Applications and Electric Vehicles, C.F. Holmes and A.R. Landgrebe, Editors, PV 97-18, Paris, France - September 1997, ISBN 1-56677-146-3. This volume deals with applied and basic research on the development and performance of batteries for mobile electronic products, such as laptop and palmtop computers, cellular phones, and camcorders; and for transportation applications such as electric and hybrid vehicles, buses, and trains. (See also Fuel Cells for Portable Applications and Electric Vehicles, SV 97-37.) Out of Print
Chemical and Biological Sensors and Analytical Electrochemical Methods, A.J. Ricco, M.A. Butler, P. Vanysek, G. Horvai, and A.F. Silva, Editors,PV 97-19, Paris, France - September 1997, ISBN 1-56677-147-1. This volume provides a snapshot of current sensor and analytical electrochemical research and development activities in Europe, North America, and Asia. The topical areas are: solid-state sensors; new concepts and gas sensors; acoustic sensors; analytical electrochemistry; electroanalysis; analytical electrochemical methods; sensors; biosensors; and spectroscopic methods. Out of Print
Photoelectrochemistry, K. Rajeshwar, L.M. Peter, A. Fujishima, D. Meissner, and M. Tomkiewicz, Editors, PV 97-20, Paris, France - September 1997, ISBN 1-56677-148-X. The fields of solar energy conversion and photoelectrochemistry are covered; in particular, the areas of electrochemistry, photocatalysis, and thin-film technology. Some of the topics include: liquid-junction and hybrid solar cells; semiconductor and surface film characterization; semiconductor/metal and other contacts; modeling and theoretical aspects; novel solar energy storage approaches; surface modification and photoetching of semiconductor electrodes; dye-sensitization; and environmental pollution abatement. Out of Print.
State-of-the-Art Program on Compound Semiconductors XXVII, S.N.G. Chu, D.N. Buckley, K. Wada, J.P. Vilcot, W. Pletschen, D. DeCoster, P. VanDaele, and H.Q. Hou, Editors, PV 97-21, Paris, France - September 1997, ISBN 1-56677-149-8. The most recent developments in compound semiconductors encompassing advanced devices, materials growth, characterization, processing, device fabrication, and reliability are addressed; particularly in the following areas: advances in bulk and epitaxial growth technologies of III-V semiconductors; wet and dry etching; fine-line patterning; dielectric deposition; ion implantation; passivation and annealing; bonding and packaging; and novel devices for high speed information superhighways. Out of Print
Crystalline Defects and Contamination Control: Their Impact and Control in Device Manufacturing II, B.O. Kolbesen, P. Stallhofer, C. Claeys, and F. Tardiff, Editors, PV 97-22, Paris, France - September 1997, ISBN 1-56677-175-7. The latest developments and evolution related to crystalline defects and contamination control is the subject of this volume, with focus on their impact and control in device manufacturing. Some of the areas covered include: process-induced defects; nucleation, growth, and annihilation processes; impact thermal treatments, mechanical stresses, advanced processing modules; radiation-induced defects; strategies and measures for reduction of defect and contamination levels; and more. Out of Print
Silicon-on-Insulator Technology and Devices III, S. Cristoloveanu et al. Editors, PV 97-23, Paris, France - September 1997, ISBN 1-56677-176-5. The topics in this volume will be of interest to materials and device scientists, as well as to process and applications oriented engineers. Topics include: substrate preparation, novel structures and heterostructures; materials evaluation, wafer screening and nondestructive techniques, basic properties, properties of ultrathin oxides and films, tools for quality control; SOI MOSFETs; and devices and circuits. Out of Print
Ionic and Mixed Conducting Ceramics III, T.A. Ramanarayanan, W.L. Worrell, H.L. Tuller, M. Mogensen, and A.C. Khandkar, Editors, PV 97-24, Paris, France - September 1997, ISBN 1-56677-177-3. Ceramic materials topics covered include: ionic transport in solid electrolytes; mixed conduction in ceramics; electrocatalytic phenomena; electrochemical processes for hydrogen conversion; electrode reactors in solid state electrochemical cells; batteries and fuel cells involving ceramic components; thin-film ceramic membranes; and applications in ceramic sensors. Out of Print
Chemical Vapor Deposition: CVD XIV and EUROCVD-11, M.D. Allendorf and C. Bernard, Editors, PV 97-25, Paris, France - September 1997, ISBN 1-56677-178-1. The following CVD topics are included in this volume: fundamental principles and measurements, gas and surface chemistry, thermochemistry, kinetics; modeling, theory and experimental verification; nucleation and renucleation, growth, partial equilibrium; materials types, optical materials, semiconductors, superconductors, etc.; special application, single crystal growth, polycrystalline microstructure control, MOCVD, etc.; and approaches, advanced in situ characterization for diagnostics and control, intelligent process control, unique activation methods, and UHV-CVD. Out of Print
Passivity and Its Breakdown P.M. Natishan, H.S. Isaacs, M. Janik-Czachor, V.A. Macagno, P. Marcus, and M. Seo, Editors, PV 97-26, Paris, France - September 1997, ISBN 1-56677-179-X. Recent developments in the understanding of the fundamental and practical aspects of passive film formation and its breakdown on metals and alloys is the subject of this volume. Of particular interest are contributions addressing the interaction between the various factors interrelating important processes in the maintenance and undermining of passivity. Out of Print
Fundamental Aspects of Electrochemical Deposition and Dissolution Including Modeling, M. Paunovic, M. Datta, M. Matlosz, T. Osaka, and J.B. Talbot, Editors, PV 97-27, Paris, France - September 1997, ISBN 1-56677-180-3. All aspects of electrochemical deposition and dissolution processes, including structure and properties of electrochemically deposited/etched metals, alloys, semiconductors, and conductive polymers are covered: nucleation and growth; kinetics and mechanisms; structure and physical properties; mathematical modeling and numerical analysis of deposition and dissolution processes; and micro-engineered structures. Out of Print
Energy and Electrochemical Processing for a Cleaner Environment, W.A. Adams, L.J.J. Janssen, E.J. Rudd, J. Thonstad, and C.W. Walton, Editors, PV 97-28, Paris, France - September 1997, ISBN 1-56677-181-1. The chemicals and metals industries, manufacturing industries, energy production facilities and municipal utilities are presently sensitive to a substantial body of environmental constraints and to future (planned) legislation. Electrochemistry offers a flexible approach to provide solutions to the environmental problems; these papers focus upon such technology, both already developed and in the development phase. Out of Print
Physics and Chemistry of Luminescent Materials VI, C. Ronda and T. Welker, Editors, PV 97-29, Paris, France - September 1997, ISBN 1-56677-182-X. Topics range from fundamental studies of luminescence mechanisms to the technology underlying applications of luminescent materials. Topics of interest include the luminescence of phosphor materials, identification of defects active in luminescence or in nonradiative losses, surface effects, influence of processing, spectroscopy on luminescent materials, and modeling of luminescence mechanisms. Out of Print
Thin Film Processes, G.S. Mathad, M. Meyyappan, B. Agius, and M. Engelhardt, Editors, PV 97-30, Paris, France - September 1997, ISBN 1-56677-183-8. Both fundamental and applied aspects will be emphasized, related to the following topics used in the fabrication of submicron semiconductor devices: plasma processes and reactors; photochemical (laser, UV) processes for etching, deposition, and surface cleaning; rapid thermal processing; and process diagnostics, control, and modeling related to thin film processes. Out of Print
Interconnect and Contact Metallization, H.S. Rathore, G.S. Mathad, C. Plougonven, and C.C. Schuckert, Editors, PV 97-31, Paris, France - September 1997, ISBN 1-56677-184-6. All aspects of the fabrication and reliability of multilevel interconnections in ULSI devices and circuits are covered, including: low/high k materials; conductor films and processes; contact and via fill processes; planarization processes; electromigration of multilevel interconnections in submicron devices; stress induced voids and mechanical/thermal stresses in submicron metal interconnections; dielectric films; contact degradation; and mechanistic studies of metal corrosion; among other topics. Out of Print
Diamond Materials V, J.L. Davidson et al. Editors, PV 97-32, Paris, France - September 1997, ISBN 1-56677-185-4. The discussion of recent developments in the science, technology, and applications of diamond and related materials, is the subject of this volume. Topics include: modeling and simulation; nucleation and growth; growth techniques; equipment and process issues; microstructures; physical properties; gas-phase chemistry; plasma, flame, and arc diagnostics; characterization techniques; applications of diamond/related materials; and manufacturing issues. Out of Print
Long Wavelength Infrared Detectors and Arrays: Physics and Applications, S.S. Li, H.C. Liu, M.Z. Tidrow, and M.-H. Meynadier, Editors, PV 97-33, Paris, France - September 1997, ISBN 1-56677-186-2. The volume presents a discussion of recent developments inthe area of long wavelength (2-20 mm) infrared detectors, focal plane arrays, and related applications. In particular, recent advances in novel quantum well (QWIPs) and type-II superlattice detectors using III-V and II-VI compound semiconductors, uncooled infrared detectors, MCT, and PtSi are included. Out of Print.
III-V Nitride Materials and Processes, J.P. Dismukes et al. Editors, PV 97-34, Paris, France - September 1997, ISBN 1-56677-187-0. Recent experimental and theoretical advances are addressed, in materials, substrates, processes, characterization, properties, and modeling of BN, AIN, GaN, InN, ScN, and related materials, including ternary and quaternary solid solutions and heterojunction structures. Also covered are issues related to bulk and thin film crystal growth, structure, and characterization, defects, doping, device studies, optoelectronic properties, and luminescence behavior. Thermodynamic and kinetic factors related to stoichiometry control, impurity incorporation, and doping behavior will be included. Out of Print
Cleaning Technology in Semiconductor Device Manufacturing V, J. Ruzyllo and R.E. Novak, Editors, PV 97-35, Paris, France - September 1997, ISBN 1-56677-188-9. Areas of interest in this volume include: surface contaminants of concern in silicon processing; mechanisms of contaminant removal in chemical and physical cleaning; cleaning in liquid and gaseous ambients including UV and plasma-enhanced cleaning; new cleaning chemistries; implementation of wafer cleans toward desired surface passivation; correlation between cleaning and device performance; evaluation of cleaning through surface analysis, electrical, and optical measurements; control of particles during cleaning; equipment; application specific cleaning; cleaning in integrated processing; and in-line monitoring of wafer cleans. Out of Print.
Semiconductor Wafer Bonding IV: Science, Technology and Applications, U. Goesele, C.E. Hunt, H. Baumgart, T. Abe, and S.S. Iyer, Editors, PV 97-36, Paris, France - September 1997, ISBN 1-56677-189-7. Semiconductor wafer bonding has developed to be a versatile technology to create superior or otherwise not attainable materials combinations with applications in a variety of fields ranging from silicon-on-insulator (SOI) substrates over micromechanical devices to x-ray optics. This volume, interdisciplinary in scope, covers recent advances in the understanding and applications of wafer bonding and the full range of basic science aspects, processing technologies, and applications of wafer bonding. Both experimental and theoretical papers are included. Out of Print
Fuel Cells for Portable Applications and Electric Vehicles (Special issue of Electrochimica Acta, Elsevier Science),E.J. Cairns, Editor, PV 97-37, Paris, France - September 1997. A special issue of Electrochimica Acta, Elsevier Science, this volume deals with applied and basic research on the development and performance of fuel cells for mobile electronic products, such as laptop and palmtop computers, cellular phones, and camcorders; and for transportation applications such as electric and hybrid vehicles, buses, and trains. (See also Batteries for Portable Applications and Electric Vehicles, PV 97-18.) Out of Print.
Electrocatalysis (Special issue of Electrochimica Acta, Elsevier Science), D.A. Scherson and S. Trasatti, Editors, PV 97-38, Paris, France - September 1997. A special issue of Electrochimica Acta, Elsevier Science, this volume covers the fields of surface structure and dynamics, kinetics and electrocatalysis at solid-liquid and liquid-liquid interfaces. Of interest are in situ spectroscopy, diffraction and imaging techniques; kinetic and mechanistic aspects of electrode processes; structure-activity relations at electrode-electrolyte interfaces; and applications of ultrahigh vacuum surface analytical techniques for the characterization of electrodes. Out of Print
High Temperature Materials Science IX, K. E. Spear, Editor, PV 97-39, Proceedings from the HTMC IX Meeting State College, Pennsylvania, May 1997, ISBN 1-56677-190-0. HTMC IX emphasizes topics related to understanding and predicting the chemistry of the processing, fabrication, behavior, and properties of high temperature gaseous and condensed materials. Topics include synthesis and applications of advanced HTM; vaporization, corrosion, and oxidation processes; high temperature chemistry in waste disposal and environmental cleanup; measurement and modeling of high temperature surface and interface processes; and thermodynamic and kinetic measurements, modeling, and databases. Out of Print
Solid Oxide Fuel Cells V, U. Stimming, S. C. Singhal, H. Tagawa, and W. Lehnert, Editors, PV 97-40, Proceedings from the SOFC Meeting, Aachen, June 1997, ISBN 1-56677-145-5. Material on all aspects of Solid Oxide Fuel Cells (SOFC) is presented in this volume. Topics include: cell design, performance and modeling, materials for different cell components, fabrication methods for cell components and complete cells, electrode reactions and electrochemical performance; stacks and systems, including system studies; and field tests.
Fullerenes Volume 5: Recent Advances in the Chemistry and Physics of Fullerenes and Related Materials, K.M. Kadish and R.S. Ruoff, Editors, PV 97-42, Paris, France - September 1997, ISBN 1-56677-192-7. Out of Print
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