198th Meeting - Phoenix, Arizona

October 22-27, 2000

Phoenix Civic Plaza & Hyatt Regency Phoenix

Call for Papers

Deadline for Abstracts is June 1, 2000!

Click here to receive abstract submission information.

A1--GENERAL SOCIETY STUDENT POSTER SESSION

(All Divisions and Groups)

This Poster Session provides a forum for graduate and undergraduate and undergraduate students to present research results of general interest to the Society. The purpose of this session is to foster and promote work in both electrochemical and solid-state science and technology, and to stimulate active student interest and participation in the Society. A competition for the two best posters will be part of the session. A cash prize of $250 and a scroll will be awarded to the winning student authors. In the case of coauthors, a maximum award of $750 per winning poster will be divided equally between student coauthors. The awards will be made without regard to sex, citizenship, race, or financial need.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Session Organizers: P.S. Fedkiw, Department of Chemical Engineering, North Carolina State University, 113 Riddick Laboratories, Box 7905, Raleigh, NC 27695-7905 USA, Phone: (919) 515-3572, Fax: (919) 515-3465, E-mail: peter_fedkiw@ncsu.edu; and J.M. Fenton, Department of Chemical Engineering, U-222, Room 208, University of Connecticut, Storrs, CT 06269 USA, Phone: (860) 486-2490, Fax: (860) 486-2959, E-mail: jmfent@engr.uconn.edu.

A2--ELECTROCHEMISTRY VS. THE GLOBAL CLIMATE CHANGE: A COORDINATED RESPONSE

(All Divisions and Groups)

This is one of a few select symposia that is meant to transcend inter-Divisional boundaries of the Society. The significance of the topic calls for this innovative approach.

If the global climate change is indeed caused by the industrial activity of mankind, it should be mitigated by an organized science and technology response by society. Agendas of numerous national and international forums are addressing credible preventative measures. The Global Climate Change symposium will add to this activity, and will arguably propose solutions that will emanate from the intellectual, experimental and technological strength of electrochemistry and solid-state science, organized within ECS. Three basic questions will therefore be critical: 1. To what extent the coordination of our research and development efforts could be influential in the global “response” strategies?; 2. Based upon our advice, will ECS be able to affect the process of optimization of political decisions on the climate change prevention and remediation?; and 3. Can we influence young scientists, ECS members, to dedicate their careers to work toward the restoration of the climate equilibrium? The measure of the success of this symposium will be the extent that these questions can be addressed to a satisfactory degree.

Some invitations will be extended to create a core of the Symposium. Invited papers are solicited from members whose research strategies address the issues of global climate change. The number of such presentations and their contents will determine the structure and duration of the symposium, and the presentation time for each speaker.

The symposium will be organized along the following sub-topics that we believe are relevant to the overall topic of this symposium: fuel cells; green energy; solar energy; corrosion science; saving energy via materials protection; sensors; balancing industrial processes; electro-organic synthesis; and lower energy selective process.

Publication of a Proceedings Volume is planned after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full manuscript and a list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: A. Wieckowski, Department of Chemistry-RAL 58B, Box 56-5, University of Illinois, 600 South Mathews Avenue, Urbana, IL 61801-3602 USA, Phone : (217) 333-7943, Fax: (217) 244-8068, E-mail: andrzej@scs.uiuc.edu; E.J. Rudd, 35 Harmon Avenue, Painesville, OH 44077 USA, Phone: (440) 354-0436, E-mail: rudd@ncweb.com; E.W. Brooman, Concurrent Technologies Corporation, 100 CTC Drive, Johnstown, PA 15904-1935 USA, Phone: (814) 269-2838, Fax: (814) 269-2799, E-mail: brooman@ctc.com; M. Tomkiewicz, Department of Physics, Brooklyn College of CUNY, Bedford Avenue and Avenue H, Brooklyn, NY 11210 USA, Phone: (718) 951-5357, Fax: (718) 951-4645, E-mail: mitbc@cunyvm.cuny.edu; and T.F. Fuller, 300 Chestnut Hill Road, Glastonbury, CT 06033-4153 USA, Phone: (860) 727-2440, Fax: (860) 727-2139, E-mail:fullert@ifc.utc.com.

B1--BATTERY CHARGING, MONITORING AND CONTROL

(Battery/Energy Technology)

The proliferation of smart-battery technology has enabled battery pack designers, applications engineers, and users to have significant control over battery operation. Smart battery technology can produce accurate information about the state of a battery and will enable optimum charge control. The interface between the battery and its application will become a major factor in optimum use of various battery technologies. Thus, battery developers/application engineers have to develop both the battery and detailed descriptions of its performance characteristics so that accurate assessments of battery state-of-charge, state-of-health and optimum charge algorithm can be chosen. This symposium is a forum to present/discuss various aspects of battery charging, monitoring and control which is collectively called smart-battery technology. Investigations related to charging or analysis of all rechargeable battery chemistries including lithium-ion, nickel-metal hydride, lead-acid, nickel-cadmium, silver-zinc, etc., will be presented.

Topics that are appropriate for this symposium are: 1. Computer simulation and modeling of battery operation; 2. Techniques for analysis of battery characteristics and prediction of battery performance and life; 3. Electronics interface between the battery and applications; 4. Sensors and algorithms for battery state-of-health monitors and state-of-charge indicators/fuel gauge; 5. Advanced algorithms for battery charging; and 6. Stochastic/semi-empirical models for energy sources, and related battery application topics.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and the Symposium Organizers: W. van Schalkwijk, SelfCharge Inc., 6742 NE 185 Avenue, Suite 230, Redmond, WA 98052 USA, Phone: (425) 881-9199; Fax: (425) 883-1447; E-mail: powersci@aol.com; and T. Palanisamy, Allied Signal, Inc, CTC-3, 101 Columbia Road, Morristown, NJ 07962-1021 USA, Phone: (973) 455-2051, Fax: (973) 455-3942; E-Mail: samy@alliedsignal.com.

B2--RECHARGEABLE LITHIUM BATTERIES

(Battery/Energy Technology)

Papers are solicited on the both the fundamental and applied aspects of rechargeable lithium batteries (lithium metal, lithium ion and lithium polymer). Specific areas to be covered include, but are not limited to: 1. anode materials; 2. cathode materials; 3. electrolytes; 4. separators; 5. cell reaction mechanistic studies; 6. electrode processing/cell manufacturing; 7. performance and safety characteristics of cells and batteries; 8. failure modes/mechanisms; and 9. cell/battery modeling studies.

Publication of a Proceedings Volume is planned. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full proceedings volume manuscript and a list of key words by October 22, 2000. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and the Symposium Organizers: K.M. Abraham, 57 Colonial Road, Needham, MA 02492 USA, Phone: (781) 444-8453, E-mail: Ekemtec@aol.com; E.S. Takeuchi, Wilson Greatbatch, Inc., 10,000 Wehrle Drive, Clarence, NY 14031 USA, Phone: (716) 759-6901; Fax: (716) 759-8579; E-mail: etakeuchi@greatbatch.com; and M. Doyle, Dupont Central Research and Development, Experimental Station, Wilmington, DE 19880-0262 USA, Phone: (302) 695-8049; Fax: (302) 695-8347; E-mail: marc.doyle@usa.dupont.com.

B3--BATTERY/ENERGY TECHNOLOGY JOINT GENERAL SESSION

(Battery/Energy Technology)

Papers are solicited on the fundamental and applied aspects of energy conversion, storage and transmission not covered by other symposia at this meeting. Of particular interest are new materials and processes for batteries and fuel cells and novel energy conversion technologies. All types of batteries and fuel cells are of interest including aqueous electrolyte systems such as nickel-cadmium, zinc-air, lead-acid and nickel-metal hydride as well as non-aqueous electrolyte batteries and fuel cells. Papers on performance models are also welcome.

Abstracts, suggestions and inquiries should be sent electronically to the ECS Headquarters Office and to the Session Organizers: E. S. Takeuchi, Wilson Greatbatch, Ltd, 10,000 Wehrle Drive, Clarence, NY 14031 USA, Phone (716) 759-5358, Fax: (716) 759-5480; E-mail: etakeuchi@greatbatch.com; and T.F. Fuller, 300 Chestnut Hill Road, Glastonbury, CT 06033-4153 USA, Phone: (860) 727-2440, Fax: (860) 727-2139, E-mail:fullert@ifc.utc.com.

C1--APPLICATIONS FOR FULLERENE MATERIALS FOR BATTERIES AND FUEL CELLS

(Battery/Fullerenes)

The preparation and characterization of nanostructured materials are becoming increasingly important in the area of electrochemistry and energy conversion. This symposium will focus on the latest advancements in the science and technology of new materials for battery and fuel cell applications. Papers are solicited on the fundamental and applied aspects of energy conversion and storage using fullerenes, nanotubes, carbon nanoclusters and other innovative materials. The topics include: 1. Synthesis and characterization of new materials; 2. Electrochemical and catalytic properties; 3. Cell characterization and device performance; 4. Photoelectrochemical Cells; 5. Energy Storage; and 6. Environmental Impact.

Abstracts, suggestions, and inquiries, should be sent electronically to ECS Headquarters and to the Symposium Organizers: P.V. Kamat, Radiation Laboratory, University of Notre Dame, Notre Dame, IN 46556 USA, Phone: (219) 631-5411, Fax: (219) 631-8068, E-mail: pkamat@nd.edu and G.K.S. Prakash, Loker Hydrocarbon Research Institute, University of Southern California, Los Angeles, CA 90089 USA, Phone: (213) 740-5984, Fax: (213) 740-6679, E-mail:prakash@methyl.usc.edu.

D1--POWER SOURCES FOR THE NEW MILLENNIUM

(Battery/Energy Technology/Industrial Electrolysis and Electrochemical Engineering)

The Symposium on Power Sources for the New Millennium solicits papers covering new developments in Energy Conversion and Storage. The symposium plans interdisciplinary discussion among scientists and engineers on all aspects of power conversion. In particular, we solicit papers covering topics in: 1. micro power sources; 2. hybrid power systems; 3. thermal to electric energy conversion; 4. Novel development in cost effective materials for power sources; 5. new topics in energy storage; 6. Environmental issues/impact of new battery and fuel cell technologies; 7. Manufacturing, processing and assembling issues associated with power devices and materials (safety, material selection for compatibility, processing, etc.); and 8. Direct methanol fuel cells.

Papers related to efficient modeling and simulation of electrochemical phenomena and processes are also welcome. These may be related to batteries, fuel cells, other conversion technologies, electrodeposition and corrosion, electrosynthesis, economic simulations of in-place units and in general to all fields of electrochemical power sources.

Publication of a Proceedings Volume is planned. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full proceedings volume manuscript and list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: R.A. Marsh, Air Force Research Laboratory, 1950 Fifth Street, Wright-Patterson AFB, OH 45433-7251 USA, Phone: (937) 255-7770, Fax: (937) 656-7529, E-mail: marshra@wl.wpafb.af.mil; S. Surampudi, Jet Propulsion Laboratory, MS 277-211, 4800 Oak Grove Drive, Pasadena, CA 91109 USA, Phone: (818) 354-0352, Fax: (818) 383-6951, E-mail: subbarao.surampudi@jpl.nasa.gov; M.A. Ryan, Mail Stop 303-308, Jet Propulsion Laboratory, 4800 Oak Grove Drive, Pasadena, CA 91109 USA, Phone: (818) 354- 8028, Fax: (818) 393-4272, E-mail: mryan@jpl.nasa.gov; and M. Jain, Medtronic Promeon, 6700 Shingle Creek Pkwy MS G207, Brooklyn Center, MN 55430 USA, Phone: (612) 514-1159, Fax: (612) 514-1284, E-mail: mukul.jain@medtronic.com.

E1--CORROSION AND CORROSION PREVENTION OF LOW DENSITY METALS AND ALLOYS

(Corrosion)

Demands for improved performance and increased service life have promoted examination of all corrosion and corrosion control for light metals. This symposium will provide a forum for presentation and discussion on a range of issues related to corrosion of aluminum, magnesium, and titanium. Papers are solicited on topics including, but not limited to, novel alloys and heat-treatments, localized corrosion, environmental fracture, surface treatments for controling corrosion, lifetime prediction and modeling, and lifetime extension. The goal of this symposium is to capture the latest advances in ones of most active, dynamic and challenging field in corrosion science.

Publication of a Proceedings Volume is planned after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full proceedings volume manuscript and list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: B.A. Shaw, Department of Engineering Science and Mechanics, Penn State University, 211 Hallowell Building, University Park, PA 16802 USA, Phone: (814) 865-7828, Fax: (814) 863-0490, E-mail: bas13@psu.edu; and R.G. Buchheit, Fontana Corrosion Center, The Ohio State University, 477 Watts Hall, 2041 College Road, Columbus, OH 43210-1124 USA, Phone: (614) 292-6085, Fax: (614) 292-1537, E-mail: buchheit.8@osu.edu.

E2--NEW TRENDS IN ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY (EIS) AND ELECTROCHEMICAL NOISE ANALYSIS (ENA)

(Corrosion)

While EIS has become a mature technique for electrochemical investigations of many systems, ENA has only recently been applied for corrosion research and corrosion monitoring. The sessions on EIS will deal with recent advances in the collection and analysis of impedance data and the application of EIS in new electrochemical systems. New developments in instrumentation for collection of electrochemical noise data and new approaches for their analysis in the time and frequency domains will be discussed in the sessions on ENA. Of particular interest are the interpretation of ENA parameters such as the noise resistance and its correlation with the polarization resistance for the use of ENA in corrosion monitoring. Relationships between traditional impedance spectra and "noise impedance" spectra will also be discussed.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Session Organizers: F. Mansfeld, Department of Materials Science VHE 602, University of Southern California, Los Angeles, CA 90089-0241 USA, Phone: (213) 740-3016, Fax: (213) 740-7797, E-mail: mansfeld@usc.edu; F. Huet, Laboratoire Physique des Liquides et Electrochimie, UPR 15, CNRS, Universite Paris 6, Tour 22, 4 Place Jussieu 75252 Paris Cedex 05, France, Phone: 33-1-44-27-41-36, Fax: 33-1-44-27-40-74, E-mail: frh@ccr.jussieu.fr; and O.Mattos, COPPE/UFRJ/PEMM, P.O. Box 68505, 21945 Rio de Janeiro, Brazil, Phone: 55-21-290-1544, Fax: 55-21-290-6626, E-mail: omattos@metalmat.ufrj.br.

E3--CORROSION GENERAL SESSION

(Corrosion)

Papers concerning all aspects of corrosion and associated phenomena in liquid and gaseous phases not covered by topic areas of other specialized Corrosion Division symposia at this Meeting are welcome. Theoretical analyses, experimental techniques for the study of corrosion processes, and corrosion products are also of interest. Contributed papers will be ordered depending on the titles and content of the Meeting Abstracts.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters and to the Symposium Organizer: C.R. Clayton, State University of New York at Stony Brook, Department of Materials Science and Engineering, Stony Brook, NY 11794-2200 USA, Phone: (516) 632-9272, Fax: (516) 632-1346, E-mail: cclayton@notes.sunysb.edu.

F1--SECOND INTERNATIONAL SYMPOSIUM ON PITS AND PORES: FORMATION, PROPERTIES AND SIGNIFICANCE FOR ADVANCED MATERIALS

(Corrosion/Luminescence and Display Materials)

The Symposium is aimed at a more detailed understanding of growth mechanisms and the physical and chemical properties of all types of porous structures. The symposium is an attempt to integrate the diverse research in different fields such as localized metal corrosion, semiconductor electrochemistry, deposition into pores, matrix materials and optical spectroscopy in order to develop a highly transdisciplinary approach to the topic. Emphasis will be on pit formation, porous structure/surface property relations and on work relevant to the formation of advanced materials such as, for example, porous silicon, matrix composites and nanoclusters.

Of special interest in this symposium is experimental as well as theoretical work dealing with: 1. kinetics (growth laws), stability and morphology of pit and pore growth; 2.chemistry within pits, pores, and etch tunnels; 3. critical factors (conditions, chemical environment) for maintaining pit and pore growth; 4. causes for the localized nature of attack (dissolution); 5. selective dissolution (dealloying); 6. analogies and differences between localized corrosion of metals and semiconductors; 7. transport processes within pores; 8. passivation of porous surfaces; 9. optical characterization of porous materials, nanoparticles, and composites; 10. porous templates and material deposition into pores; 11. pore morphology and interface chemistry effects on optical properties; and 12. porous cages, matrices and composites.

Publication of a Proceedings Volume is planned after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full manuscript and a list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquires should be sent electronically to the ECS Headquarters Office and the Symposium Organizers: P. Schmuki, Swiss Federal Institute of Technology, Department of Materials Science, LC-DMX, EPFL-Ecublens, CH-1015 Lausanne, Switzerland, Phone: 41-21-6934954; Fax: 41-21-6935810, E-mail: Patrik.Schmuki@epfl.ch; D.J. Lockwood, Institute for Microstructural Sciences, National Research Council of Canada, Montreal Road, Building M-36, Ottawa, Ontario, Canada K1A 0R6, Phone: (613) 993-9614; Fax: (613) 993-64 86, E-mail: david.lockwood@nrc.ca; Y.H. Ogata, Institute of Advanced Energy, Kyoto University, Uij, Kyoto 611-0011, Japan, Phone: 81-774-38-3500; Fax: 81-774-38-3499, E-mail: y-ogata@iae.kyoto-u.ac.jp; H.S. Isaacs, Materials Science Division, Department of Applied Science, Brookhaven National Laboratory, Upton, NY 11973, USA, Phone: (516) 344-4516; Fax: (516) 344-4071, E-mail: isaacs@bnl.gov.

G1--FOURTH INTERNATIONAL SYMPOSIUM ON CHEMICAL MECHANICAL POLISHING (CMP)

(Dielectric Science and Technology/Electronics)

This symposium will address the fundamentals of chemical mechanical planarization (CMP) and its application in Inter Layer Dielectrics (ILD) polishing, metal polishing, and trench and mesa isolation. This will also address post-CMP cleaning, consumable characterization, polish end point detection, CMP process integration and manufacturability issues with this emerging technology.

Papers will be solicited in the following areas: 1. polishing science and technology; 2. process modeling; 3. process optimization and control; 4. consumables characterization; 5.process integration issues; 6. surface and electrochemical aspects of CMP and post-CMP cleaning; 7. defect detection and characterization; 8. electrical characterization of post-CMP surfaces; and 9. environmental aspects of CMP.

Publication of a Proceedings Volume is planned after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full manuscript and a list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be electronically sent to the ECS Headquarters Office and to the Symposium Organizers: R.L. Opila, Bell Labs-Lucent Technologies, 1D 352, 600 Mountain Avenue, Murray Hill, NJ 07974-0636 USA, Phone: (908) 582-3390, Fax: (908) 582-3957, E-mail: opila@lucent.com; C. Reidsema-Simpson, Motorola, 3501 Ed Blustein Boulevard, K-10, Austin, TX 78721-3501 USA, Phone: (519) 933-3184, Fax: (519) 933-5497, E-mail: ra1557@email.sps.mot.com; K.B. Sundaram, Department of Electrical Engineering, University of Central Florida, Orlando, FL 32816 USA, Phone: (407) 823-5326, Fax: (407) 823-5326, E-mail: kbs@ece.engr.ucf.edu; and S. Seal, Department of Electrical Engineering, University of Central Florida, Orlando, FL 32816 USA, Phone: (407) 823-5277, Fax: (407) 823-0208, E-mail: sseal@pegasus.cc.ucf.edu.

H1--COPPER INTERCONNECTS, NEW CONTACT METALLURGIES/STRUCTURES, AND LOW-K INTERLEVEL DIELECTRICS

(Dielectric Science and Technology/Electronics/Electrodeposition)

This symposium is aimed at bringing together scientists and technologists engaged in the development and practice of all aspects of multi-level-metal (MLM) interconnections using copper and low-k dielectric films used in sub- 0.25 um devices and circuits. Three focus areas are planned: 1. copper interconnections, 2. new contact metallurgies and structures, and 3. low-k materials for interlevel dielectrics (ILD).

Some suggested topics in these areas include: 1. methods and equipment for copper deposition: electrolytic and electroless plating, CVD, ionized and collimated PVD; 2. barrier and adhesion films for copper wiring; 3. damascene and dual damascene structures; 4. reactor and process for plasma etching copper patterns; 5. process integration; 6. reliability, electromigration, and migration resistance of copper and copper alloys; 7. new contact metallurgies and borderless contacts; 8. silicide and metal cladding processes for shallow junction and short channel gate structures; 9. low-k inorganic and organic materials such as fluorinated oxides and polymers, spin-on-glasses, aerogels, nanofoams and airgaps; 10. low-k film deposition and plasma etching methods for damascene and dual damascene applications; 11. reliability of low-k materials such as stability and reliability, hot carrier degradation, resistance to copper diffusion; and 12. stress migration, mechanical and thermal stressing in MLM wiring with copper/alloys and low-k ILD films.

Publication of a Proceedings Volume is planned after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full manuscript and a list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggesions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: G.S. Mathad, Infineon Technologies, Inc., United Northern Plaza, 1481 Route 52, Box 10, Hopewell Junction, NY 12533, USA, Phone: (914) 892-9533, Fax: (914) 892-9068, E-mail: swami.mathad@infineon.com; H.S. Rathore, IBM Microelectronics, 1580 Route 52, Zip: AE1, Hopewell Junction, NY 12533, USA, Phone: (914) 892-2905, Fax: (914) 892-3039, E-mail: rathore@us.ibm.com; B.C. Baker, Motorola, Semiconductor Product Sector, Advanced Products Research and Development Laboratory, Austin, TX 78721, USA, Phone: (512) 933-6191, Fax: (512) 933-5497; E-mail: ra8624@email.sps.mot.com; C. Reidsema-Simpson, Motorola, Inc., 3501 Ed Blustein Boulevard, M/S: K-10, Austin, TX 78721-3501, USA, Phone: (519) 933-3184, Fax: (519) 933-5497, E-mail: ra1557@email.sps.mot.com; and T.L. Ritzdorf, Semitool, Inc., 655 West Reserve Drive, Kalispell, MT 59901-2127 USA, Phone: (406) 758-7502, Fax: (406) 755-3226, E-mail: tritzdorf@semitool.com.

I1--FIRST INTERNATIONAL SYMPOSIUM ON COLD CATHODES

(Dielectric Science and Technology/Electronics/Luminescence Display and Materials)

This symposium will address recent developments in the area of cold cathodes with emphasis on theory, modeling, experiment and fabrication. Papers will cover fundamental aspects of science and engineering, as well as related technology and applications.

Areas of particular interest include: 1. Characterization of electron emission into vacuum: theory and experiment (energy distribution, transport mechanisms, current-voltage characteristics); 2. Proposals for electron- emissive materials with low work function; 3. Device fabrication and reliability issues; 4. Thermal effects and Emission Noise (flicker, shot); 5. Emitters (e.g., Spindt-type field emitters, Negative electron affinity and Cold Cathodes, Photocathodes, Ferroelectrics, Carbon nanotubes); 6. Devices applications (flat panel displays, pressure sensors, vacuum transistors, microwave tube-amplifiers, electron-beam lithography, electron guns, free electron lasers, Hall thrusters, satellite tethers, hight-brightness microwave tube sources, high power applications). Several invited speakers will provide overviews of key topics of interest.

Publication of a Proceedings Volume is planned after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full manuscript and a list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and the Symposium Organizers: M. M. Cahay, Department of Electrical and Computer Engineering and Computer Science, 814 Rhodes Hall, University of Cincinnati, Cincinnati, OH 45221 USA, Phone: (513) 556-4754; Fax: (513) 556-7326; E-mail: mcahay@planck.ececs.uc.edu; K.L. Jensen, Code 6841, ESTD, Naval Research Laboratory, Washington, DC 20357-5347 USA, Phone: (202)-767-3114, Fax: (202)-767-1280, E-mail: kevin.jensen@nrl.navy.mil; V. Kapoor, College of Engineering, The University of Toledo, Toledo, OH 43606 USA, Phone: (419) 530-8000; Fax: (419) 530-8006; E-mail: vkapoor@eng.utoledo.edu; P. D. Mumford, Air Force Research Laboratory, Sensors Directorate, WPAFB, 2241 Avionics Circle Suite 25, Dayton, OH 45433 USA, Phone: (937) 255-4831 (ext. 3482), Fax: (937) 656-4807, E-mail: philip.mumford@sn.wpafb.af.mil; R. A. Murphy, Room E118E, MIT-Lincoln Laboratories, 244 Wood Street, Lexington, MA 02173 USA, Phone:(781) 981-7841; Fax:(781) 981-3867; E-mail: almur@ll.mit.edu; A.A. Talin, Motorola Flat Panel Display Division, FPD22, 7700 South River Parkway, Tempe, AZ 85284 USA, Phone: (602) 413-7276; Fax: (602) 413-5934; E-mail: a781aa@email.sps.mot.com; D. Temple, MCNC Electronic Technologies Division, P.O. Box 12889 3021 Cornwallis Road, Research Triangle Park, NC 27709-2889 USA, Phone: (919) 248-1945, Fax: (919) 248-1455, E-mail: temple@mcnc.org; and J.E. Yater, Code 6844, ESTD, Naval Research Laboratory, Washington, DC 20357-5347 USA; Phone:(202) 404-4494; Fax: (202) 767-1280, E-mail:joan.yater@nrl.navy.mil.

J1--SIXTH INTERNATIONAL SYMPOSIUM ON MAGNETIC MATERIALS, PROCESSES AND DEVICES

(Electrodeposition)

Magnetic thin films play important roles in disk and tape recording systems, sensors, the new microelectromechanical systems, and other devices. During the last few years, considerable knowledge has continued to be acquired in magnetic-film processing including: electrochemical and electroless plating systems, etching, process chemistry, tool design, process control, film nucleation and growth, structure of deposits, stress, physics and micromagnetics of films, thermal and magnetic annealing, etc. Correlations have been developed between deposition parameters, film composition, structure, properties and device performance.

The purpose of the symposium is to bring together electrochemists, physicists, engineers, and device designers who are working in the area of magnetic thin-film technology to review the present state of the field and to point out fruitful new areas for research. Materials of interest include Fe, Ni, Co, and their alloys, as well as laminated and compositionally modulated structures. In addition to the processing topics mentioned above, the symposium will cover subjects specific to the fabrication of thin-film heads, microelectromechanical systems, micromotors, and other magnetic devices. Also of interest are substrate/undercoat effects on the properties of soft and hard magnetic films, plus the performance of overcoats and lubricants as used in magnetic thin-film disks for wear resistance, corrosion protection, and antistiction. The symposium will include invited papers of both review or tutorial nature and contributed papers.

Publication of a Proceedings Volume is planned after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a camera-ready copy of the full proceedings volume manuscript at the meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically. to ECS Headquarters and the Symposium Organizers: L.T. Romankiw, IBM Corporation, Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598 USA, Phone: (914) 945-1208, Fax: (914) 945-4081, E-mail: roman@watson.ibm.com; S. Krongelb, IBM Corporation, Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598 USA, Phone: (914) 945-1266, Fax: (914) 945-4081, E-mail: kron@us.ibm.com; C.H. Ahn, University of Cincinnati, Center for Microelectronic Sensors and MEMS, Department of Electrical and Computer Engineering and Computer Science, P.O. Box 210030, Cincinnati, OH 45221-0030 USA, Phone: (513) 556-4767, Fax: (513) 556-7326, E-mail: chong.ahn@uc.edu; J.-W. Chang, Headway, Inc., 678 South Hillview Drive, Milpitas, CA 95035 USA, Phone: (408) 934-5344, Fax: (408) 934-5454, E-mail: JeiWeiC@hdwy.com; and W. Schwarzacher, H.H. Wills Physics Laboratory, University of Bristol, Tyndall Avenue, Bristol, England BS8 1TL, Phone: 44-117-9288709, Fax: 44-117-2955624, E-mail: w.schwarzacher@bristol.ac.uk.

K1--ELECTROCHEMICAL SCIENCE AND TECHNOLOGY OF COPPER

(Electrodeposition/Dielectric Science and Technology/Physical Electrochemistry/Corrosion)

This symposium provides a forum for the presentation of new results on the electrochemistry of copper in the context of the recent developments in microtechnology, surface science, electrodeposition and corrosion. It provides a unique opportunity for researchers in interdisciplinary fields of, surface electrochemistry, electrodeposition, materials science and engineering to exchange their results and thoughts. Specific areas of interest (session topics) include: characterization of copper surfaces and adlayers at copper surfaces by spectroscopic, diffraction and imaging techniques; electrodeposition of copper from additive-containing solutions; electroless deposition; etching, electrochemical and atmospheric corrosion, and corrosion inhibitors; and Copper oxidation and copper oxide deposition.

Publication of a Proceedings Volume is being considered to be published after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full manuscript and a list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, inquiries, and suggestions should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: M. Alodan, King Saud University, Chemical Engineering Department, P.O. Box 800, Riyadh 11421, Saudi Arabia, Phone: 966-1-467-6869, Fax: 966-1-467-8770, E-mail: alodan@ksu.edu.sa; A.A. Gewirth, Department of Chemistry, University of Illinois, 600 South Mathews Avenue, Urbana, IL 61801 USA Phone: (217) 333-8329 Fax: (217) 333-2685: E-mail: agewirth@uiuc.edu; J. Lipkowski, Department of Chemistry and Biochemistry, University of Guelph, Guelph, Ontario, N1G 2W1 Canada, Phone: (519) 824-4120, ext. 8543, Fax: (519)766 1499; E-mail: lipkowski@chembio.uoguelph.ca; O. Magnussen, Abteilung Oberflaechenchemie und Katalyse, University Ulm, D-89069 Ulm, Germany, Phone: 49-731-502-5457, Fax: 49-731-502-5452, E-mail: olaf.magnussen@chemie.uni-ulm.de; G.S. Frankel, Department of Materials Science and Engineering, Fontana Corrosion Center, The Ohio State University, 477 Watts Hall, 2041 College Road, Columbus, OH 43210 USA, Phone: (614) 688-4128, Fax: (614) 292-9857, E-mail: frankel.10@osu.edu; and V. Brusic, Cabot Corporation, Microelectronics Materials Division, 500 Commons Drive, Aurora IL 60504 USA, Phone: (630) 375-5524, Fax: (630) 585-9976; E-mail: vlasta_brusic@cabot-corp.com.

L1--HIGH PURITY SILICON VI

(Electronics/SPIE)

This symposium provides a forum for discussion of the latest developments in the growth, characterisation, device processing, and applications of high purity silicon in either bulk or epitaxial form. The emphasis is on the control and prevention of impurity incorporation, characterisation and detection of defects and impurity states in high purity and high resistivity silicon for superior device performances. Device and circuit aspects related to the application of devices fabricated on high resistivity silicon wafers will also be addressed. Special sessions will focus on large wafer diameter wafer aspects and on SOI materials.

Contributed papers are solicited in the following areas: 1. High purity bulk growth techniques: Czochralski (Cz), Float Zone, Magnetic Cz and other novel growth techniques; progress in polysilicon manufacturing, influence of poly quality on the purity of monocrystals; impact of auxiliaries like e.g. quartz, graphite, furnace parts and gas media purity on crystal properties; 2. Impurity related and intrinsic bulk defects: Point defect mechanisms, influence of doping concentrations, carrier lifetime behaviour, denuded zone (DZ) formation and influence of bulk quality (e.g. D-defects) on defect kinetics behaviour; metallic contamination, defect engineering and control, impact on device performance; 3. Diagnostic techniques: Lifetime and impurity level studies, spectroscopic techniques, spreading resistance probing, Hall-effect; contamination control in handling and packaging high purity silicon; characterisation techniques relevant to the assessment of impurities and defects; 4. Epitaxial wafers: Epitaxial fabrication techniques; epi layer processing, interaction with substrate properties; bulk and interface defect control and characterisation; and 5. Device and circuit applications: Radiation and high energy particle detectors, avalanche photodiodes, strip- and pixel detectors, infrared components, power devices; device physics, radiation sensitivity, noise performance, low temperature operation, reliability aspects; integrated detectors and processing electronics, 2- and 3D SOI based integration, circuit considerations.

Publication of a Proceedings Volume is planned. Acceptance of a paper for presentation obligates the author to provide a complete camera-ready manuscript for inclusion in the volume. Meeting abstracts must be submitted to one of the Symposium Organisers, no later than April 7, 2000. Notification of the acceptance and instructions for the preparation of the proceedings volume manuscripts will be given by April 28, 2000. The full proceedings volume manuscripts will be required by June 6, 2000. The ECS Headquarters needs the final version of the accepted meeting abstracts by June 1, 2000.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and the Symposium Organizers: C.L. Claeys, IMEC, Kapeldreef 75, B-3001 Leuven, Belgium, Phone: (32) 16 281328, Fax: (32) 16 281510, E-mail: claeys@imec.be; P. Rai-Choudhury, 3445 Highfield Court, Bellingham, WA 98226, USA, Phone: (360) 676-3290, Fax: (360) 647-1445, E-mail: jit@spie.org; M. Watanabe, Komatsu, 2016 Shinomiya, Hiratsuka, Kanagawa 254, Japan, Phone: (81) 463-254-8841, Fax: (81) 463-254-8914, E-mail: kyb01254@niftyserve.or.jp; P. Stallhofer, Wacker Siltronic AG, P.O. Box 1140, D-84479 Burghausen, Germany, Phone: (49) 8677-83-3010, Fax: (49) 8677-62171, E-mail: peter.stallhofer@wacker.de; and H.J. Dawson, ASiMi, 3322 Road "N" N.E., Moses Lake, WA 98837, USA, Phone: (509) 766-9679, Fax: (509) 766-9679. E-mail, dawson@asimi.com.

L2--HIGH SPEED COMPOUND SEMICONDUCTOR DEVICES FOR WIRELESS APPLICATIONS II

(Electronics)

The Second Program on High Speed Compound Semiconductor Electronics for Wireless Applications will focus on new applications in wireless, automotive and microwave products. As the technology matures, there is increased focus on device fabrication yield, low cost processing, reliability and packaging for both digital and power device applications. To address these new developments, this symposium solicits papers in the following areas: 1.Multi-wafer and high throughput epitaxy; 2. Process development, including new metallization schemes, selective wet chemical etches, low damage dry etching techniques, lithography, back-side processing and PECVD; 3. New circuit and device design; 4. Reliability protocols and testing; 5. Device degradation mechanisms; 6. Packaging advances, MCM modules and flip-chip bonding; and 7. New applications and special requirements for technology insertion.

The symposium will consist of both invited and contributed papers.

Publication of a Proceedings Volume is planned before the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full proceedings volume manuscript and list of key words by June 30, 2000. Instructions for preparing the manuscript will be sent our by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: R.F. Kopf, Lucent Technologies, Bell Laboratories, Room 1C413A, 700 Mountain Avenue, Murray Hill, NJ 07974 USA, Phone: (908) 582-5280, Fax: (908) 582-6322, E-mail: rek@lucent.com; F. Ren, University of Florida, Department of Chemical Engineering, Room 317, Gainesville, FL 32611 USA, Phone: (352) 392-4727, Fax: (352) 392-3235, E-mail: ren@che.ufl.edu; A.G. Baca, Sandia National Laboratories, Albuquerque, NM 87185 USA, Phone: (505) 844-7127, Fax: (505) 844-8985, E-mail: agbaca@sandia.gov; and J. M. Parsey, Advanced Materials III-V Device Development Group, Motorola, 2100 East Elliot Road Tempe, AZ 85284 USA, Phone: (602) 413-6149, Fax: (602) 413-5695, E-mail: rp2705@email.sps.mot.com.

L3--STATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS XXXIII

(Electronics)

The thirty-third SOTAPOCS will address the most recent developments in compound semiconductors encompassing advanced devices, materials growth, characterization, processing, device fabrication, reliability and other related topics. Papers on both practical issues and fundamental studies are solicited. The following areas are of particular interested: 1. advances in bulk and epitaxial growth technologies of III-V semiconductors and wide-bandgap nitrides; 2. wet and dry etching; 3. fine-line patterning and nano-structure fabrication, metallization, Schottky and ohmic contact formation; 4. dielectric deposition; 5) ion implantation, activation and isolation; 6. passivation and annealing, microcleaving; 7. bonding and packaging; 8. in situ and ex situ process monitoring; 9. material characterization and wafer level testing and mapping; 10. process induced defects; 11. reliability and device degradation mechanisms, and 12. novel devices for high speed information superhighways.

The symposium will consist of both invited and contributed papers.

Publication of a Proceedings Volume is planned before the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full proceedings volume manuscript and list of key words by July 2, 2000 (one month after the deadline for abstract). Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification oa acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: S.N.G. Chu, Bell Laboratories, Lucent Technologies, 600 Mountain Avenue, Room 7C221, Murray Hill, NJ 07974-0636 USA, Phone:(908)582-7318, Fax: (908)582-7660, E-mail: sngchu@bell-labs.com; A.G. Baca, Sandia National Laboratories, Albuqerque, NM 87185 USA, Phone: (505) 844-7127, Fax: (505) 844-8985, E-mail: agbaca@sandia.gov; J.P. Vilcot, Institut d'Electronique et de Microelectronique du Nord, DHS, UMR CNRS, 9929 Avenue Poincare, BP 69, F-59652, Villeneuve d'Ascq Cedex, France, Phone: 33-20-19-7965, Fax: 33-20-19-7883, E-mail: vilcot@iemn.univ-lille1.fr; and Y. Mochizuki, Fundamental Research Laboratories, NEC Corporation, 34 Miyukigaoka,Tsukuba, Ibaraki 305-8501, Japan, Phone: 81-298-56-6122, Fax: 81-298-56-6137, E-mail: mochizuk@frl.cl.nec.co.jp.

M1--INTEGRATED FERROELECTRICS FOR MEMORY APPLICATIONS

(Electronics/Dielectric Science and Technology)

There is currently significant activity in both academia and in industry on the integration of ferroelectric materials into mainstream Si-based memory. The primary memory devices include both DRAMS, and ferroelectric nonvolatile memories. In the case of DRAMS, ferroelectric materials in the paraelectric phase are anticipated for the storage node capacitors for Gbit generation devices. For nonvolatile memories, the lower density devices are already achieving limited production, using ferroelectric films in the switching capacitor. In addition, advanced memory schemes for both primary and archival storage are in early stages of development. All of these memory devices present material, process integration, performance and reliability issues which need to be addressed for these memory opportunities to be fully exploited.

Papers are solicited in topics that relate to the integration and use of ferroelectric materials and devices for memory applications. Areas of interest are in alternative ferroelectrics for memory devices; alternative electrodes and electrode-film interactions, processing effects; film growth issues; deposition trade offs: economic, technical and performance; microstructure-property relationships; process integration issues; material property degradation hydrogen degradation; improvement and basic fundamentals of fatigue-retention-imprint performance; scaling to thinner films; ferroelectric material, process, device, performance modeling and simulation; clever design approaches which circumvent ferroelectric material problems and limitations; reliability of ferroeclectric design approaches; and testing techniques that simulate product performance.

It is planned to include several invited speakers to provide state-of-the-art overviews of key topics of interest.

Publication of a Proceedings Volume is planned after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full manuscript and a list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and the Symposium Organizers: G.M. Oleszek, University of Colorado, Microelectronics Research Laboratory, Department of Electrical and Computer Engineering, P.O. Box 7150, Colorado Springs, CO 80933 USA, Phone: (719) 262-3490, Fax: (719) 262-3589, E-mail: goleszek@ece.uccs.edu; D. Hadnagy, Ramtron International, 1850 Ramtron Drive, Colorado Springs, CO 80921 USA, Phone: (719) 481-7116, Fax: (719) 481-9170, E-mail: dhadnagy@ramtron.com,; A.I. Kingon, Department of Materials Science and Engineering, North Carolina State University, P.O. Box 7919, Raleigh, NC 27695-7919 USA, Phone: (919) 515-8636, Fax: (919) 515-3419, E-mail: kingon@mte.ncsu.edu; P. van Buskirk, Advanced Technology Materials, Inc., 7 Commerce Drive, Danbury, CT 06810 USA, Phone: (203) 794-1100, Fax: (203) 830- 4116, E-mail: pvanb@atmi.com; J. Cuchiaro, Structural Materials Industries Inc., 120 Centennial Avenue, Piscataway, NJ 08854-3908 USA, Phone: (719) 260-8970, Fax: (719) 264-9117, E-mail: jcuchiaro@aol.com; and R.K. Ulrich, 3202 Bell Center, University of Arkansas, Fayetteville AR 72701 USA, Phone: (501) 575-5645, Fax: (501) 575-7926, E-mail: rku@engr.uark.edu.

M2--THIN FILM TRANSISTOR TECHNOLOGIES V (TFTT V)

(Electronics/Dielectric Science and Technology)

The TFTT V symposium, cosponsored by the Electronics Division and the Dielectric Science and Technology Division, is organized with the intention of providing a forum for the presenting and discussion of the latest developments in Thin Film Transistors (TFTs) and related fields. Papers which deal with all aspects of fabrication processes, materials, device physics, characterization, structures, and applications of TFTs are solicited. The following is a partial list of topics to be addressed: New TFT Structures, self-alignment, planarization, top, bottom, dual or off-set gate, coplanar, thin gate dielectric or semiconductor layer, novel structures; Novel Processing Techniques, low mask-count processes, copper-or aluminum-gate TFT, integrated black matrix, low temperature thin film deposition methods, laser recrystallization, solid-phase crystallization, rapid thermal crystallization, lithography, wet and plasma etchings, ohmic contact formation, doping, hydrogenation, interface modification; Thin Film Materials, semiconductors )a-Si:H, uc-Si:H, poly-Si, CdSe, SiGe, Organic), dielectrics (SiNx, SiO2, metal oxides, organic, redundant films), conductors (Cu, Al, Cr, Ta, Mo, Ti, ITO, alloys, dual layer metals), black matrix materials (organic, inorganic); Device Physics and Characterization, TFT, diode, and capacitor, physics, characteristics, modeling, charge generation and trapping, interfacial phenomena, photo- and radiation-damages, temperature effects, stability, ESD devices, chemical sensitivity, crosstalks, reliability; TFT Appliations, liquid crystal displays, scanners, imagers, VLSI, sensors, detectors, new applications, etc.

The Symposium is also aimed at providing a forum for synergistic interactions among those working in TFTs, those working in other high-tech fields such as semiconductors, and those applying TFTs to areas such as displays, scanners, SRAM, and imagers.

Publication of a Proceedings Volume is planned after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full manuscript and a list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically to ECS Headquarters Office and the Symposium Organizers: Y. Kuo, Thin Film Microelectronics Research Laboratory, 335-O Zachry Engineering Center, Texas A&M University, College Station, TX 77843 USA, Phone: (409) 845-9807; Fax: (409) 458-8836; E-mail: yuekuo@tamu.edu; D.G. Ast, Department of Materials Science and Engineering, 229 Bard Hall, Cornell University, Ithica NY USA, Phone: (607) 255-4140, Fax: (607) 255-2365, E-mail: dast@msc.cornell.edu; M. Hack, Universal Display Corporation, 375 Phillips Boulevard, Ewing, NJ 08618 USA, Phone: (609) 462-5765, E-mail: mikehack2k@aol.com; J. Jang, Department of Physics, Kyung Hee University, Dongdaemdon-ku, 130-701, Seoul, Korea, Phone: 82-2-961-0270, Fax: 822-968-6924, E-mail: jjang@nms.kyunghee.ac.kr, E. Lueder, University of Stuttgart, Institut fur Netzwerk und Systentheorie, Pfaffenwaldring 47, D-70550, Stuttgart, Germany, Phone: 49-711-685-7330, Fax: 49-711685-7311, E-mail: ernst.lueder@ins.uni-stuttgart.de; M. Matsumura, Tokyo Institute of Technology, 2-21-1, O-okayama, Meguro-ku, Tokyo, Japan 152, Phone: 81-3-5734-2559, Fax: 81-294-52-7615, E-mail: matsumura@pe.titech.ac.jp; S. Brotherton, Philips Research Laboratories, Surrey, UK, Phone: 44-1293-815631, E-mail: brothert@prl.research.philips.com; F. Okumura, NEC Corp, 1120 Shimokuzawa, Sagamihara, 229-1198 Kanagawa, Japan, Phone: 81-427-71-0984, Fax: 81-427-710826, E-mail: okumura@ecd.sgm.nec.co.jp; T. Minemura, Hitachi Research laboratory, 1-1 Omika-cho, 7-chome, Hitachi-shi, Ibaraki-ken, 319-12, Ibaraki, Japan, Phone: 81-294-52-7555, Fax: 81-294-52-7615, E-mail: tmine@hrl.hitachi.co.jp; and K.B. Sundaram, Department of Electrical Engineering, University of Central Florida, Orlando, FL 32816 USA, Phone: (407) 823-5326, Fax: (407) 823-5326, E-mail: kbs@ece.engr.ucf.edu.

M3--ELECTRONICS/DIELECTRIC SCIENCE AND TECHNOLOGY JOINT GENERAL SESSION

(Electronics Division/Dielectric Science and Technology)

Original papers are solicited on all aspects of electronic materials, devices, and processing technologies not covered by specialized topical symposia at this Meeting. The sessions will be organized depending on the content of the Meeting Abstracts. One or more of the sessions may be organized as a poster session. Contributors should specify their preference as to poster or oral presentation, and all efforts will be made to accommodate their requests.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Session Organizers: M.J. Deen, Department of Electrical and Computer Engineering, CRL Room 220, McMaster University, 1280 Main Street West, Hamilton, Ontario, Canada L8S 4K1, Phone: (905) 525-9140, ext. 27137, Fax: (905) 523-4407, E-mail: jamal@ece.eng.mcmaster.ca; R.K. Ulrich, 3202 Bell Center, University of Arkansas, Fayetteville AR 72701 USA, Phone: (501) 575-5645, Fax: (501) 575-7926, E-mail: rku@engr.uark.edu; and C.L. Claeys, IMEC, Kapeldreef 75, B-3001 Leuven, Belgium, Phone: 32-16-281328, Fax: 32-16-281510, E-mail: Cor.claeys@imec.be.

N1--SOLID STATE IONIC DEVICES II - Ceramic Sensors

(High Temperature Materials/Sensor/Battery/American Ceramic Society)

Solid-state electrochemical devices, such as batteries, fuel cells, membranes, and sensors, are becoming pervasive in our technologically driven lifestyles, and will become even more so as we enter the 21st century. The development of these devices involves common research themes such as ion transport, interfacial phenomena, and device design and performance, regardless of the class of materials or whether the solid state is amorphous or crystalline.

The intent of this symposium is to provide a forum for current advances in solid-state ion conducting materials and the design, fabrication, and performance of devices that utilize them. Certain emphasis will be on sensor applications, in particular because this symposium includes what would have been the fifth symposium on ceramic sensors. Sensors based on physical, optical, and electrochemical principles or any other novel principles are of interest. Recent development in sensor materials will be emphasized, including ionic, electronic, and mixed-conducting materials, oxide semiconductors, dielectrics, multiphase, and catalytic materials. Synthesis, processing, and characterization of ceramic materials for electrochemical use, as well as design, fabrication, and evaluation of such materials are within the scope of the symposium. Effect of size reduction to nanometer level on sensing performance. Characterization of the material performance, such as stability or its sensing utility such as selectivity, sensitivity, and rapid response are also encouraged.

Papers are solicited in such topics as modeling and characterization of defect equilibria, ionic and electronic transport, interfacial and electrocatalytic properties of ion conducting ceramics, novel synthesis and processing of thin films, membranes, and nanostructured materials or devices; the effect of nanostructures on ionic transport and catalytic activity; recent advances in ionic and mixed electronic-ionic conducting materials. Theoretical treatments of mixed conduction, electrode kinetics, interfacial phenomena, and electrode microstructure pertaining to chemical sensors, extreme aero-space condition applications, fuel cells, gas separation membranes and reactors, solid-state battery and microbattery electrodes, and chemical sensors are also pertinent.

Publication of a Proceedings Volume is planned after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full manuscript and a list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: E.D. Wachsman, Department of Materials Science and Engineering, University of Florida, Gainesville, FL 32611-6400 USA, Phone: (352) 846-2991, Fax: (352) 392-7219, E-mail: ewach@mse.ufl.edu; W. Weppner, Christian-Albrechts-Universitaet zu Kiel, D-24143 Germany, Phone: +49-431-77572-550, Fax: +49-431-77572-553,E-mail: ww@techfak.uni-kiel.de; E. Traversa, Department of Chemical Science and Technology, University of Rome "Tor Vergata," 00133 Roma Italy, Phone: +39-06-7259 4492, Fax: +39-06-7259 4328, E-mail: traversa@uniroma2.it; P. Vanysek, Department of Chemistry and Biochemistry, Northern Illinois University, DeKalb, IL 60115 USA, Phone: (815) 753-6876, Fax: (815) 753-4802), E-mail: pvanysek@niu.edu; N. Yamazoe, Graduate School of Engineering Science, Kyushu University, Kasuga-shi, Fukuoka 816-8580, Japan, Phone: 81-92-583-7537, Fax: 81-92-575-2318, E-mail: noborigz@mbox.nc.kyushu-u.ac.jp; M.-L. Liu, School of Materials Engineering, Georgia Institute of Technology, Atlanta, GA 30332 USA, Phone: (404) 894-6114, Fax: (404) 853-9140, E-mail: meilin.liu@mse.gatech.edu; and B.V. Ratnakumar, Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Drive #277-207, Pasadena, CA 91109-8001 USA, Phone: (818) 354-0110, Fax: (818) 393-6951, E-mail: ratnakumar.V.Bugga@jpl.nasa.gov.

O1--NINTH INTERNATIONAL SYMPOSIUM ON THE PHYSICS AND CHEMISTRY OF LUMINESCENT MATERIALS

(Luminescence and Display Materials)

This symposium will focus on various aspects of luminescence, in both organic and inorganic solids and will address current and emerging technical and scientific issues in luminescence. Presentations at this meeting will cover photo-luminescent materials for lamp and laser applications, cathodo-luminescent materials, X-ray phosphors, scintillators, electro-luminescent materials, and phosphors for plasma panel displays and other optical devices. Presentations on chemical aspects of luminescence will include synthesis of conventional and novel luminescent materials, including nano-phases and optimization of luminescence properties, such as brightness, color, response time, excitation spectra, etc. via modification of particulate and surface characteristics; and exploring new materials by combinatorial chemistry. Presentations involving physics of luminescence will cover measurements and modeling of luminescent properties; identification of luminescent and loss centers; non-radiative processes; energy transfer; and concentration effects; complex luminescence processes such as core valence luminescence, cooperative phenomena, multi-photon transitions, luminescence from confined systems, etc.; nonlinear optical processes; and ultra-fast transitions. Papers on luminescence from novel materials such as ceramics, glass, and nano-particles are encouraged.

Publication of a Proceedings Volume is planned after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full manuscript and a list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and the Symposium Organizers: A. Srivastava, General Electric Corporation Research and Development, 1 Research Circle, KWB 316, Niskayuna, NY 12309 USA, Phone: (518) 387-7535, Fax : (518) 387 5299, E-mail:srivastava@crd.ge.com; K. C. Mishra, Osram Sylvania Inc., 71 Cherry Hill Drive, Beverly, MA 01915 USA, Phone: (978) 750-1515, Fax: (978) 750-1799, E-mail: kailash.mishra@sylvania.com; and C. Ronda, Philips Research Laboratories, Weisshausstrasse 2, D- 52066 Aachen, Germany, Phone: 49(0)241/6003-397, Fax: 49(0) 241/6003-483, E-mail: ronda@pfa.research.philips.com.

O2--SCINTILLATORS

(Luminescence and Display Materials)

Papers are invited on topics related to phosphors excited by high energy radiation. Representative topics include X-ray and cathode ray phosphors, their preparation and characterization; X-ray intensifying screen structures and their fabrication, new binder systems, film screen systems including dyes, pigments, and special substrates; absorption efficiency, persistence or lag, phosphor screen evaluation including MTF, sharpness and noise, phosphor conversion efficiency and loss mechanisms; scintillation spectroscopy, time-resolved spectroscopy with X-ray sources, photodiode systems, image processing, filmless radiography, digital radiography, thermoluminescence after X-ray irradiation, optically stimulated luminescence and storage phosphors and panels; phosphor stabilization through screen design, the use of X-ray phosphors in nondestructive testing, and dual scintillators for CT, nonmedical applications for storage phosphors in biology and crystallography; and new X-ray detectors such as charge coupled devices.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: M.J. Weber, Mail Stop 55-121, Lawrence Berkeley National Laboratory, University of California, One Cyclotron Road, Berkeley, CA 94720 USA, Phone: (510) 486-6369, Fax: (510) 486-4768, E-mail: mjweber@lbl.gov; and W.M. Yen, Department of Physics and Astronomy, University of Georgia, Athens, GA 30602 USA, Phone: (706) 542-2491, Fax: (706) 542-2492, E-mail: wyen@hal.physast.uga.edu.

P1--PHYSICAL ELECTROCHEMISTRY GENERAL SESSION

(Physical Electrochemistry)

Papers concerning any aspect of physical electrochemistry not covered by topic areas of others specialize symposia at this Meeting are welcome. Contributed papers will be programmed in some related order, depending on the titles and contents of the Meeting Abstracts.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Session Organizer: J. Leddy, Department of Chemistry, University of Iowa, Iowa City, IA 52242 USA, Phone: (319) 335-1720, Fax: (319) 335-1270, E-mail: johna_leddy@uiowa.edu.

Q1--ELECTROCHEMISTRY OF CARBON MATERIALS

(Physical Electrochemistry/Battery)

Carbons and graphites are available in many different physical structures, and they exhibit a wide variation in their surface properties. Because of this wide range of options, a better understanding of their physical and chemical properties would be helpful in selecting carbonaceous materials for electrochemical applications. The purpose of this symposium is to provide a forum for presentations and discussions that will benefit researchers and technologists with an interest in understanding the electrochemical behavior of carbon.

This symposium focuses on recent advances in the electrochemistry of carbon and carbon-containing composites, and their applications in electrochemical systems. Papers are solicited on fundamental and applied studies of the surface and bulk properties of carbon which are important to its electrochemical properties and applications. Topics of interest include fundamental studies dealing with chemical or electrochemical modification of carbon surface. Recent results obtained on the performance of carbon in electrochemical applications such as: 1. gas diffusion electrodes in electrolytic industries such as metal electrowinning, chemical recovery processes, chloralkali, and peroxide production, and electro-organic synthesis; 2. bifunctional air electrodes in metal/air batteries; and 3. carbon structures in primary, secondary lithium batteries and fuel cells are appropriate topics for the symposium.

Publication of a Proceedings Volume is planned after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full manuscript and a list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: K. Zaghib, Institut de Recherche d'Hydro-Quebec (IREQ) 1800 Boulevard Lionel Boulet Varennes (Quebec) Canada, J3X 1S1, Phone: (450) 652-8019, Fax: (450) 652-8424, E-mail: karimz@ireq.ca; D. Belanger, Departement de Chimie, UQAM, Case Postale 8888, succursale, Centre-Ville, Montreal (Quebec) Canada H3C 3P8; Phone: (514) 987-3000, ext. 3909; Fax: (514) 987-4054; E-mail: belanger.daniel@uqam.ca; and M.T. McDermott, Department of Chemistry, University of Alberta, Edmonton, Alberta, Canada T6G 2G2, Phone: (780) 492-3687, Fax: (780) 492-8231, E-mail: mark.mcdermott@ualberta.ca.

R1--NEW HORIZONS IN SPECTROELECTROCHEMISTRY AND PHOTOELECTROCHEMISTRY

(Physical Electrochemistry/Energy Technology)

This symposium provides a forum for presentation of new results in the areas of spectroelectrochemistry and photoelectrochemistry, broadly defined.

Spectroelectrochemistry continues to provide new insights into electrochemical systems as investigators find clever new ways to combine spectroscopy with electrochemistry. Papers are solicited in all areas of electrochemical science in which spectroscopy has been used to provide new information Such areas may include but are not limited to: 1. bulk redox systems; 2. electrochemical interfaces; and 3. electrode surfaces. Contributions are encouraged in which spectroscopies using radiation ranging from the x-ray to IR region of the electromagnetic spectrum are used.

The field of photoelectrochemistry now encompasses a broad range of research topics, including solar energy conversion and photoelectrochemical waste treatment, and new nanoscale materials for these technologies; dye sensitization of both inorganic and organic semiconductors, fundamental aspects of photo-induced charge transfer at electrode surface; links between photoelectrochemical events and photoelectrochemical materials, and light-emitting electrochemical events.

This sympoisum will include both invited and contributed papers.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: J.E. Pemberton, Department of Chemistry, University of Arizona, Tucson, AZ 85721 USA, Phone: (520) 621-8245; Fax: (520) 621-8248, E-mail: pembertn@u.arizona.edu; and N.R. Armstrong, Department of Chemistry, University of Arizona, Tucson, AZ 85721 USA, Phone: (520) 621-8242; Fax: (520) 621-8242, E-mail: nra@u.arizona.edu.

S1--SCANNING PROBE MICROSCOPY FOR ELECTRODE CHARACTERIZATION AND NANOMETER SCALE MODIFICATION

(Physical Electrochemistry/Electrodeposition/Corrosion)

The development of device geometries in the micron to nanometer range has presented numerous analytical challenges for researchers in electrochemistry, surface science and materials science alike. This symposium will serve as an interdisciplinary forum on the recent developments and applications of scanning probe techniques for the characterization of surfaces, electrochemical interfaces, and electrochemical processes that are controlled by the physics and chemistry of small length scales. Submission of papers is encouraged on applications and recent developments of scanning probe techniques for the characterization of electrochemical interfaces in the micron to nanometer range.

Publication of a Proceedings Volume is planned after the Meeting. Acceptance of a paper in this symposium (oral or poster) obligates the authors to submit a typed camera ready copy of the full manuscript and a list of key words at the Meeting. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the official notification of acceptance is distributed by the ECS Headquarters Office.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: D.C. Hansen, EG&G Instruments, Inc., 801 South Illinois Avenue, Oak Ridge, TN 37831 USA, Phone: (423) 483-2141, Fax: (423) 425-1334, E-mail: Doug_Hansen@EGGINC.com; H.S. Isaacs, Brookhaven National Laboratory, Bldg 40, P.O. Box 5000, Upton, NY 11973-5000 USA, Phone: (516) 344-4516, Fax: (516) 344-4071, E-mail: isaacs@bnl.gov; K. Sieradzki, Arizona State University, P.O. Box 876106, Tempe, AZ 85287-6106 USA, Phone: (602) 965-8990, Fax: (480) 965-1384, E-mail: karl@icarus.eas.asu.edu; and M.D. Porter, Iowa State University, Department of Chemistry, Ames, IA 50011 USA, Phone: (515) 294-6433, Fax: (515) 294-3254, E-mail: mporter@porter1.ameslab.gov.

T1--ACOUSTIC WAVE-BASED SENSORS

(Sensor)

This symposium covers all aspects of sensors that utilize acoustic waves to monitor physical, chemical and biological parameters, processes and species. Primary emphasis will be placed upon the fundamental chemistry and physics underlying the operation of acoustic wave-based sensors. Papers of a more applied nature will also be accepted. Sensors based on surface acoustic waves (SAWs), acoustic plate modes, Lamb waves, flexural plate modes, thickness shear modes, quartz crystal microbalances (QCMs) and other acoustic waves are of interest. Contributions to both theoretical understanding and experimental measurements using these acoustic wave sensors are sought. Topics of interest range from preliminary studies of new sensor concepts and instrumental development, through measurements of physicochemical interactions between sensors and contacting media, to practical implementation of full sensor systems incorporating these devices. Established themes include interfacial (bio)chemical and electrochemical effects, thin film materials characterization, viscoelastic phenomena, and physical measurands such as temperature, pressure, mechanical strain, and electric and magnetic fields. In addition, we seek contributions in emerging areas, including but not restricted to: film resonance effects, spatial mapping and coupling with other measurement or imaging techniques.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and the Symposium Organizers: A.R. Hillman, Department of Chemistry, University of Leicester, Leicester LE1 7RH UK, Phone: 44-116-252-2144, Fax: 44-116-252-5227, E-mail: arh7@le.ac.uk; S.J. Martin, Microsensor Research and Development Department, MS-1425, Sandia National Laboratories, Albuquerque, NM 87185-1425 USA, Phone: (505) 844-9723, Fax: (505) 844-1198, E-mail: sjmarti@sandia.gov; and E.T. Zellers, University of Michigan, Department of Chemistry and Department of Environmental Health Sciences, 109 South Observatory Street, Ann Arbor, MI 48109-2029 USA, Phone: (734) 936-0766; Fax: (734) 763-8095; E-mail: ezellers@umich.edu.

U1--MICROSENSOR SYSTEMS FOR GAS AND VAPOR ANALYSIS

(Sensor/Industrial Electrolysis and Electrochemical Engineering)

This symposium will focus on the science, engineering, and implementation of miniaturized analytical systems for gas-phase species. Significant advances continue to be made in the development of microsensors and microsensor arrays for detecting gases and vapors. It is becoming clear, however, that producing practical and versatile instrumentation based on such sensor technologies will also depend critically on ancillary components for sample capture, transfer, preconcentration, and separation. The challenges of designing, fabricating, and interfacing such components and optimizing their functional integration are topics of increasing interest. Also of critical interest are more efficient methods of data acquisition, management, and analysis to coordinate system functions and interpret sensor responses.

Papers are solicited on: 1. all gas/vapor sensor and sensor array technologies; 2. miniature and/or micromachined channels, pumps, valves, splitters, restrictors, and other fluidic components related to gas/vapor analytical systems; 3. preconcentrator and separation column materials, design, construction, interconnections, and modeling; 4. surface passivation; 5. fundamental aspects of scaling; sample size limitations related to detection limits, dynamic ranges, and saturation; adsorption and separation theory; mass transport and other kinetic effects; dead volumes; 6. data management issues related to system integration/operation/control, data acquisition/extraction/reduction, pattern recognition and neural network analyses, and analyte identification/differentiation; and 7. performance testing and benchmarking.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: E.T. Zellers, University of Michigan, Department of Chemistry and Department of Environmental Health Sciences, 109 South Observatory Street, Ann Arbor, MI 48109-2029 USA, Phone: (734)-936-0766; Fax: (734)-763-8095; E-mail: ezellers@umich.edu; J.R. Stetter, Illinois Institute of Technology, Department of Physical, Chemical, and Biological Sciences, 3101 South Dearborn Street, Chicago, IL 60616 USA, Phone: (312) 567-3443; Fax: (312) 567-3494; E-mail: stetter@charlie.cns.iit.edu; G.C. Frye-Mason, Microsensor Department, 1315, Mail Stop, 1425, Sandia National Laboratories, Albuquerque, NM 87185 USA, Phone: (505) 844-0787, Fax: (505) 844-1198; E-mail: gcfrye@sandia.gov; and C.W. Walton, FMC Corporation, Active Oxidants Division, P.O. Box 8, Princeton, NJ 08543-0008, Phone: (609) 951-3189, Fax: (609) 951-3836, E-mail: clifford_walton@fmc.com.

V1--MICROFABRICATED SYSTEMS AND MEMS V

(Sensor/Dielectric Science and Technology/Electronics)

This symposium continues the series of Symposia that focus on all aspects of MEMS technology including micromachining, fabrication processes, and the application of these structures and processes to the miniaturization of chemical sensors, physical sensors, biosensors, miniature chemical analysis systems and others. Particular emphasis should be placed on processes and potential application of these devices.

The following is a partial list of topics to be solicited: 1. Fabrication and processing for two- and three-dimensional structures; 2. New materials and methods of processing at the microscale dimensions; 3. Sensors based on micromachining methods; 4. Automotive micromachined sensors; 5. Use of microstructures applicable to environmental and biological studies; 6. Multilevel thin-film structures and microstructural characterization; 7. Chemical, electrical and physical testing and reliability of micromechanical structures; and 8. Smart microfabricated sensors.

Publication of a Proceedings Volume is planned to be available at the Meeting. All authors accepted for presentation (oral or poster) are obligated to submit a camera-ready Proceedings Volume manuscript. Instructions for preparing the manuscript will be sent out by the Symposium Organizers after the notification of acceptance of the paper. The deadline for submission of the camera-ready manuscript Proceeding Volume manuscript is June 1st, 2000. It is planned to have the Proceedings Volume available at the Meeting.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: P.J. Hesketh, Georgia Institute of Technology, George W. Woodruff School of Mechanical Engineering, Atlanta, GA 30332-0405 USA, Phone: (404) 894-3200, Fax: (404) 894-1658, E-mail: phesketh@sununo.me.gatech.edu; H.G. Hughes, Motorola, Inc, 2200 West Broadway Road, Mesa, AZ 85202 USA, Phone: (602) 655-4983, Fax: (602) 655-4342, E-mail: rjj010@email.sos.com; W.E. Bailey, Texas Instruments, Dallas, TX USA, Phone: (972) 995-6302, Fax: (972) 995-7785, E-mail: Bailey@ti.com; D. Misra, Department of Electrical and Computer Engineering, New Jersey Institute of Technology, University Heights, Newark, NJ 07102 USA, Phone: (973) 596-5739, Fax: (973) 596-5680, E-mail: dmisra@megahertz.njit.edu; S.S. Ang, University of Arkansas, Department of Electrical Engineering, 3217 Bell Engineering Center, Fayetteville, AR 72701 USA, Phone: (501)575-7683, Fax: (501) 575-7967, E-mail: ssa@engr.uark.edu; and J.L. Davidson, Vanderbilt University, 5617 Stevenson Science Center, Nashville, TN 37232 USA, Phone: (615) 343-7886, Fax: (615) 343-6614, E-mail: jld@vuse.vanderbilt.edu.

W1--ELECTROCHEMISTRY AND SOLID-STATE SCIENCE AND TECHNOLOGY IN THE SERVICE OF MEDICINE

(New Technology Subcommittee)

There are many areas in medical research where electrochemistry and solid-state science and technology can play crucial roles in facilitating technical break-throughs. This symposium is designed to explore such opportunities and to identify common grounds and synergisms between medical research and the two ECS communities. It will feature a series of tutorials by invited speakers on selected topics to summarize state-of-the-art technologies and to highlight key research topics. A panel discussion is also planned.

In conjunction with this symposium, a pre-conference short course is planned that will provide common grounding for medical and electrochemical and solid state science and technology researchers.

This symposium will be wide-ranging in scope and will address topics including (but not limited to): neurochemistry, biomaterials, electrotherapy, sensors, and cardiology. Specific areas of interest include: 1. neuro-stimulation; 2. cardiac pacemaker power sources; 3. electrochemical cancer therapy; 4. bioactive and biocompatible implant materials; 5. glucose and nitric oxide sensors; 6. analytical chemistry (including voltammetry, electrophoresis, and chromatography) in medical research; 7. electrical interactions in bone remodeling; 8. neural networks and nerve signal transmission/transduction; and 9. bioelectrics and medical instrumentation.

Abstracts, suggestions, and inquiries should be sent electronically to the ECS Headquarters Office and to the Symposium Organizers: R. Eberhart, Biomedical Engineering, The University of Texas Southwestern Medical Center, 5323 Harry Hines Boulevard, Dallas, TX 95234-9130 USA, Phone: (214) 698-2052, Fax: (214) 698-2979, E-mail: robert.eberhardt@email.swmed.edu; K. Niki, Department of Chemistry, Illinois State University, Normal, IL 61790-4160 USA; Phone: (309) 438-3506, Fax: (309) 438-5538, E-mail: kniki@xenon.che.ilstu.edu; K. Rajeshwar, Department of Chemistry and Biochemistry, The University of Texas at Arlington, Arlington, TX 76109-0065 USA, Phone: (817) 272-3810, Fax: (817) 272-3808, E-mail: rajeshwar@uta.edu; D.F. Untereker, Medtronic Inc., Promeon Division, 6700 Shingle Creek Parkway, Brooklyn Center, MN 55430-1489 USA, Phone: (612) 514-1216; Fax: (612) 514-1174; E-mail: darrell.untereker@medtronic.com; C.M. van Es, 850 Maltwood Terrace, Victoria, British Columbia, Canada V8X 5C8, Phone/Fax: (250) 727-9969, E-mail: cmve1@aol.com; W.A. van Schalkwijk, SelfCharge Inc., 6742 NE 185th Avenue, Suite 230, Redmond, WA 98052 USA, Phone: (425) 881-9199.x116, Fax: (425) 883-1447, E-mail: waltvans@aol.com.