213th ECS Meeting - Phoenix, AZ

May 18 - May 22, 2008

PROGRAM INFORMATION
 

E6 - Thermal and Plasma CVD of Nanostructures

Dielectric Science and Technology
 

Tuesday, May 20, 2008

Room 103A, 100 Level, Phoenix Convention Center

Thermal and Plasma CVD of Nanostructures I

Co-Chair(s): M. Sunkara and R. Mani
TimeAbs#Title and Authors
14:00   768   One Dimensional Nanostructures and their Applications (Invited) M. Meyyappan, B. Yu, J. Sun, H. Chen, P. Arumugham and J. Li (NASA Ames Research Center)
14:30   769   Growth and Characterization of Undoped and Mg-Doped GaN Nano- and Micro-Columns by Chemical Vapor Deposition R. Garcia (Arizona State University), A. Thomas (Rogers Corporation) and F. A. Ponce (Arizona State University)
14:50   770   Applications of Atmospheric-Pressure Microplasmas in Nanomaterials Synthesis (Invited) R. Sankaran (Case Western Reserve University)
15:20   771   Gas Phase Production of Metal Oxide Nanowires Using a Microwave Plasma Reactor V. Kumar, J. Kim and M. K. Sunkara (University of Louisville)
15:40   772   Direct Plasma Synthesis of Metal-Oxide Nanostructures (Invited) U. Cvelbar (Jozef Stefan Institute)
16:10   773   Analysis of Silicon Dioxde Nanowires Synthesized via Rapid Thermal Annealing of Pt-coated Si Substrates Y. Lai (National United University), J. Wang (Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University) and S. Liou (Center for Condensed Matter Sciences, National Taiwan University)
 

Thermal and Plasma CVD of Nanostructures II

Co-Chair(s): U. Cvelbar and R. Sankaran
TimeAbs#Title and Authors
16:50   774   Comparison of Stress Properties in SiOx, SiNx, and SiOxNy Thin Films Grown by Inductively Coupled Plasma CVD J. Wojcik, G. Stortz, T. Roschuk and P. Mascher (McMaster University)
17:10   775   Surface Reaction Mechanism during the Atomic Layer Deposition of Titanium Dioxide from Titanium Isopropoxide and Ozone V. Rai and S. Agarwal (Colorado School of Mines)
17:30   776   A Study of Improving the Dependence of Underlayer in HARP J. Park, J. Won and J. Lim (Samsung Electronics)
17:50   777   Oxidation Behavior of ALD Process using H2O and Ozone as Oxidants at Varied Temperatures on TiN Metal Substrates C. Hsieh, T. Huang (Nanya Technology Corp.), T. Pan, J. Lin (Chang Gung University), C. Wu and S. Shih (Nanya Technology Corp.)
18:10   778   Modeling of Thermodynamic and Transport Phenomena in CVD Processes for Nano-Scale Applications R. Nagarajan, P. Gorai and N. Chawla (IIT Madras)
 

Hall 2, Lower Level, Phoenix Convention Center

Poster Session

TimeAbs#Title and Authors
o   779   Spontaneous Growth of α-Fe2O3 Nanostructures in Oxygen Plasma U. Cvelbar, M. Mozetič (Jozef Stefan Institute), Z. Chen (Institute for Advanced Materials & Renewable Energy, University of Louisville) and M. K. Sunkara (University of Louisville)