Honolulu PRiME 2012 - Honolulu, Hawaii | ||
October 7 - October 12, 2012 | ||
PROGRAM INFORMATION | ||
E10 - More than Moore | ||
Monday, October 8, 2012 | ||
319A, Level 3, Hawaii Convention Center | ||
Roadmaps | ||
Co-Chairs: | ||
| Time | Progr# | Title and Authors |
|---|---|---|
| 08:00 | 2782 | More Moore or More than Moore C. Hobbs, K. Ang, R. Hill, C. Kang, W. Loh, K. Hummler, S. Arkalgud, P. Kirsch, and R. Jammy (SEMATECH) |
| 08:40 | 2783 | Technology Roadmapping of ICs "More than Moore" Functional Diversification B. Bader (iNEMI) and M. Gaitan (National Institute of Standards and Technology (NIST)) |
| 09:20 | 2784 | Emerging Research Devices and Architectures for More-Than-Moore Applications A. Chen (GLOBALFOUNDRIES) |
Bioelectronics | ||
| Time | Progr# | Title and Authors |
| 10:00 | Intermission (15 Minutes) | |
| 10:15 | 2785 | Engineering the Bio-Abio Interface to Enable Next Gen Bionics A. Guiseppi-Elie, C. Kotanen, O. Karunwei, and A. Wilson (Clemson University) |
| 10:50 | 2786 | Enabling Long-Term Dielectrophoretic Actuation for Cell Manipulation and Analysis in Microfluidic Biochips D. R. Reyes (National Institute of Standards and Technology) |
| 11:25 | 2787 | Microsystem Pathways to a Greener World Using Radioisotopes A. Lal (Cornell University) |
3D Systems | ||
| Time | Progr# | Title and Authors |
| 13:05 | 2788 | CANCELLED
Superconducting Fault Current Limiter with Fast Nanosecond Switching Time for Communication System Application
T. Chiu, C. Shih (CSIST), C. Cheng, C. Cheng (Chung-Shan Institute of Science & Technology), T. Huang (CSIST), and T. Chang (Chung-Shan Institute of Science & Technology)
|
| 13:40 | 2789 | High-Speed Alkaline Etching for Backside Exposure of through Silicon Vias K. Yoshikawa (Tohoku University), T. Miyazaki (PRE-TECH AT CO., LTD), N. Watanabe, and M. Aoyagi (National Institute of Advanced Industrial Science and Technology) |
| 14:15 | 2790 | Development of Novel MOSFET with Front and Back Side Electrodes for 3D-Structured Image Sensors M. Goto, K. Hagiwara, Y. Iguchi, H. Ohtake (NHK Science and Technology Research Laboratories), T. Saraya, H. Toshiyoshi, and T. Hiramoto (The University of Tokyo) |
3D Metrology | ||
| Time | Progr# | Title and Authors |
| 14:50 | 2791 | Metrology to Enable "More than Moore" Applications of Resistive Switching Devices C. A. Richter, J. Tedesco (NIST), H. Jang (NIST & Wake Forest University), H. Li (NIST & George Mason University), O. Jurchescu (Wake Forest University), and Q. Li (George Mason University) |
| 15:25 | 2792 | Measurement Science for "More-Than-Moore" Technology Reliability Assessments Y. Obeng (National Institute of Standards and Technology), C. Okoro, and J. Kopanski (National Institute of Standards and Technology (NIST)) |
Tuesday, October 9, 2012 | ||
319A, Level 3, Hawaii Convention Center | ||
3D Systems Part 2 | ||
Co-Chairs: | ||
| Time | Progr# | Title and Authors |
| 08:30 | 2793 | Multi-physics Equivalent Circuit Models for MEMS Sensors and Actuators T. Konishi, K. Machida (NTT Advanced Technology Corp.), K. Masu (Tokyo Institute of Technology), and H. Toshiyoshi (The University of Tokyo) |
| 09:05 | 2794 | ThruChip Interface for Heterogeneous Chip Stacking T. Kuroda (Keio University) |
| 09:40 | Intermission (20 Minutes) | |
Novel Devices and Processing Part 1 | ||
| Time | Progr# | Title and Authors |
| 10:00 | 2795 | Energy-efficient Novolatile Logic systems based on CMOS/spintronics Hybrid technology S. Sugahara, Y. Shuto, and S. Yamamoto (Tokyo Institute of Technology) |
| 10:35 | 2796 | Programmable Cell Array using Rewritable Atom Switch M. Miyamura, T. Sakamoto (Low-power Electronics Association & Project), M. Tada (LEAP), N. Banno, K. Okamoto, N. Iguchi, and H. Hada (Low-power Electronics Association & Project) |
| 11:10 | 2797 | Wafer Processing Photoresist Stripping Requirements C. L. Arvin (IBM) and G. Banerjee (Air Products and Chemicals) |
Novel Materials and Processing - Graphene | ||
| Time | Progr# | Title and Authors |
| 14:00 | 2798 | Graphene for Nanoelectronic Device Applications L. Colombo (Texas Instruments Incorporated) |
| 14:35 | 2799 | Improving Ion/Ioff in Bilayer Graphene Transistors by Molecular Functionalization M. Cantoro, A. Nourbakhsh, A. Klekachev, I. Asselberghs, C. Huyghebaert, M. Heyns, and S. De Gendt (imec) |
| 15:10 | Intermission (20 Minutes) | |
Novel Materials and Processing Part 2 | ||
| Time | Progr# | Title and Authors |
| 15:30 | 2800 | Integration with Diverse Functionalities on Standard CMOS K. Masu (Tokyo Institute of Technology) |
| 16:05 | 2801 | Heterogeneous Integration of Alternative Materials and Devices on Silicon CMOS Integrated Circuits T. S. Mayer (The Pennsylvania State University) |
| 16:40 | 2802 | New Technology Trends: Expand and Extend R. Rhoades (Entrepix, Inc.) |
| 17:15 | Concluding Remarks (15 Minutes) | |