Deadline for Submitting Abstracts
March 30, 2018
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Topic Close-up #10
Symposium G02: Atomic Layer Deposition Applications 14
Symposium Focus: This symposium focuses on a variety of applications of ALD and other atomic layer-by-layer processing in semiconductor CMOS (e.g. high-k oxides and metals for memories like Flash and 3D NAND, MIM, MIS capacitors), photovoltaics, energy storage and conversion, catalysis, optics and photonics, smart coatings of nanoporous materials, MLD and hybrid ALD/MLD, fundamentals of ALD processing: reaction mechanisms, in-situ measurement, modeling, theory, new precursors and delivery systems, optical and photonic applications, productivity enhancement, scale-up and commercialization of ALD equipment and processes for rigid and flexible substrates, including roll-to-roll deposition, spatial ALD, area-selective ALD, Atomic Layer Etching (‘reverse ALD’) and related topics aiming at self-limited etching.






Every year, we celebrate International Women’s Day on March 8 as a way to commemorate the movement for women’s rights. This global holiday honors the social, economic, cultural, political – and in our case – scientific achievements of women.
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The world is full of connected devices – and more are coming. In 2017, there were an
Researchers at KTH have successfully tested a new material that can be used for cheap and large-scale production of hydrogen – a promising alternative to fossil fuel.